Search: onr:"swepub:oai:research.chalmers.se:3ca93755-030e-4c0f-a32e-04073c22619d" > Fabrication of grap...
Fältnamn | Indikatorer | Metadata |
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000 | 04308naa a2200553 4500 | |
001 | oai:research.chalmers.se:3ca93755-030e-4c0f-a32e-04073c22619d | |
003 | SwePub | |
008 | 171007s2016 | |||||||||||000 ||eng| | |
009 | oai:DiVA.org:ri-68183 | |
009 | oai:DiVA.org:liu-132236 | |
020 | a 9781467391344 | |
024 | 7 | a https://doi.org/10.1109/CPEM.2016.75405162 DOI |
024 | 7 | a https://research.chalmers.se/publication/2456492 URI |
024 | 7 | a https://urn.kb.se/resolve?urn=urn:nbn:se:ri:diva-681832 URI |
024 | 7 | a https://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-1322362 URI |
040 | a (SwePub)cthd (SwePub)rid (SwePub)liu | |
041 | a engb eng | |
042 | 9 SwePub | |
072 | 7 | a kon2 swepub-publicationtype |
072 | 7 | a ref2 swepub-contenttype |
100 | 1 | a He, Hans,d 1989u RISE,Mätteknik,Chalmers, Sweden4 aut0 (Swepub:ri)hanshe@ri.se |
245 | 1 0 | a Fabrication of graphene quantum hall resistance standard in a cryogen-Table-Top system |
264 | 1 | b Institute of Electrical and Electronics Engineers Inc.c 2016 |
520 | a We have demonstrated quantum Hall resistance measurements with metrological accuracy in a relatively easy to use and compact cryogen-free system operating at a temperature of around 3.8 K and magnetic field below 5 T. This advance in technology is due to the unique properties of epitaxial graphene on silicon carbide (SiC) which lifts the stringent requirements for quantum hall effect seen in conventional semiconductors. This paper presents the processes involved in fabrication and characterization of metrologically viable epitaxial graphene samples. | |
650 | 7 | a TEKNIK OCH TEKNOLOGIERx Elektroteknik och elektronik0 (SwePub)2022 hsv//swe |
650 | 7 | a ENGINEERING AND TECHNOLOGYx Electrical Engineering, Electronic Engineering, Information Engineering0 (SwePub)2022 hsv//eng |
650 | 7 | a TEKNIK OCH TEKNOLOGIERx Materialteknik0 (SwePub)2052 hsv//swe |
650 | 7 | a ENGINEERING AND TECHNOLOGYx Materials Engineering0 (SwePub)2052 hsv//eng |
650 | 7 | a TEKNIK OCH TEKNOLOGIERx Elektroteknik och elektronikx Annan elektroteknik och elektronik0 (SwePub)202992 hsv//swe |
650 | 7 | a ENGINEERING AND TECHNOLOGYx Electrical Engineering, Electronic Engineering, Information Engineeringx Other Electrical Engineering, Electronic Engineering, Information Engineering0 (SwePub)202992 hsv//eng |
653 | a measurement standards | |
653 | a Graphene | |
653 | a quantum hall effect | |
653 | a microfabrication | |
653 | a Epitaxial layers | |
700 | 1 | a Janssen, Tjbmu National Physical Laboratory (NPL),NPL National Physical Laboratory, UK,National Phys Lab, England4 aut |
700 | 1 | a Rozhko, S.u National Physical Laboratory (NPL),NPL National Physical Laboratory, UK,National Phys Lab, England4 aut |
700 | 1 | a Tzalenchuk, A.Y.u Royal Holloway University of London,National Physical Laboratory (NPL),NPL National Physical Laboratory, UK; University of London, UK,National Phys Lab, England; Royal Holloway University of London, England4 aut |
700 | 1 | a Lara Avila, Samuel,d 1983u Chalmers tekniska högskola,Chalmers University of Technology,Chalmers University of Technology, Sweden4 aut0 (Swepub:cth)larsavil |
700 | 1 | a Yakimova, Rositsau Linköpings universitet,Halvledarmaterial,Tekniska fakulteten4 aut0 (Swepub:liu)rosia15 |
700 | 1 | a Kubatkin, Sergey,d 1959u Chalmers tekniska högskola,Chalmers University of Technology,Chalmers University of Technology, Sweden4 aut0 (Swepub:cth)kubatkin |
710 | 2 | a RISEb Mätteknik4 org |
773 | 0 | t 2016 Conference on Precision Electromagnetic Measurements, CPEM 2016; The Westin OttawaOttawa; Canada; 10-15 July 2016d : Institute of Electrical and Electronics Engineers Inc.g , s. Art no 7540516-q <Art no 7540516-z 9781467391344 |
773 | 0 | t CPEM 2016 - Conference on Precision Electromagnetic Measurements, Conference Digestd : Institute of Electrical and Electronics Engineers Inc.g , s. Art no 7540516-q <Art no 7540516- |
856 | 4 | u http://dx.doi.org/10.1109/CPEM.2016.7540516y FULLTEXT |
856 | 4 8 | u https://doi.org/10.1109/CPEM.2016.7540516 |
856 | 4 8 | u https://research.chalmers.se/publication/245649 |
856 | 4 8 | u https://urn.kb.se/resolve?urn=urn:nbn:se:ri:diva-68183 |
856 | 4 8 | u https://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-132236 |
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