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XPS Depth Profiling...
XPS Depth Profiling of Air-Oxidized Nanofilms of NbN on GaN Buffer-Layers
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- Lubenchenko, AV, 1966 (author)
- National Research University Moscow Power Engineering Institute
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- Batrakov, AA (author)
- National Research University Moscow Power Engineering Institute
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- Krause, Sascha, 1989 (author)
- Chalmers tekniska högskola,Chalmers University of Technology
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- Pavolotskiy, Alexey, 1968 (author)
- Chalmers tekniska högskola,Chalmers University of Technology
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- Shurkaeva, IV (author)
- National Research University Moscow Power Engineering Institute
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- Ivanov, DA (author)
- National Research University Moscow Power Engineering Institute
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- Lubenchenko, OI (author)
- National Research University Moscow Power Engineering Institute
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(creator_code:org_t)
- 2017-11-23
- 2017
- English.
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In: Journal of Physics: Conference Series. - : IOP Publishing. - 1742-6588 .- 1742-6596. ; 917:9
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Abstract
Subject headings
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- XPS depth chemical and phase profiling of an air-oxidized niobium nitride thin film on a buffer-layer GaN is performed. It is found that an intermediate layer of Nb5N6 and NbON x under the layer of niobium oxide is generated.I
Subject headings
- NATURVETENSKAP -- Fysik -- Den kondenserade materiens fysik (hsv//swe)
- NATURAL SCIENCES -- Physical Sciences -- Condensed Matter Physics (hsv//eng)
Publication and Content Type
- kon (subject category)
- ref (subject category)
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