Investigation of PMMA resist residues using photoelectron microscopy

Maximov, Ivan (author)

Lund University,Lunds universitet,Fasta tillståndets fysik,Fysiska institutionen,Institutioner vid LTH,Lunds Tekniska Högskola,Solid State Physics,Department of Physics,Departments at LTH,Faculty of Engineering, LTH

Zakharov, Alexei (author)

Lund University,Lunds universitet,MAX IV-laboratoriet,MAX IV Laboratory

Holmqvist, T. (author)

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Montelius, Lars (author)

Lund University,Lunds universitet,Neuronano Research Center (NRC),Forskargrupper vid Lunds universitet,Fasta tillståndets fysik,Fysiska institutionen,Institutioner vid LTH,Lunds Tekniska Högskola,Lund University Research Groups,Solid State Physics,Department of Physics,Departments at LTH,Faculty of Engineering, LTH

Lindau, Ingolf (author)

Lund University,Lunds universitet,MAX IV-laboratoriet,MAX IV Laboratory

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 (creator_code:org_t)

2002

2002

English.

In: Journal of Vacuum Science and Technology. ; B20:3, s. 1139-1142

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• Journal article (peer-reviewed)