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Multilevel phase ho...
Multilevel phase holograms manufactured by electron-beam lithography
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- Ekberg, Mats, 1961 (author)
- Chalmers tekniska högskola,Chalmers University of Technology
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- Larsson, J. Michael, 1963 (author)
- Chalmers tekniska högskola,Chalmers University of Technology
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- Hård, Sverker, 1945 (author)
- Chalmers tekniska högskola,Chalmers University of Technology
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- Nilsson, Bengt, 1954 (author)
- Chalmers tekniska högskola,Chalmers University of Technology
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(creator_code:org_t)
- 1990
- 1990
- English.
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In: Optics Letters. - 0146-9592 .- 1539-4794. ; 15, s. 568-569
- Related links:
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http://dx.doi.org/10...
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https://research.cha...
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https://doi.org/10.1...
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Abstract
Subject headings
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- Ten-level transmission phase holograms (kinoforms) manufactured in one resist layer by electron-beam lithography are reported for the first time to the authors' knowledge. The measured hologram diffraction efficiencies were 70% for the two resist materials used. This corresponds to 82% of the maximum theoretical value for these holograms and is, to the authors' knowledge, the highest reported to date
Subject headings
- TEKNIK OCH TEKNOLOGIER -- Elektroteknik och elektronik -- Annan elektroteknik och elektronik (hsv//swe)
- ENGINEERING AND TECHNOLOGY -- Electrical Engineering, Electronic Engineering, Information Engineering -- Other Electrical Engineering, Electronic Engineering, Information Engineering (hsv//eng)
Keyword
- holography
- electron beam lithography
Publication and Content Type
- art (subject category)
- ref (subject category)
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