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On the nature of th...
On the nature of the interfacial layer in ultra-thin TiN/LaluO3 gate stacks
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- Mitrovic, I. Z. (author)
- University of Liverpool
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- Hall, S. (author)
- University of Liverpool
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- Sedghi, N. (author)
- University of Liverpool
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- Simutis, G. (author)
- University of Liverpool
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- Dhanak, V. R. (author)
- University of Liverpool
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- Bailey, P. (author)
- Daresbury Laboratory
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- Noakes, T. Q. C. (author)
- Daresbury Laboratory
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Alexandrou, I. (author)
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- Engström, Olof, 1943 (author)
- Chalmers tekniska högskola,Chalmers University of Technology
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- Lopes, J. M. J. (author)
- Forschungszentrum Jülich GmbH
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- Schubert, J. (author)
- Forschungszentrum Jülich GmbH
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(creator_code:org_t)
- AIP Publishing, 2012
- 2012
- English.
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In: Journal of Applied Physics. - : AIP Publishing. - 0021-8979 .- 1089-7550. ; 112:4, s. 044102-
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Abstract
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- We present a detailed investigation on the nature of the interfacial layer (IL) in ultra-thin TiN/LaLuO3 (LLO) gate stacks, which is of importance to facilitate CMOS scaling. The molecular beam deposited LaLuO3 films are found to be amorphous by high-resolution transmission electron microscopy. A similar to 9 angstrom thick LaLuO3/interlayer transition observed by medium energy ion scattering correlates with the presence of a dual silicate/SiO2-like interfacial layer derived from the analysis of photoelectron line positions and electron energy loss spectra. A theoretical model is used for the dielectric transition in a bi-layer LaLuO3/IL structure, linking physical and electrical characterization data. The obtained leakage current of 10(-3) A/cm(2) at 1.5 V and equivalent oxide thickness of 0.75 nm for TiN/LaLuO3 gate stacks are adequate for scaling in the 14-12 nm node.
Subject headings
- TEKNIK OCH TEKNOLOGIER -- Materialteknik (hsv//swe)
- ENGINEERING AND TECHNOLOGY -- Materials Engineering (hsv//eng)
- TEKNIK OCH TEKNOLOGIER -- Nanoteknik (hsv//swe)
- ENGINEERING AND TECHNOLOGY -- Nano-technology (hsv//eng)
Keyword
- OXIDES
- FILMS
- DEPOSITION
- MOSFETS
- DIELECTRICS
- INTEGRATION
Publication and Content Type
- art (subject category)
- ref (subject category)
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- By the author/editor
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Mitrovic, I. Z.
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Hall, S.
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Sedghi, N.
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Simutis, G.
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Dhanak, V. R.
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Bailey, P.
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show more...
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Noakes, T. Q. C.
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Alexandrou, I.
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Engström, Olof, ...
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Lopes, J. M. J.
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Schubert, J.
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show less...
- About the subject
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- ENGINEERING AND TECHNOLOGY
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ENGINEERING AND ...
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and Materials Engine ...
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- ENGINEERING AND TECHNOLOGY
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ENGINEERING AND ...
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and Nano technology
- Articles in the publication
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Journal of Appli ...
- By the university
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Chalmers University of Technology