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Gate stacks
Gate stacks
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- Engström, Olof, 1943 (author)
- Chalmers tekniska högskola,Chalmers University of Technology
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- Mitrovic, I. Z. (author)
- University of Liverpool
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- Hall, S. (author)
- University of Liverpool
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- Raeissi, Bahman, 1979 (author)
- Tyndall National Institute at National University of Ireland, Cork
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- Cherkaoui, K. (author)
- Tyndall National Institute at National University of Ireland, Cork
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- Monaghan, S (author)
- Tyndall National Institute at National University of Ireland, Cork
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Gottlob, H. D. B. (author)
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- Lemme, M.C. (author)
- Harvard University
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(creator_code:org_t)
- 2013-03-05
- 2013
- English.
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In: Nanoscale CMOS: Innovative Materials, Modeling and Characterization. - : Wiley. ; , s. 23 - 67
- Related links:
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http://dx.doi.org/10...
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https://doi.org/10.1...
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https://research.cha...
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Subject headings
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Subject headings
- TEKNIK OCH TEKNOLOGIER -- Elektroteknik och elektronik -- Annan elektroteknik och elektronik (hsv//swe)
- ENGINEERING AND TECHNOLOGY -- Electrical Engineering, Electronic Engineering, Information Engineering -- Other Electrical Engineering, Electronic Engineering, Information Engineering (hsv//eng)
Keyword
- AlN buffer layer
- GdSiO/LaSiO
- MOSFETs
- Metal gate
- Gate stacks
Publication and Content Type
- kap (subject category)
- vet (subject category)
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- By the author/editor
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Engström, Olof, ...
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Mitrovic, I. Z.
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Hall, S.
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Raeissi, Bahman, ...
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Cherkaoui, K.
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Monaghan, S
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show more...
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Gottlob, H. D. B ...
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Lemme, M.C.
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show less...
- About the subject
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- ENGINEERING AND TECHNOLOGY
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ENGINEERING AND ...
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and Electrical Engin ...
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and Other Electrical ...
- Articles in the publication
- Nanoscale CMOS: ...
- By the university
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Chalmers University of Technology