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Low contact resista...
Low contact resistance in epitaxial graphene devices for quantum metrology
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- Yager, Thomas, 1987 (author)
- Chalmers tekniska högskola,Chalmers University of Technology
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- Lartsev, Arseniy, 1987 (author)
- Chalmers tekniska högskola,Chalmers University of Technology,Chalmers, Sweden
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- Cedergren, Karin, 1975 (author)
- University of New South Wales (UNSW),University of New S Wales, Australia
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- Yakimova, Rositsa (author)
- Linköpings universitet,Halvledarmaterial,Tekniska fakulteten
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- Panchal, V. (author)
- National Physical Laboratory (NPL),National Phys Lab, England
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- Kazakova, O. (author)
- National Physical Laboratory (NPL),National Phys Lab, England
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- Tzalenchuk, A.Y. (author)
- Royal Holloway University of London,National Physical Laboratory (NPL),National Phys Lab, England; University of London, England
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- Kim, Kyung Ho, 1984 (author)
- Seoul National University,Seoul National University, South Korea
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- Park, YungWoo (author)
- Seoul National University
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- Lara Avila, Samuel, 1983 (author)
- Chalmers tekniska högskola,Chalmers University of Technology,Chalmers, Sweden
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- Kubatkin, Sergey, 1959 (author)
- Chalmers tekniska högskola,Chalmers University of Technology,Chalmers, Sweden
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- Yager, Tom (author)
- Chalmers, Sweden
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- Woo Park, Yung (author)
- Seoul National University, South Korea
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(creator_code:org_t)
- AIP Publishing, 2015
- 2015
- English.
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In: AIP Advances. - : AIP Publishing. - 2158-3226 .- 2158-3226. ; 5:8, s. 087134-
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Abstract
Subject headings
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- We investigate Ti/Au contacts to monolayer epitaxial graphene on SiC (0001) for applications in quantum resistance metrology. Using three-terminal measurements in the quantum Hall regime we observed variations in contact resistances ranging from a minimal value of 0.6 Ω up to 11 kΩ. We identify a major source of high-resistance contacts to be due bilayer graphene interruptions to the quantum Hall current, whilst discarding the effects of interface cleanliness and contact geometry for our fabricated devices. Moreover, we experimentally demonstrate methods to improve the reproducibility of low resistance contacts (
Subject headings
- TEKNIK OCH TEKNOLOGIER -- Materialteknik (hsv//swe)
- ENGINEERING AND TECHNOLOGY -- Materials Engineering (hsv//eng)
- TEKNIK OCH TEKNOLOGIER -- Nanoteknik (hsv//swe)
- ENGINEERING AND TECHNOLOGY -- Nano-technology (hsv//eng)
- NATURVETENSKAP -- Kemi (hsv//swe)
- NATURAL SCIENCES -- Chemical Sciences (hsv//eng)
Publication and Content Type
- art (subject category)
- ref (subject category)
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Yager, Thomas, 1 ...
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Lartsev, Arseniy ...
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Cedergren, Karin ...
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Yakimova, Rosits ...
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Panchal, V.
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Kazakova, O.
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Tzalenchuk, A.Y.
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Kim, Kyung Ho, 1 ...
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Park, YungWoo
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Lara Avila, Samu ...
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Kubatkin, Sergey ...
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Yager, Tom
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Woo Park, Yung
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- About the subject
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- ENGINEERING AND TECHNOLOGY
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ENGINEERING AND ...
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and Materials Engine ...
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- ENGINEERING AND TECHNOLOGY
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ENGINEERING AND ...
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and Nano technology
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- NATURAL SCIENCES
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NATURAL SCIENCES
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and Chemical Science ...
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Chalmers University of Technology
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Linköping University