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Microstructural Inv...
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Canovic, Sead,1979Chalmers tekniska högskola,Chalmers University of Technology
(author)
Microstructural Investigation of the Initial Oxidation of the FeCrAlRE Alloy Kanthal AF in Dry and Wet O-2 at 600 and 800 degrees C
- Article/chapterEnglish2010
Publisher, publication year, extent ...
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The Electrochemical Society,2010
Numbers
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LIBRIS-ID:oai:research.chalmers.se:eec08a3f-0b6c-46e8-aeae-4177b7e4ed72
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https://doi.org/10.1149/1.3391447DOI
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https://research.chalmers.se/publication/122409URI
Supplementary language notes
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Language:English
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Summary in:English
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Subject category:art swepub-publicationtype
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Subject category:ref swepub-contenttype
Notes
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The FeCrAlRE (where RE is reactive element) alloy Kanthal AF was exposed isothermally at 600 and 800 degrees C for 72 h in dry O-2 and in O-2 with 10 vol % H2O. The mass gains were 3-5 times higher at the higher temperature. The presence of water vapor increased the oxidation rate at 800 degrees C, while no significant effect was observed at 600 degrees C. A thin two-layered oxide formed at 600 degrees C: an outer (Fe, Cr)(2)O-3 corundum-type oxide, containing some Al, and an inner, probably amorphous, Al-rich oxide. At 800 degrees C a two-layered oxide formed in both environments. The inner layer consisted of inward grown alpha-Al2O3. In dry O-2 the originally formed outward grown gamma-Al2O3 had transformed to alpha-Al2O3 after 72 h. Water vapor stabilized the outward grown gamma-Al2O3 and hence no transformation occurred after 72 h in humid environment. RE-rich oxide particles with varying composition (Y, Zr, and Ti) were distributed in the base oxide at both temperatures and in both environments. The RE-rich particles were separated from the alloy substrate by a layer of Al-rich oxide. At 800 degrees C the Y-rich RE particles were surrounded by thick oxide patches in both dry and humid O-2.
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Engkvist, Josefin,1972Högskolan i Dalarna,Dalarna university(Swepub:cth)josengk
(author)
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Liu, Fang,1975Chalmers tekniska högskola,Chalmers University of Technology(Swepub:cth)fangliu
(author)
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Lai, Haiping,1979Chalmers tekniska högskola,Chalmers University of Technology(Swepub:cth)haiping
(author)
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Götlind, Helena,1978Chalmers tekniska högskola,Chalmers University of Technology(Swepub:cth)helenaj
(author)
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Hellström, Kristina M,1971Chalmers tekniska högskola,Chalmers University of Technology(Swepub:cth)krh
(author)
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Svensson, Jan-Erik,1965Chalmers tekniska högskola,Chalmers University of Technology(Swepub:cth)jes
(author)
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Johansson, Lars-Gunnar,1952Chalmers tekniska högskola,Chalmers University of Technology(Swepub:cth)lg
(author)
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Olsson, M.Högskolan i Dalarna,Dalarna university
(author)
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Halvarsson, Mats,1965Chalmers tekniska högskola,Chalmers University of Technology(Swepub:cth)f10mh
(author)
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Chalmers tekniska högskolaHögskolan i Dalarna
(creator_code:org_t)
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In:Journal of the Electrochemical Society: The Electrochemical Society157:6, s. C223-C2301945-71110013-4651
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