Multilevel phase holograms manufactured by electron-beam lithography

• Ten-level transmission phase holograms (kinoforms) manufactured in one resist layer by electron-beam lithography are reported for the first time to the authors' knowledge. The measured hologram diffraction efficiencies were 70% for the two resist materials used. This corresponds to 82% of the maximum theoretical value for these holograms and is, to the authors' knowledge, the highest reported to date

Subject headings

TEKNIK OCH TEKNOLOGIER  -- Elektroteknik och elektronik -- Annan elektroteknik och elektronik (hsv//swe)

ENGINEERING AND TECHNOLOGY  -- Electrical Engineering, Electronic Engineering, Information Engineering -- Other Electrical Engineering, Electronic Engineering, Information Engineering (hsv//eng)

Keyword

holography

electron beam lithography

Publication and Content Type

art (subject category)

ref (subject category)