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Ferroelectric thin ...
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Setter, NavaEcole Polytechnique Federale de Lausanne (EPFL),Swiss Federal Institute of Technology in Lausanne (EPFL)
(author)
Ferroelectric thin films: Review of materials, properties, and applications
- Article/chapterEnglish2006
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LIBRIS-ID:oai:research.chalmers.se:eb7970ad-7e4b-4b44-a6c3-354bd5914e17
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https://research.chalmers.se/publication/25813URI
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https://doi.org/10.1063/1.2336999DOI
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Language:English
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Summary in:English
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Subject category:art swepub-publicationtype
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Subject category:ref swepub-contenttype
Notes
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An overview of the state of art in ferroelectric thin films is presented. First, we review applications: microsystems' applications, applications in high frequency electronics, and memories based on ferroelectric materials. The second section deals with materials, structure (domains, in particular), and size effects. Properties of thin films that are important for applications are then addressed: polarization reversal and properties related to the reliability of ferroelectric memories, piezoelectric nonlinearity of ferroelectric films which is relevant to microsystems' applications, and permittivity and loss in ferroelectric films-important in all applications and essential in high frequency devices. In the context of properties we also discuss nanoscale probing of ferroelectrics. Finally, we comment on two important emerging topics: multiferroic materials and ferroelectric one-dimensional nanostructures. (c) 2006 American Institute of Physics.
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Damjanovic, D.Ecole Polytechnique Federale de Lausanne (EPFL),Swiss Federal Institute of Technology in Lausanne (EPFL)
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Eng, L.Technische Universität Dresden
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Fox, G.
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Gevorgian, Spartak,1948Chalmers tekniska högskola,Chalmers University of Technology(Swepub:cth)spartak
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Hong, S.
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Kingon, A.North Carolina State University
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Kohlstedt, H.Forschungszentrum Jülich GmbH,University of California
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Park, N. Y.
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Stephenson, G. B.Argonne National Laboratory
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Stolitchnov, I.Ecole Polytechnique Federale de Lausanne (EPFL),Swiss Federal Institute of Technology in Lausanne (EPFL)
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Taganstev, A. K.Ecole Polytechnique Federale de Lausanne (EPFL),Swiss Federal Institute of Technology in Lausanne (EPFL)
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Taylor, D. V.Nanosys, Inc.,Ecole Polytechnique Federale de Lausanne (EPFL),Swiss Federal Institute of Technology in Lausanne (EPFL)
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Yamada, T.Ecole Polytechnique Federale de Lausanne (EPFL),Swiss Federal Institute of Technology in Lausanne (EPFL)
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Streiffer, S.Argonne National Laboratory
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Ecole Polytechnique Federale de Lausanne (EPFL)Technische Universität Dresden
(creator_code:org_t)
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In:Journal of Applied Physics: AIP Publishing100:5, s. 051606-1-46-0021-89791089-7550
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Setter, Nava
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Damjanovic, D.
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Eng, L.
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Fox, G.
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Gevorgian, Spart ...
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Hong, S.
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Kingon, A.
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Kohlstedt, H.
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Park, N. Y.
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Stephenson, G. B ...
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Stolitchnov, I.
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Taganstev, A. K.
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Taylor, D. V.
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Yamada, T.
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Streiffer, S.
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NATURAL SCIENCES
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Chalmers University of Technology