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Atomic-level mechan...
Atomic-level mechanisms of magnesium oxidation
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- Gardonio, Sandra (author)
- University of Nova Gorica
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- Fanetti, Mattia (author)
- University of Nova Gorica
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- Valant, Matjaz (author)
- University of Nova Gorica
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- Orlov, Dmytro (author)
- Lund University,Lunds universitet,Materialteknik,Institutionen för maskinvetenskaper,Institutioner vid LTH,Lunds Tekniska Högskola,Materials Engineering,Department of Mechanical Engineering Sciences,Departments at LTH,Faculty of Engineering, LTH
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(creator_code:org_t)
- 2016-02-04
- 2016
- English 4 s.
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In: Magnesium Technology 2016 - Held During TMS 2016: 145th Annual Meeting and Exhibition. - Hoboken, NJ, USA : John Wiley & Sons, Inc.. - 9781119225805 ; 2016-January, s. 73-76
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Abstract
Subject headings
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- Magnesium has been recently becoming an increasingly popular material for various applications. However, excessive chemical reactivity, and oxidation rate in particular, is a major obstruction on the way of Mg to become widely adopted. A significant problem causing the lack of Mg reactivity control is insufficient understanding of mechanisms involved in the oxidation of magnesium surface. Herewith we present the investigation of atomic-level mechanisms of oxidation initiation and propagation in pure Mg. Namely, X-ray photoelectron spectroscopy at synchrotron Elettra was used as a surface sensitive direct method to determine the valence of Mg and O and the valence band states at the early stage of oxide formation over a principal, most densely packed, crystallographic plane (0001) in pure Mg. The mechanisms of oxygen adsorption on magnesium free surface followed by oxidation (i.e. initiation and kinetics of MgO formation) are clarified.
Subject headings
- TEKNIK OCH TEKNOLOGIER -- Materialteknik (hsv//swe)
- ENGINEERING AND TECHNOLOGY -- Materials Engineering (hsv//eng)
Keyword
- Magnesium
- Oxidation
- Synchrotron radiation
- X-ray photoelectron spectroscopy
Publication and Content Type
- kon (subject category)
- ref (subject category)
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