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Search: onr:"swepub:oai:research.chalmers.se:37acd2ae-d1e5-4f3f-acb3-8f47ded483a9" > Interface defects i...

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  • Hurley, P.K. (author)

Interface defects in HfO2, LaSiOx and Gd2O3 high-k/metal gate structures on silicon: Energy distribution and passivation

  • Article/chapterEnglish2007

Publisher, publication year, extent ...

  • 2007

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  • LIBRIS-ID:oai:research.chalmers.se:37acd2ae-d1e5-4f3f-acb3-8f47ded483a9
  • https://research.chalmers.se/publication/67390URI

Supplementary language notes

  • Language:English

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  • Subject category:kon swepub-publicationtype
  • Subject category:ref swepub-contenttype

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Added entries (persons, corporate bodies, meetings, titles ...)

  • Cherkaoui, K. (author)
  • O'Connor, E (author)
  • Groenland, A.W. (author)
  • Lemme, M.C. (author)
  • Gottlob, H.D.B. (author)
  • Schmidt, M (author)
  • Hall, S. (author)
  • Lu, Y. (author)
  • Buiu, O. (author)
  • Raeissi, Bahman,1979Chalmers tekniska högskola,Chalmers University of Technology(Swepub:cth)raeissin (author)
  • Piscator, Johan,1977Chalmers tekniska högskola,Chalmers University of Technology(Swepub:cth)e8johanp (author)
  • Engström, Olof,1943Chalmers tekniska högskola,Chalmers University of Technology(Swepub:cth)oleng (author)
  • Chalmers tekniska högskola (creator_code:org_t)

Related titles

  • In:Proc. Electrochemical Society Meeting, Washington DC, October 2007

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