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Photoluminescence m...
Photoluminescence mapping of mid-wave infrared InAs/GaSb type II superlattice: Influence of materials and processes on spatial uniformity
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Shi, Zhangyong (author)
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Yan, Dingyu (author)
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Zhang, Yanchao (author)
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Zhang, Fan (author)
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Chen, Yimin (author)
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Gu, Chenjie (author)
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- Chen, X (author)
- Chinese Academy of Sciences
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- Shao, Jun (author)
- Chinese Academy of Sciences
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- Wang, Shumin, 1963 (author)
- Chalmers tekniska högskola,Chalmers University of Technology
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Shen, Xiang (author)
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(creator_code:org_t)
- Elsevier BV, 2023
- 2023
- English.
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In: Journal of Alloys and Compounds. - : Elsevier BV. - 0925-8388. ; 947
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https://doi.org/10.1...
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Abstract
Subject headings
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- The imaging performance of infrared focal plane array (FPA) is limited by the non-uniformity of the in-plane response of InAs/GaSb type II superlattices (T2SL) consisting of a few hundred or more thin layers. Fundamentally, the non-uniformity results from the materials’ property variation and process fluctuations over an area of a square centimeter. Thus, the influence of materials and processes on the uniformity of internal response is necessary to accurately detect and evaluate to improve the imaging performance of an FPA detector. In this work, spatially resolved photoluminescence (PL) was implemented to detect the microscale mesa pixels, and the effects of materials and processes on spatial uniformity were studied for the first time. Modulated PL-mapping technology based on step-scan Fourier transform infrared spectrometry was used to extract parameters from each test spectrum, such as PL peak energy, linewidth, and integral intensity, which were then analyzed by 2D spatial mapping. Results showed that the variation of T2SL material properties accounted for 29% of the non-uniformity, and the remaining 71% resulted from the process fluctuation. In particular, the etching process had a great influence on the uniformity. The non-uniformity of the integral intensity of the sample after etching increased by 2.44 times compared with that before etching. Thereafter, a layer of SiO2 film was deposited to passivate the surface. The results showed that the non-uniformity returned to the level before etching, which directly proves that the passivation process can improve the response uniformity of the infrared FPA detector.
Subject headings
- NATURVETENSKAP -- Fysik -- Atom- och molekylfysik och optik (hsv//swe)
- NATURAL SCIENCES -- Physical Sciences -- Atom and Molecular Physics and Optics (hsv//eng)
- NATURVETENSKAP -- Fysik -- Annan fysik (hsv//swe)
- NATURAL SCIENCES -- Physical Sciences -- Other Physics Topics (hsv//eng)
- TEKNIK OCH TEKNOLOGIER -- Materialteknik -- Annan materialteknik (hsv//swe)
- ENGINEERING AND TECHNOLOGY -- Materials Engineering -- Other Materials Engineering (hsv//eng)
Keyword
- Midwave infrared
- Materials and processes
- Photoluminescence mapping
- Focal-plane array
- InAs/GaSb type-II superlattice
Publication and Content Type
- art (subject category)
- ref (subject category)
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- By the author/editor
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Shi, Zhangyong
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Yan, Dingyu
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Zhang, Yanchao
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Zhang, Fan
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Chen, Yimin
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Gu, Chenjie
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show more...
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Chen, X
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Shao, Jun
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Wang, Shumin, 19 ...
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Shen, Xiang
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show less...
- About the subject
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- NATURAL SCIENCES
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NATURAL SCIENCES
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and Physical Science ...
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and Atom and Molecul ...
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- NATURAL SCIENCES
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NATURAL SCIENCES
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and Physical Science ...
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and Other Physics To ...
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- ENGINEERING AND TECHNOLOGY
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ENGINEERING AND ...
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and Materials Engine ...
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and Other Materials ...
- Articles in the publication
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Journal of Alloy ...
- By the university
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Chalmers University of Technology