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Electrically active...
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La Torraca, PaoloTyndall National Institute,University of Modena and Reggio Emilia
(author)
Electrically active defects in Al2O3-InGaAs MOS stacks at cryogenic temperatures
- Article/chapterEnglish2023
Publisher, publication year, extent ...
Numbers
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LIBRIS-ID:oai:lup.lub.lu.se:59d82f9d-543e-436f-a5dd-9732d5351bb2
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https://lup.lub.lu.se/record/59d82f9d-543e-436f-a5dd-9732d5351bb2URI
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https://doi.org/10.1109/IIRW59383.2023.10477706DOI
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Language:English
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Summary in:English
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Subject category:kon swepub-publicationtype
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Subject category:ref swepub-contenttype
Notes
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The effects of defects in In0.47Ga0.53As/Al2O3/Ni metal-oxide-semiconductor (MOS) stacks at cryogenic temperatures are investigated. The MOS stacks exhibit a hysteresis in the capacitance-voltage (CV) curve, both at room temperature and at 100K, indicating the presence of effective charge capture/emission dynamics in the oxide even at cryogenic temperatures. Border traps (BTs) in the Al2O3 close to the In0.47Ga0.53As/Al2O3 interface are recognized as the best candidate for explaining the experimental CV. The hysteresis shape and its temperature dependence are used to profile the oxide defects' properties, which allow correctly predicting the MOS stacks CV and conductance-voltage (GV) frequency dispersions and gaining insights on the hysteresis dynamics.
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Added entries (persons, corporate bodies, meetings, titles ...)
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Padovani, AndreaUniversity of Modena and Reggio Emilia
(author)
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Wernersson, Lars ErikLund University,Lunds universitet,NanoLund: Centre for Nanoscience,Annan verksamhet, LTH,Lunds Tekniska Högskola,Nanoelektronik,Forskargrupper vid Lunds universitet,LTH profilområde: Nanovetenskap och halvledarteknologi,LTH profilområden,LTH profilområde: AI och digitalisering,Other operations, LTH,Faculty of Engineering, LTH,Nano Electronics,Lund University Research Groups,LTH Profile Area: Nanoscience and Semiconductor Technology,LTH Profile areas,Faculty of Engineering, LTH,LTH Profile Area: AI and Digitalization,Faculty of Engineering, LTH(Swepub:lu)ftf-lwe
(author)
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Cherkaoui, KarimTyndall National Institute(Swepub:lu)ka3673ch
(author)
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Hurley, PaulTyndall National Institute
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Larcher, Luca
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Tyndall National InstituteUniversity of Modena and Reggio Emilia
(creator_code:org_t)
Related titles
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In:2023 IEEE International Integrated Reliability Workshop, IIRW 20231930-88412374-80369798350327274
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