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Characterization of Interface Defects
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- Hurley, P.K. (author)
- Tyndall National Institute at National University of Ireland, Cork
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- Engström, Olof, 1943 (author)
- Chalmers tekniska högskola,Chalmers University of Technology
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- Bauza, D. (author)
- Institut de la Microelectronique, Electromagnetisme et Photonique - Laboratoire d'Hyperfrequences et de Caracterisation
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- (creator_code:org_t)
- 2013-03-05
- 2013
- English.
- In: Nanoscale CMOS (ed. Balestra). - : Wiley. ; , s. 545-573
- Book chapter (other academic/artistic)
Subject headings
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Subject headings
- TEKNIK OCH TEKNOLOGIER -- Elektroteknik och elektronik (hsv//swe)
- ENGINEERING AND TECHNOLOGY -- Electrical Engineering, Electronic Engineering, Information Engineering (hsv//eng)
Keyword
- Interface defect
- Low frequency noise
- Charge pumping
- LF noise
- C-V response
Publication and Content Type
- kap (subject category)
- vet (subject category)
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- Nanoscale CMOS (ed. Balestra) (Search for host publication in LIBRIS)
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- Chalmers University of Technology
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