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Lithography of high spatial density biosensor structures with sub-100 nm spacing by MeV proton beam writing with minimal proximity effect
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- Whitlow, Harry J (author)
- Lund University,Lunds universitet,Kärnfysik,Fysiska institutionen,Institutioner vid LTH,Lunds Tekniska Högskola,Nuclear physics,Department of Physics,Departments at LTH,Faculty of Engineering, LTH
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- Ng, May Ling (author)
- Lund University,Lunds universitet,MAX IV-laboratoriet,MAX IV Laboratory
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- Auzelyte, Vaida (author)
- Lund University,Lunds universitet,Kärnfysik,Fysiska institutionen,Institutioner vid LTH,Lunds Tekniska Högskola,Nuclear physics,Department of Physics,Departments at LTH,Faculty of Engineering, LTH
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- van Kan, JA (author)
- Bettiol, AA (author)
- Watt, F (author)
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- (creator_code:org_t)
- 2003-11-26
- 2004
- Romanian.
- In: Nanotechnology. - : IOP Publishing. - 0957-4484 .- 1361-6528. ; 15:1, s. 223-226
- Journal article (peer-reviewed)
Abstract
Subject headings
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- Metal electrode structures for biosensors with a high spatial density and similar to85 nm gaps have been produced using focused megaelectronvolt (MeV) proton beam writing of poly-(methyl methacrylate) positive resist combined with metal lift-off. The minimal proximity exposure and straight proton trajectories in (similar to100 nm) resist layers for focused MeV proton beam writing are strongly indicative that ultimate electrode gap widths approaching a few nanometres are achievable.
Subject headings
- TEKNIK OCH TEKNOLOGIER -- Nanoteknik -- Nanoteknik (hsv//swe)
- ENGINEERING AND TECHNOLOGY -- Nano-technology -- Nano-technology (hsv//eng)
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- art (subject category)
- ref (subject category)
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- Whitlow, Harry J
- Ng, May Ling
- Auzelyte, Vaida
- Maximov, Ivan
- Montelius, Lars
- van Kan, JA
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- Bettiol, AA
- Watt, F
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- About the subject
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- ENGINEERING AND TECHNOLOGY
- ENGINEERING AND ...
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- Nanotechnology
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- Lund University
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