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Vertical Gate-All-A...
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Vasen, T.Taiwan Semiconductor Manufacturing Company Limited
(author)
Vertical Gate-All-Around Nanowire GaSb-InAs Core-Shell n-Type Tunnel FETs
- Article/chapterEnglish2019
Publisher, publication year, extent ...
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2019-01-17
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Springer Science and Business Media LLC,2019
Numbers
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LIBRIS-ID:oai:lup.lub.lu.se:66fcfd0e-b1ac-44df-af6a-b2327e9ca8bc
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https://lup.lub.lu.se/record/66fcfd0e-b1ac-44df-af6a-b2327e9ca8bcURI
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https://doi.org/10.1038/s41598-018-36549-zDOI
Supplementary language notes
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Language:English
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Summary in:English
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Subject category:art swepub-publicationtype
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Subject category:ref swepub-contenttype
Notes
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Tunneling Field-Effect Transistors (TFET) are one of the most promising candidates for future low-power CMOS applications including mobile and Internet of Things (IoT) products. A vertical gate-all-around (VGAA) architecture with a core shell (C-S) structure is the leading contender to meet CMOS footprint requirements while simultaneously delivering high current drive for high performance specifications and subthreshold swing below the Boltzmann limit for low power operation. In this work, VGAA nanowire GaSb/InAs C-S TFETs are demonstrated experimentally for the first time with key device properties of subthreshold swing S = 40 mV/dec (Vd = 10 mV) and current drive up to 40 μA/wire (Vd = 0.3 V, diameter d = 50 nm) while dimensions including core diameter d, shell thickness and gate length are scaled towards CMOS requirements. The experimental data in conjunction with TCAD modeling reveal interface trap density requirements to reach industry standard off-current specifications.
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Ramvall, P.Taiwan Semiconductor Manufacturing Company Limited(Swepub:lu)ftf-per
(author)
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Afzalian, A.Taiwan Semiconductor Manufacturing Company Limited
(author)
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Doornbos, G.Taiwan Semiconductor Manufacturing Company Limited
(author)
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Holland, M.Taiwan Semiconductor Manufacturing Company Limited
(author)
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Thelander, C.Lund University,Lunds universitet,NanoLund: Centre for Nanoscience,Annan verksamhet, LTH,Lunds Tekniska Högskola,Fasta tillståndets fysik,Fysiska institutionen,Institutioner vid LTH,Other operations, LTH,Faculty of Engineering, LTH,Solid State Physics,Department of Physics,Departments at LTH,Faculty of Engineering, LTH(Swepub:lu)ftf-cth
(author)
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Dick, K. A.Lund University,Lunds universitet,NanoLund: Centre for Nanoscience,Annan verksamhet, LTH,Lunds Tekniska Högskola,Fasta tillståndets fysik,Fysiska institutionen,Institutioner vid LTH,Centrum för analys och syntes,Kemiska institutionen,Other operations, LTH,Faculty of Engineering, LTH,Solid State Physics,Department of Physics,Departments at LTH,Faculty of Engineering, LTH,Centre for Analysis and Synthesis,Department of Chemistry,Faculty of Engineering, LTH(Swepub:lu)ftf-kdi
(author)
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Wernersson, L. E.Lund University,Lunds universitet,Nanoelektronik,Forskargrupper vid Lunds universitet,Nano Electronics,Lund University Research Groups(Swepub:lu)ftf-lwe
(author)
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Passlack, M.Taiwan Semiconductor Manufacturing Company Limited
(author)
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Taiwan Semiconductor Manufacturing Company LimitedNanoLund: Centre for Nanoscience
(creator_code:org_t)
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In:Scientific Reports: Springer Science and Business Media LLC9:12045-2322
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