Sequential infiltration synthesis and pattern transfer using 6 nm half-pitch carbohydrate-based fingerprint block copolymer

Löfstrand, Anette (author): Lund University,Lunds universitet,NanoLund: Centre for Nanoscience,Annan verksamhet, LTH,Lunds Tekniska Högskola,Fasta tillståndets fysik,Fysiska institutionen,Institutioner vid LTH,Other operations, LTH,Faculty of Engineering, LTH,Solid State Physics,Department of Physics,Departments at LTH,Faculty of Engineering, LTH,Lund Univ, NanoLund & Solid State Phys, SE-22100 Lund, Sweden.

Jafari Jam, Reza (author): Lund University,Lunds universitet,NanoLund: Centre for Nanoscience,Annan verksamhet, LTH,Lunds Tekniska Högskola,Fasta tillståndets fysik,Fysiska institutionen,Institutioner vid LTH,Other operations, LTH,Faculty of Engineering, LTH,Solid State Physics,Department of Physics,Departments at LTH,Faculty of Engineering, LTH,Lund Univ, NanoLund & Solid State Phys, SE-22100 Lund, Sweden.

Mumtaz, Muhammad (author): University Grenoble Alpes,Univ Grenoble Alpes, CNRS, CERMAV, F-38000 Grenoble, France.

Mothander, Karolina (author): Lund University,Lunds universitet,NanoLund: Centre for Nanoscience,Annan verksamhet, LTH,Lunds Tekniska Högskola,Fysikalisk kemi,Enheten för fysikalisk och teoretisk kemi,Kemiska institutionen,Institutioner vid LTH,Other operations, LTH,Faculty of Engineering, LTH,Physical Chemistry,Physical and theoretical chemistry,Department of Chemistry,Departments at LTH,Faculty of Engineering, LTH,Lund Univ, NanoLund & Phys Chem, POB 124, SE-22100 Lund, Sweden.

Nylander, Tommy (author): Lund University,Lunds universitet,NanoLund: Centre for Nanoscience,Annan verksamhet, LTH,Lunds Tekniska Högskola,Fysikalisk kemi,Enheten för fysikalisk och teoretisk kemi,Kemiska institutionen,Institutioner vid LTH,Other operations, LTH,Faculty of Engineering, LTH,Physical Chemistry,Physical and theoretical chemistry,Department of Chemistry,Departments at LTH,Faculty of Engineering, LTH,Lund Univ, NanoLund & Phys Chem, POB 124, SE-22100 Lund, Sweden.

Vorobiev, Alexei (author): Uppsala universitet,Uppsala University,Materialfysik

Rahaman, Ahibur (author): Stockholm University,Stockholm Univ, Dept Organ Chem, SE-10691 Stockholm, Sweden.

Chen, Wen Chang (author): National Taiwan University,Natl Taiwan Univ, Adv Res Ctr Green Mat Sci & Technol, Taipei 10617, Taiwan.

Borsali, Redouane (author): University Grenoble Alpes,Univ Grenoble Alpes, CNRS, CERMAV, F-38000 Grenoble, France.

Maximov, Ivan (author): Lund University,Lunds universitet,NanoLund: Centre for Nanoscience,Annan verksamhet, LTH,Lunds Tekniska Högskola,Fasta tillståndets fysik,Fysiska institutionen,Institutioner vid LTH,Other operations, LTH,Faculty of Engineering, LTH,Solid State Physics,Department of Physics,Departments at LTH,Faculty of Engineering, LTH,Lund Univ, NanoLund & Solid State Phys, SE-22100 Lund, Sweden.

Sanders, Daniel P. (editor)

Guerrero, Douglas (editor)

(creator_code:org_t)

SPIE, 2021
2021
English.
In: Advances in Patterning Materials and Processes XXXVIII. - : SPIE. - 1996-756X .- 0277-786X. - 9781510640573 - 9781510640580 ; 11612

Related links:: http://dx.doi.org/10...; show more...; https://lup.lub.lu.s...; https://doi.org/10.1...; https://urn.kb.se/re...; show less...

Abstract Subject headings

This study presents how sequential infiltration synthesis of trimethyl aluminium and water into a carbohydrate-based block copolymer was used to enable pattern transfer of 6 nm half-pitch horizontal cylinders into silicon. Specular neutron reflectometry measurements of poly(styrene)-block-maltoheptaose self-assembled into horizontal cylinders indicate an increasing content of alumina after each sequential infiltration cycle, comparing 0, 1, 2, and 4 cycles, with alumina content reaching 2.4 vol% after four infiltrations cycles. Dry etching processes in inductively coupled plasma reactive ion etching for sub-10 nm patterns were developed, using a two-step technique: O2-plasma for polymer removal and a reactive ion etching of Si using a mixture of SF6 and C4F8 gases. Etch selectivity of more than 2:1 of silicon over alumina-like etch mask material was achieved. To evaluate the etching process, the etched Si structures were measured and characterized by scanning electron microscopy. These results are expected to be of use for nanofabrication and applications in the sub-10 nm regime.

TEKNIK OCH TEKNOLOGIER -- Nanoteknik -- Nanoteknik (hsv//swe)
ENGINEERING AND TECHNOLOGY -- Nano-technology -- Nano-technology (hsv//eng)
NATURVETENSKAP -- Fysik -- Den kondenserade materiens fysik (hsv//swe)
NATURAL SCIENCES -- Physical Sciences -- Condensed Matter Physics (hsv//eng)
NATURVETENSKAP -- Fysik -- Annan fysik (hsv//swe)
NATURAL SCIENCES -- Physical Sciences -- Other Physics Topics (hsv//eng)
NATURVETENSKAP -- Kemi -- Materialkemi (hsv//swe)
NATURAL SCIENCES -- Chemical Sciences -- Materials Chemistry (hsv//eng)

By the author/editor: Löfstrand, Anett ...; Jafari Jam, Reza; Mumtaz, Muhammad; Mothander, Karol ...; Nylander, Tommy; Vorobiev, Alexei; show more...; Rahaman, Ahibur; Chen, Wen Chang; Borsali, Redouan ...; Maximov, Ivan; Sanders, Daniel ...; Guerrero, Dougla ...; show less...

About the subject

ENGINEERING AND TECHNOLOGY: ENGINEERING AND ...; and Nano technology; and Nano technology

NATURAL SCIENCES: NATURAL SCIENCES; and Physical Science ...; and Condensed Matter ...

NATURAL SCIENCES: NATURAL SCIENCES; and Physical Science ...; and Other Physics To ...

NATURAL SCIENCES: NATURAL SCIENCES; and Chemical Science ...; and Materials Chemis ...

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