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Study of thin oxide...
Study of thin oxide films by electron, ion and synchrotron radiation beams
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Sammelselg, V (author)
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Rauhala, E (author)
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Arstila, K (author)
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- Zakharov, Alexei (author)
- Lund University,Lunds universitet,MAX IV-laboratoriet,MAX IV Laboratory
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Aarik, J (author)
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Kikas, A (author)
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Karlis, J (author)
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Tarre, A (author)
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Seppala, A (author)
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Asari, J (author)
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- Martinson, Indrek (author)
- Lund University,Lunds universitet,Fysiska institutionen,Institutioner vid LTH,Lunds Tekniska Högskola,Department of Physics,Departments at LTH,Faculty of Engineering, LTH
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(creator_code:org_t)
- Springer Science and Business Media LLC, 2002
- 2002
- English.
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In: Microchimica Acta. - : Springer Science and Business Media LLC. - 1436-5073 .- 0026-3672. ; 139:1-4, s. 165-169
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http://dx.doi.org/10...
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Abstract
Subject headings
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- Titanium oxide and zirconium oxide thin films deposited on silicon substrates were characterised using electron probe microanalysis (EPMA), Rutherford backscattering spectroscopy (RBS), time-of-flight elastic recoil detection analysis (TOF-ERDA) and scanning photoelectron microscopy (SPEM). The composition and mass thickness of the films were determined and the results of different methods compared. It was revealed that the synchrotron radiation used for SPEM studies caused considerable modification of zirconia films grown at low temperatures.
Subject headings
- NATURVETENSKAP -- Fysik (hsv//swe)
- NATURAL SCIENCES -- Physical Sciences (hsv//eng)
Keyword
- oxide films
- TOF-ERDA
- RBS
- scanning photoelectron microscopy
- EPMA
Publication and Content Type
- art (subject category)
- ref (subject category)
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- By the author/editor
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Sammelselg, V
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Rauhala, E
-
Arstila, K
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Zakharov, Alexei
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Aarik, J
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Kikas, A
-
show more...
-
Karlis, J
-
Tarre, A
-
Seppala, A
-
Asari, J
-
Martinson, Indre ...
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show less...
- About the subject
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- NATURAL SCIENCES
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NATURAL SCIENCES
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and Physical Science ...
- Articles in the publication
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Microchimica Act ...
- By the university
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Lund University