X-RAY PHOTOELECTRON SPECTROSCOPY FOR LAYER-BY-LAYER PHASE ANALYSIS OF NbN THIN FILMS

• This paper studied the chemical and phase composition of NbN thin films by x-ray photoelectron spectroscopy (XPS).Determined the relative concentrations of (O, Nb, N, C, Si) and carried out layer-by-layer phase analysis of the filmsbefore sputtering and after each cycle of sputtering. Before spraying in the nitride film detected two different phasestates niobium nitride, NbN, and presumably this Nb5N6. Analysis of the Nb 3d and C 1s lines allowed to reveal inaddition to these phases of niobium nitride, various oxides of niobium (Nb2O5, NbO2, Nb2O3, NbO) and NbNOx

Subject headings

TEKNIK OCH TEKNOLOGIER  -- Materialteknik (hsv//swe)

ENGINEERING AND TECHNOLOGY  -- Materials Engineering (hsv//eng)

TEKNIK OCH TEKNOLOGIER  -- Nanoteknik (hsv//swe)

ENGINEERING AND TECHNOLOGY  -- Nano-technology (hsv//eng)

NATURVETENSKAP  -- Fysik -- Den kondenserade materiens fysik (hsv//swe)

NATURAL SCIENCES  -- Physical Sciences -- Condensed Matter Physics (hsv//eng)

Keyword

XPS

chemical composition

thin films

spectral lines

Publication and Content Type

kon (subject category)

ref (subject category)