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Low contact resistance in epitaxial graphene devices for quantum metrology

Yager, Thomas, 1987 (author)
Chalmers tekniska högskola,Chalmers University of Technology
Lartsev, Arseniy, 1987 (author)
Chalmers tekniska högskola,Chalmers University of Technology,Chalmers, Sweden
Cedergren, Karin, 1975 (author)
University of New South Wales (UNSW),University of New S Wales, Australia
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Yakimova, Rositsa (author)
Linköpings universitet,Halvledarmaterial,Tekniska fakulteten
Panchal, V. (author)
National Physical Laboratory (NPL),National Phys Lab, England
Kazakova, O. (author)
National Physical Laboratory (NPL),National Phys Lab, England
Tzalenchuk, A.Y. (author)
Royal Holloway University of London,National Physical Laboratory (NPL),National Phys Lab, England; University of London, England
Kim, Kyung Ho, 1984 (author)
Seoul National University,Seoul National University, South Korea
Park, YungWoo (author)
Seoul National University
Lara Avila, Samuel, 1983 (author)
Chalmers tekniska högskola,Chalmers University of Technology,Chalmers, Sweden
Kubatkin, Sergey, 1959 (author)
Chalmers tekniska högskola,Chalmers University of Technology,Chalmers, Sweden
Yager, Tom (author)
Chalmers, Sweden
Woo Park, Yung (author)
Seoul National University, South Korea
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 (creator_code:org_t)
AIP Publishing, 2015
2015
English.
In: AIP Advances. - : AIP Publishing. - 2158-3226 .- 2158-3226. ; 5:8, s. 087134-
  • Journal article (peer-reviewed)
Abstract Subject headings
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  • We investigate Ti/Au contacts to monolayer epitaxial graphene on SiC (0001) for applications in quantum resistance metrology. Using three-terminal measurements in the quantum Hall regime we observed variations in contact resistances ranging from a minimal value of 0.6 Ω up to 11 kΩ. We identify a major source of high-resistance contacts to be due bilayer graphene interruptions to the quantum Hall current, whilst discarding the effects of interface cleanliness and contact geometry for our fabricated devices. Moreover, we experimentally demonstrate methods to improve the reproducibility of low resistance contacts (

Subject headings

TEKNIK OCH TEKNOLOGIER  -- Materialteknik (hsv//swe)
ENGINEERING AND TECHNOLOGY  -- Materials Engineering (hsv//eng)
TEKNIK OCH TEKNOLOGIER  -- Nanoteknik (hsv//swe)
ENGINEERING AND TECHNOLOGY  -- Nano-technology (hsv//eng)
NATURVETENSKAP  -- Kemi (hsv//swe)
NATURAL SCIENCES  -- Chemical Sciences (hsv//eng)

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