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Oxidation behavior ...
Oxidation behavior at 300–1000C of a (Mo,W)Si2-based composite containing boride
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- Ingemarsson, Linda, 1972 (author)
- Chalmers tekniska högskola,Chalmers University of Technology
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- Halvarsson, Mats, 1965 (author)
- Chalmers tekniska högskola,Chalmers University of Technology
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- Hellström, Kristina M, 1971 (author)
- Chalmers tekniska högskola,Chalmers University of Technology
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- Jonsson, Torbjörn, 1970 (author)
- Chalmers tekniska högskola,Chalmers University of Technology
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Sundberg, Mats, 1964 (author)
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- Johansson, Lars-Gunnar, 1952 (author)
- Chalmers tekniska högskola,Chalmers University of Technology
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- Svensson, Jan-Erik, 1965 (author)
- Chalmers tekniska högskola,Chalmers University of Technology
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(creator_code:org_t)
- Elsevier BV, 2010
- 2010
- English.
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In: Intermetallics. - : Elsevier BV. - 0966-9795. ; 18:1, s. 77-86
- Related links:
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http://dx.doi.org/10...
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https://doi.org/10.1...
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Abstract
Subject headings
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- The oxidation behavior of a (Mo,W)Si2 composite with boride addition was examined at 300–1000C for24 h in dry O2. The oxidation kinetics was studied using a thermobalance, and the oxide scales wereanalyzed using a combination of electron microscopy (SEM/EDX, FIB, BIB) and XRD. Accelerated oxidationwas found to occur between 500C and 675C, with a peak mass gain at 625C. The rapid oxidation isattributed to the vaporization of molybdenum oxide that leaves a porous and poorly protective silicalayer behind. At higher temperature (700–1000C) a protective scale forms, consisting of a dense SiO2/B2O3 glass.
Subject headings
- TEKNIK OCH TEKNOLOGIER -- Materialteknik (hsv//swe)
- ENGINEERING AND TECHNOLOGY -- Materials Engineering (hsv//eng)
Keyword
- scanning
- B. Oxidation
- F. Electron microscopy
- A. Molybdenum silicides
- F. Diffraction
- D. Microstructure
Publication and Content Type
- art (subject category)
- ref (subject category)
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