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  • Evertsson, JonasLund University,Lunds universitet,Synkrotronljusfysik,Fysiska institutionen,Institutioner vid LTH,Lunds Tekniska Högskola,Synchrotron Radiation Research,Department of Physics,Departments at LTH,Faculty of Engineering, LTH (author)

The thickness of native oxides on aluminum alloys and single crystals

  • Article/chapterEnglish2015

Publisher, publication year, extent ...

  • Elsevier BV,2015

Numbers

  • LIBRIS-ID:oai:lup.lub.lu.se:891585d0-ca90-4395-8de1-9eecd2aae6ac
  • https://lup.lub.lu.se/record/7790984URI
  • https://doi.org/10.1016/j.apsusc.2015.05.043DOI
  • https://urn.kb.se/resolve?urn=urn:nbn:se:kth:diva-171245URI
  • https://urn.kb.se/resolve?urn=urn:nbn:se:kau:diva-63729URI

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  • Language:English
  • Summary in:English

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  • Subject category:art swepub-publicationtype
  • Subject category:ref swepub-contenttype

Notes

  • QC 20150728
  • We present results from measurements of the native oxide film thickness on four different industrial aluminum alloys and three different aluminum single crystals. The thicknesses were determined using X-ray reflectivity, X-ray photoelectron spectroscopy, and electrochemical impedance spectroscopy. In addition, atomic force microscopy was used for micro-structural studies of the oxide surfaces. The reflectivity measurements were performed in ultra-high vacuum, vacuum, ambient, nitrogen and liquid water conditions. The results obtained using X-ray reflectivity and X-ray photoelectron spectroscopy demonstrate good agreement. However, the oxide thicknesses determined from the electrochemical impedance spectroscopy show a larger discrepancy from the above two methods. In the present contribution the reasons for this discrepancy are discussed. We also address the effect of the substrate type and the presence of water on the resultant oxide thickness.

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  • Bertram, FlorianLund University,Lunds universitet,Synkrotronljusfysik,Fysiska institutionen,Institutioner vid LTH,Lunds Tekniska Högskola,Synchrotron Radiation Research,Department of Physics,Departments at LTH,Faculty of Engineering, LTH(Swepub:lu)slju-flb (author)
  • Zhang, FanKTH,Yt- och korrosionsvetenskap(Swepub:kth)u1vmg9ao (author)
  • Rullik, LisaLund University,Lunds universitet,Synkrotronljusfysik,Fysiska institutionen,Institutioner vid LTH,Lunds Tekniska Högskola,Synchrotron Radiation Research,Department of Physics,Departments at LTH,Faculty of Engineering, LTH(Swepub:lu)slju-lru (author)
  • Merte, LindsayLund University,Lunds universitet,Synkrotronljusfysik,Fysiska institutionen,Institutioner vid LTH,Lunds Tekniska Högskola,Synchrotron Radiation Research,Department of Physics,Departments at LTH,Faculty of Engineering, LTH(Swepub:lu)slju-lmt (author)
  • Shipilin, MikhailLund University,Lunds universitet,Synkrotronljusfysik,Fysiska institutionen,Institutioner vid LTH,Lunds Tekniska Högskola,Synchrotron Radiation Research,Department of Physics,Departments at LTH,Faculty of Engineering, LTH(Swepub:lu)slju-msh (author)
  • Soldemo, MarkusKTH,Materialfysik, MF(Swepub:kau)marksold (author)
  • Ahmadi, SarehKTH,Materialfysik, MF(Swepub:kth)u13d2656 (author)
  • Vinogradov, N.ESRF, France (author)
  • Carla, F.ESRF, France (author)
  • Weissenrieder, JonasKTH,Materialfysik, MF(Swepub:kth)u1dg6qtm (author)
  • Götelid, MatsKTH,Materialfysik, MF(Swepub:kth)u1uq5dqb (author)
  • Pan, JinshanKTH,Yt- och korrosionsvetenskap(Swepub:kth)u17ks6cf (author)
  • Mikkelsen, AndersLund University,Lunds universitet,Synkrotronljusfysik,Fysiska institutionen,Institutioner vid LTH,Lunds Tekniska Högskola,Synchrotron Radiation Research,Department of Physics,Departments at LTH,Faculty of Engineering, LTH(Swepub:lu)slju-ami (author)
  • Nilsson, J. -O.Sapa Technology, Sweden (author)
  • Lundgren, EdvinLund University,Lunds universitet,Synkrotronljusfysik,Fysiska institutionen,Institutioner vid LTH,Lunds Tekniska Högskola,Synchrotron Radiation Research,Department of Physics,Departments at LTH,Faculty of Engineering, LTH(Swepub:lu)slju-elu (author)
  • SynkrotronljusfysikFysiska institutionen (creator_code:org_t)

Related titles

  • In:Applied Surface Science: Elsevier BV349, s. 826-8321873-55840169-4332

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