SwePub
Sök i LIBRIS databas

  Extended search

onr:"swepub:oai:lup.lub.lu.se:59d82f9d-543e-436f-a5dd-9732d5351bb2"
 

Search: onr:"swepub:oai:lup.lub.lu.se:59d82f9d-543e-436f-a5dd-9732d5351bb2" > Electrically active...

  • 1 of 1
  • Previous record
  • Next record
  •    To hitlist

Electrically active defects in Al2O3-InGaAs MOS stacks at cryogenic temperatures

La Torraca, Paolo (author)
Tyndall National Institute,University of Modena and Reggio Emilia
Padovani, Andrea (author)
University of Modena and Reggio Emilia
Wernersson, Lars Erik (author)
Lund University,Lunds universitet,NanoLund: Centre for Nanoscience,Annan verksamhet, LTH,Lunds Tekniska Högskola,Nanoelektronik,Forskargrupper vid Lunds universitet,LTH profilområde: Nanovetenskap och halvledarteknologi,LTH profilområden,LTH profilområde: AI och digitalisering,Other operations, LTH,Faculty of Engineering, LTH,Nano Electronics,Lund University Research Groups,LTH Profile Area: Nanoscience and Semiconductor Technology,LTH Profile areas,Faculty of Engineering, LTH,LTH Profile Area: AI and Digitalization,Faculty of Engineering, LTH
show more...
Cherkaoui, Karim (author)
Tyndall National Institute
Hurley, Paul (author)
Tyndall National Institute
Larcher, Luca (author)
show less...
 (creator_code:org_t)
2023
2023
English.
In: 2023 IEEE International Integrated Reliability Workshop, IIRW 2023. - 1930-8841 .- 2374-8036. - 9798350327274
  • Conference paper (peer-reviewed)
Abstract Subject headings
Close  
  • The effects of defects in In0.47Ga0.53As/Al2O3/Ni metal-oxide-semiconductor (MOS) stacks at cryogenic temperatures are investigated. The MOS stacks exhibit a hysteresis in the capacitance-voltage (CV) curve, both at room temperature and at 100K, indicating the presence of effective charge capture/emission dynamics in the oxide even at cryogenic temperatures. Border traps (BTs) in the Al2O3 close to the In0.47Ga0.53As/Al2O3 interface are recognized as the best candidate for explaining the experimental CV. The hysteresis shape and its temperature dependence are used to profile the oxide defects' properties, which allow correctly predicting the MOS stacks CV and conductance-voltage (GV) frequency dispersions and gaining insights on the hysteresis dynamics.

Subject headings

NATURVETENSKAP  -- Fysik -- Den kondenserade materiens fysik (hsv//swe)
NATURAL SCIENCES  -- Physical Sciences -- Condensed Matter Physics (hsv//eng)

Keyword

AlO
capacitance
cryogenic
hysteresis
InGaAs

Publication and Content Type

kon (subject category)
ref (subject category)

Find in a library

To the university's database

  • 1 of 1
  • Previous record
  • Next record
  •    To hitlist

Search outside SwePub

Kungliga biblioteket hanterar dina personuppgifter i enlighet med EU:s dataskyddsförordning (2018), GDPR. Läs mer om hur det funkar här.
Så här hanterar KB dina uppgifter vid användning av denna tjänst.

 
pil uppåt Close

Copy and save the link in order to return to this view