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Simplified Josephso...
Simplified Josephson-junction fabrication process for reproducibly high-performance superconducting qubits
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- Osman, Amr, 1993 (author)
- Chalmers tekniska högskola,Chalmers University of Technology
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- Simon, James, 1997 (author)
- Chalmers tekniska högskola,Chalmers University of Technology
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- Bengtsson, Andreas, 1991 (author)
- Chalmers tekniska högskola,Chalmers University of Technology
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- Kosen, Sandoko, 1991 (author)
- Chalmers tekniska högskola,Chalmers University of Technology
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- Krantz, Philip, 1984 (author)
- Chalmers tekniska högskola,Chalmers University of Technology
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- Perez Lozano, Daniel, 1990 (author)
- Chalmers tekniska högskola,Chalmers University of Technology
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- Scigliuzzo, Marco, 1987 (author)
- Chalmers tekniska högskola,Chalmers University of Technology
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- Delsing, Per, 1959 (author)
- Chalmers tekniska högskola,Chalmers University of Technology
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- Bylander, Jonas, 1978 (author)
- Chalmers tekniska högskola,Chalmers University of Technology
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- Fadavi Roudsari, Anita, 1978 (author)
- Chalmers tekniska högskola,Chalmers University of Technology
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(creator_code:org_t)
- AIP Publishing, 2021
- 2021
- English.
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In: Applied Physics Letters. - : AIP Publishing. - 0003-6951 .- 1077-3118. ; 118:6
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Abstract
Subject headings
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- We introduce a simplified fabrication technique for Josephson junctions and demonstrate superconducting Xmon qubits with T1 relaxation times averaging above 50 μs (Q > 1.5 × 1 0 6). Current shadow-evaporation techniques for aluminum-based Josephson junctions require a separate lithography step to deposit a patch that makes a galvanic, superconducting connection between the junction electrodes and the circuit wiring layer. The patch connection eliminates parasitic junctions, which otherwise contribute significantly to dielectric loss. In our patch-integrated cross-type junction technique, we use one lithography step and one vacuum cycle to evaporate both the junction electrodes and the patch. This eliminates a key bottleneck in manufacturing superconducting qubits by reducing the fabrication time and cost. In a study of more than 3600 junctions, we show an average resistance variation of 3.7% on a wafer that contains forty 0.5 × 0.5-cm2 chips, with junction areas ranging between 0.01 and 0.16 μm2. The average on-chip spread in resistance is 2.7%, with 20 chips varying between 1.4% and 2%. For the junction sizes used for transmon qubits, we deduce a wafer-level transition-frequency variation of 1.7%-2.5%. We show that 60%-70% of this variation is attributed to junction-area fluctuations, while the rest is caused by tunnel-junction inhomogeneity. Such high frequency predictability is a requirement for scaling-up the number of qubits in a quantum computer.
Subject headings
- NATURVETENSKAP -- Fysik -- Atom- och molekylfysik och optik (hsv//swe)
- NATURAL SCIENCES -- Physical Sciences -- Atom and Molecular Physics and Optics (hsv//eng)
- NATURVETENSKAP -- Fysik -- Annan fysik (hsv//swe)
- NATURAL SCIENCES -- Physical Sciences -- Other Physics Topics (hsv//eng)
- NATURVETENSKAP -- Fysik -- Den kondenserade materiens fysik (hsv//swe)
- NATURAL SCIENCES -- Physical Sciences -- Condensed Matter Physics (hsv//eng)
Keyword
- qubits
- Superconducting Resonators
- Josephson Junctions
Publication and Content Type
- art (subject category)
- ref (subject category)
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- By the author/editor
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Osman, Amr, 1993
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Simon, James, 19 ...
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Bengtsson, Andre ...
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Kosen, Sandoko, ...
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Krantz, Philip, ...
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Perez Lozano, Da ...
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show more...
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Scigliuzzo, Marc ...
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Delsing, Per, 19 ...
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Bylander, Jonas, ...
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Fadavi Roudsari, ...
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show less...
- About the subject
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- NATURAL SCIENCES
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NATURAL SCIENCES
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and Physical Science ...
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and Atom and Molecul ...
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- NATURAL SCIENCES
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NATURAL SCIENCES
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and Physical Science ...
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and Other Physics To ...
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- NATURAL SCIENCES
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NATURAL SCIENCES
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and Physical Science ...
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and Condensed Matter ...
- Articles in the publication
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Applied Physics ...
- By the university
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Chalmers University of Technology