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Vertical scaling of...
Vertical scaling of gate-to-channel distance for a 70 nm InP pseudomorphic HEMT technology
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- Borg, Malin, 1978 (author)
- Chalmers tekniska högskola,Chalmers University of Technology
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- Grahn, Jan, 1962 (author)
- Chalmers tekniska högskola,Chalmers University of Technology
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- Wang, Shu Min, 1963 (author)
- Chalmers tekniska högskola,Chalmers University of Technology
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- Mellberg, Anders, 1964 (author)
- Chalmers tekniska högskola,Chalmers University of Technology
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- Zirath, Herbert, 1955 (author)
- Chalmers tekniska högskola,Chalmers University of Technology
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(creator_code:org_t)
- 2005
- 2005
- English.
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In: Proceed. of Conf on InP and Related Materials (IPRM'05). ; , s. 204-207
- Related links:
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Subject headings
- TEKNIK OCH TEKNOLOGIER -- Elektroteknik och elektronik -- Annan elektroteknik och elektronik (hsv//swe)
- ENGINEERING AND TECHNOLOGY -- Electrical Engineering, Electronic Engineering, Information Engineering -- Other Electrical Engineering, Electronic Engineering, Information Engineering (hsv//eng)
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