Modeling of high power impulse magnetron sputtering discharges with tungsten target

Babu, Swetha SureshUniv Iceland, Sci Inst, Dunhaga 3, IS-107 Reykjavik, Iceland. (författare)

QC 20230404
Funding Agencies|Icelandic Research Fund [196141]; Free State of Saxony; European Regional Development Fund [100336119]; Swedish Government Strategic Research Area in Materials Science on Functional Materials at Linkoping University [2009-00971]
The ionization region model (IRM) is applied to model a high power impulse magnetron sputtering discharge with a tungsten target. The IRM gives the temporal variation of the various species and the average electron energy, as well as internal discharge parameters such as the ionization probability and the back-attraction probability of the sputtered species. It is shown that an initial peak in the discharge current is due to argon ions bombarding the cathode target. After the initial peak, the W+ ions become the dominating ions and remain as such to the end of the pulse. We demonstrate how the contribution of the W+ ions to the total discharge current at the target surface increases with increased discharge voltage for peak discharge current densities J (D,peak) in the range 0.33-0.73 A cm(-2). For the sputtered tungsten the ionization probability increases, while the back-attraction probability decreases with increasing discharge voltage. Furthermore, we discuss the findings in terms of the generalized recycling model and compare to experimentally determined deposition rates and find good agreement.

Rudolph, MartinLeibniz Inst Surface Engn IOM, Permoserstr 15, D-04318 Leipzig, Germany. (författare)
Lundin, DanielLinköpings universitet,Plasma och ytbeläggningsfysik,Tekniska fakulteten(Swepub:liu)danlu03 (författare)
Shimizu, TetsuhideTokyo Metropolitan Univ, Grad Sch Syst Design, Dept Mech Syst Engn, 6-6 Asahigaoka, Hino, Tokyo 1910065, Japan. (författare)
Fischer, JoelLinköpings universitet,Plasma och ytbeläggningsfysik,Tekniska fakulteten(Swepub:liu)joefi56 (författare)
Raadu, Michael A.KTH,Rymd- och plasmafysik,KTH Royal Inst Technol, Sweden(Swepub:kth)u1ajzw7w (författare)
Brenning, NilsLinköpings universitet,KTH,Rymd- och plasmafysik,Linköping Univ, Plasma & Coatings Phys Div, IFM Mat Phys, SE-58183 Linköping, Sweden.,Plasma och ytbeläggningsfysik,Tekniska fakulteten,KTH Royal Inst Technol, Sweden(Swepub:liu)nilbr83 (författare)
Gudmundsson, Jon Tomas,1965-KTH,Rymd- och plasmafysik,Univ Iceland, Sci Inst, Dunhaga 3, IS-107 Reykjavik, Iceland.,Univ Iceland, Iceland; KTH Royal Inst Technol, Sweden(Swepub:kth)u1q27a34 (författare)
Univ Iceland, Sci Inst, Dunhaga 3, IS-107 Reykjavik, Iceland.Leibniz Inst Surface Engn IOM, Permoserstr 15, D-04318 Leipzig, Germany. (creator_code:org_t)

Ingår i:Plasma sources science & technology: IOP Publishing31:6, s. 065009-0963-02521361-6595

Av författaren/redakt...: Babu, Swetha Sur ...; Rudolph, Martin; Lundin, Daniel; Shimizu, Tetsuhi ...; Fischer, Joel; Raadu, Michael A ...; visa fler...; Brenning, Nils; Gudmundsson, Jon ...; visa färre...

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