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Molecular beam epit...
Molecular beam epitaxy growth of AlAs 1-x Bi x
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- Wang, Chang (author)
- ShanghaiTech University,Chinese Academy of Sciences
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- Wang, L (author)
- Chinese Academy of Sciences
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- Wu, Xiaoyan (author)
- Shanghai Jiao Tong University
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- Zhang, Yanchao (author)
- ShanghaiTech University,Chinese Academy of Sciences
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- Liang, Hao (author)
- Chinese Academy of Sciences
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- Yue, L. (author)
- Chinese Academy of Sciences
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- Zhang, Z. (author)
- Chinese Academy of Sciences,ShanghaiTech University
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- Ou, Xin (author)
- Chinese Academy of Sciences
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- Wang, Shu Min, 1963 (author)
- Chalmers tekniska högskola,Chalmers University of Technology,ShanghaiTech University,Chinese Academy of Sciences
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(creator_code:org_t)
- 2019-02-06
- 2019
- English.
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In: Semiconductor Science and Technology. - : IOP Publishing. - 1361-6641 .- 0268-1242. ; 34:3
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Abstract
Subject headings
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- High quality AlAs 1-x Bi x layers with Bi composition of 3%-10.5% have been successfully grown by molecular beam epitaxy. The Bi incorporation is confirmed by Rutherford backscattering spectroscopy. For a 400 nm thick AlAsBi layer, the strain relaxation occurs when the Bi composition is larger than 6.5%. Flux ratio is calculated from Knudsen-cell model and Maxwell equation, according to the geometrical relationship of our equipment. The Bi incorporation increases with increasing the As-Al flux ratio as well as the Bi flux. The extrapolation lattice constant of hypothetic zincblende AlBi alloy is about 6.23 Å.
Subject headings
- NATURVETENSKAP -- Kemi -- Fysikalisk kemi (hsv//swe)
- NATURAL SCIENCES -- Chemical Sciences -- Physical Chemistry (hsv//eng)
- TEKNIK OCH TEKNOLOGIER -- Materialteknik -- Annan materialteknik (hsv//swe)
- ENGINEERING AND TECHNOLOGY -- Materials Engineering -- Other Materials Engineering (hsv//eng)
- NATURVETENSKAP -- Fysik -- Den kondenserade materiens fysik (hsv//swe)
- NATURAL SCIENCES -- Physical Sciences -- Condensed Matter Physics (hsv//eng)
Keyword
- As-Al flux ratio
- Rutherford backscattering spectroscopy
- molecular beam epitaxy
- AsBi
Publication and Content Type
- art (subject category)
- ref (subject category)
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- By the author/editor
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Wang, Chang
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Wang, L
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Wu, Xiaoyan
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Zhang, Yanchao
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Liang, Hao
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Yue, L.
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Zhang, Z.
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Ou, Xin
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Wang, Shu Min, 1 ...
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- About the subject
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- NATURAL SCIENCES
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NATURAL SCIENCES
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and Chemical Science ...
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and Physical Chemist ...
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- ENGINEERING AND TECHNOLOGY
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ENGINEERING AND ...
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and Materials Engine ...
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and Other Materials ...
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- NATURAL SCIENCES
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NATURAL SCIENCES
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and Physical Science ...
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and Condensed Matter ...
- Articles in the publication
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Semiconductor Sc ...
- By the university
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Chalmers University of Technology