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Reversible metal-insulator transition of Ar-irradiated LaAlO3/SrTiO3 interfaces

Aurino, Pier Paolo, 1985 (author)
Chalmers tekniska högskola,Chalmers University of Technology
Kalaboukhov, Alexei, 1975 (author)
Chalmers tekniska högskola,Chalmers University of Technology
Tuzla, Nikolina, 1980 (author)
Chalmers tekniska högskola,Chalmers University of Technology
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Olsson, Eva, 1960 (author)
Chalmers tekniska högskola,Chalmers University of Technology
Klein, A. (author)
Technische Universität Darmstadt
Erhart, Paul, 1978 (author)
Chalmers tekniska högskola,Chalmers University of Technology
Boikov, Y. A. (author)
Russian Academy of Sciences
Serenkov, I.T. (author)
Russian Academy of Sciences
Sakharov, V.I. (author)
Russian Academy of Sciences
Claeson, Tord, 1938 (author)
Chalmers tekniska högskola,Chalmers University of Technology
Winkler, Dag, 1957 (author)
Chalmers tekniska högskola,Chalmers University of Technology
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 (creator_code:org_t)
2015
2015
English.
In: Physical Review B - Condensed Matter and Materials Physics. - 2469-9950 .- 2469-9969. ; 92:15
  • Journal article (peer-reviewed)
Abstract Subject headings
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  • The conducting state of a quasi-two-dimensional electron gas (q2DEG), formed at the heterointerface between the two wide-bandgap insulators LaAlO3 (LAO) and SrTiO3, can be made completely insulating by low-energy, 150-eV, Ar+ irradiation. The metallic behavior of the interface can be recovered by high-temperature oxygen annealing. The electrical transport properties of the recovered q2DEG are exactly the same as before the irradiation. Microstructural investigations confirm that the transition is not due to physical etching or crystal lattice distortion of the LAO film below its critical thickness. They also reveal a correlation between electrical state, LAO film surface amorphization, and argon ion implantation. The experimental results are in agreement with density functional theory calculations of Ar implantation and migration in the LAO film. This suggests that the metal-insulator transition may be caused by charge trapping in the defect amorphous layer created during the ion irradiation.

Subject headings

TEKNIK OCH TEKNOLOGIER  -- Nanoteknik (hsv//swe)
ENGINEERING AND TECHNOLOGY  -- Nano-technology (hsv//eng)

Publication and Content Type

art (subject category)
ref (subject category)

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