Annealing studies of nanocomposite Ti-Si-C thin films with respect to phase stability and tribological performance

Nanocomposite Ti-Si-C thin films were deposited by dc magnetron sputtering from a Ti3SiC2 target onto Si(1 0 0) and high-speed steel substrates at 300 °C. The as-deposited films consisted of nanocrystalline (nc-) TiCx and amorphous (a-) SiCx, as determined by X-ray diffraction (XRD) and X-ray photoelectron spectroscopy (XPS). Annealing in vacuum up to 1450 °C resulted in improved crystallinity and a decreased volume fraction of the amorphous phase. Additionally, differential scanning calorimetry (DSC) was used to monitor heat flows connected to the respective reactions in the material, where a broad exothermic peak attributed to grain growth of crystalline TiCx appeared, while an exothermic reaction related to the formation of Ti3SiC2 was not detected. Tribological testing in a ball-on-disk setup was conducted at room temperature, 500 and 700 °C against an alumina counterpart. The room temperature measurement resulted in a coefficient of friction value of 0.8, at elevated temperatures the coefficient of friction decreased to 0.4. © 2006 Elsevier B.V. All rights reserved.

Neidhardt, Jörg,1976-Linköpings universitet,Tekniska högskolan,Tunnfilmsfysik(Swepub:liu)jorne78 (författare)
Eklund, Per,1977-Linköpings universitet,Tekniska högskolan,Tunnfilmsfysik(Swepub:liu)perek02 (författare)
Emmerlich, Jens,1974-Linköpings universitet,Tekniska högskolan,Tunnfilmsfysik(Swepub:liu)jenem14 (författare)
Ljungcrantz, H. (författare)
Hultman, Lars,1960-Linköpings universitet,Tekniska högskolan,Tunnfilmsfysik(Swepub:liu)larhu75 (författare)
Mitterer, C. (författare)
Linköpings universitetTekniska högskolan (creator_code:org_t)

Ingår i:Materials Science & Engineering: Elsevier BV429:1-2, s. 90-950921-50931873-4936

Av författaren/redakt...: Rester, M.; Neidhardt, Jörg, ...; Eklund, Per, 197 ...; Emmerlich, Jens, ...; Ljungcrantz, H.; Hultman, Lars, 1 ...; visa fler...; Mitterer, C.; visa färre...

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