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Scanning spreading ...
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Osterman, J.Department of Microelectronics, Royal Institute of Technology, PO Box Electrum 229, S 164 40 Kista, Sweden
(författare)
Scanning spreading resistance microscopy of aluminum implanted 4H-SiC
- Artikel/kapitelEngelska2003
Förlag, utgivningsår, omfång ...
Nummerbeteckningar
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LIBRIS-ID:oai:DiVA.org:liu-46483
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https://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-46483URI
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https://doi.org/10.1016/S0921-5107(03)00018-7DOI
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https://urn.kb.se/resolve?urn=urn:nbn:se:kth:diva-22790URI
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Språk:engelska
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Sammanfattning på:engelska
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Klassifikation
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Ämneskategori:vet swepub-contenttype
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Ämneskategori:kon swepub-publicationtype
Anmärkningar
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QC 20100525
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Results from the application of scanning spreading resistance microscopy (SSRM) for characterization of aluminum implanted 4H-SiC are presented. The implanted profiles are investigated electrically and morphologically as a function of post-implantation anneal conditions. The method is shown to be advantageous for measuring and optimizing the activation in many aspects with respect to existing alternative techniques: it provides information of the entire depth and Al concentration range, it is unaffected by annealing induced re-growth and/or surface roughening, and requires little sample preparation. The results indicate that the apparent activation and surface roughness do not saturate in the investigated temperature range of 1500-1650 °C. Finally, an apparent activation energy for the process of 3 eV is estimated. © 2003 Elsevier B.V. All rights reserved.
Ämnesord och genrebeteckningar
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Activation
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Implantation
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Silicon carbide
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SSRM
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TECHNOLOGY
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TEKNIKVETENSKAP
Biuppslag (personer, institutioner, konferenser, titlar ...)
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Abtin, L.Department of Microelectronics, Royal Institute of Technology, PO Box Electrum 229, S 164 40 Kista, Sweden
(författare)
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Zimmermann, U.Department of Microelectronics, Royal Institute of Technology, PO Box Electrum 229, S 164 40 Kista, Sweden
(författare)
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Janson, M.S.Department of Microelectronics, Royal Institute of Technology, PO Box Electrum 229, S 164 40 Kista, Sweden
(författare)
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Anand, SrinivasanKTH,Mikroelektronik och informationsteknik, IMIT,Department of Microelectronics, Royal Institute of Technology, PO Box Electrum 229, S 164 40 Kista, Sweden(Swepub:kth)u16fqvka
(författare)
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Hallin, ChristerLinköpings universitet,Tekniska högskolan,Institutionen för fysik, kemi och biologi(Swepub:liu)chrha60
(författare)
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Hallén, AndersKTH,Mikroelektronik och informationsteknik, IMIT,Hallén, A., Department of Microelectronics, Royal Institute of Technology, PO Box Electrum 229, S 164 40 Kista, Sweden(Swepub:kth)u11ywmz1
(författare)
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Department of Microelectronics, Royal Institute of Technology, PO Box Electrum 229, S 164 40 Kista, SwedenMikroelektronik och informationsteknik, IMIT
(creator_code:org_t)
Sammanhörande titlar
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Ingår i:Materials Science & Engineering102:1-3, s. 128-1310921-51071873-4944
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