Gas phase chemical vapor deposition chemistry of triethylboron probed by boron-carbon thin film deposition and quantum chemical calculations

Imam, MewludeLinköpings universitet,Tekniska fakulteten,Tunnfilmsfysik,European Spallat Source ESS AB, Sweden (författare)

Funding Agencies|European Spallation Source ESS AB; Knut and Alice Wallenberg Foundation; German Science Foundation (Research Training Group 1782); Beilstein Foundation (Frankfurt/Germany)
We present triethylboron (TEB) as a single-source precursor for chemical vapor deposition (CVD) of BxC thin films and study its gas phase chemistry under CVD conditions by quantum chemical calculations. A comprehensive thermochemical catalogue for the species of the gas phase chemistry of TEB is examined and found to be dominated by beta-hydride eliminations of C2H4 to yield BH3. A complementary bimolecular reaction path based on H-2 assisted C2H6 elimination to BH3 is also significant at lower temperatures in the presence of hydrogen. Furthermore, we find a temperature window of 600-1000 degrees C for the deposition of X-ray amorphous BxC films with 2.5 less than= x less than= 4.5 from TEB. Films grown at temperatures below 600 degrees C contain high amounts of H, while temperatures above 1000 degrees C result in C-rich films. The film density and hardness are determined to be in the range of 2.40-2.65 g cm(-3) and 29-39 GPa, respectively, within the determined temperature window.

Gaul, KonstantinUniversity of Marburg, Germany; University of Marburg, Germany (författare)
Stegmueller, AndreasUniversity of Marburg, Germany; University of Marburg, Germany (författare)
Höglund, CarinaLinköping University,Lund University,Lunds universitet,Linköpings universitet,Tunnfilmsfysik,Tekniska fakulteten,European Spallat Source ESS AB, Sweden,European Spallation Source ESS AB,Stiftelser och övriga anknutna verksamheter,Other Institutions and Utilities(Swepub:lu)esss-crh (författare)
Jensen, JensLinköpings universitet,Tunnfilmsfysik,Tekniska fakulteten(Swepub:liu)jenje80 (författare)
Hultman, LarsLinköpings universitet,Tunnfilmsfysik,Tekniska fakulteten(Swepub:liu)larhu75 (författare)
Birch, JensLinköpings universitet,Tunnfilmsfysik,Tekniska fakulteten(Swepub:liu)jenbi91 (författare)
Tonner, RalfUniversity of Marburg, Germany; University of Marburg, Germany (författare)
Pedersen, HenrikLinköpings universitet,Kemi,Tekniska fakulteten(Swepub:liu)henpe50 (författare)
Linköpings universitetTekniska fakulteten (creator_code:org_t)

Ingår i:Journal of Materials Chemistry C: ROYAL SOC CHEMISTRY3:41, s. 10898-109062050-75262050-7534

Av författaren/redakt...: Imam, Mewlude; Gaul, Konstantin; Stegmueller, And ...; Höglund, Carina; Jensen, Jens; Hultman, Lars; visa fler...; Birch, Jens; Tonner, Ralf; Pedersen, Henrik; visa färre...

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