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Anisotropies in mag...
Anisotropies in magnetron sputtered carbon nitride thin films
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Hellgren, N. (författare)
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Johansson, M.P. (författare)
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Broitman, E. (författare)
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- Hultman, Lars (författare)
- Linköpings universitet,Tekniska högskolan,Tunnfilmsfysik
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Sundgren, J.-E. (författare)
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(creator_code:org_t)
- AIP Publishing, 2001
- 2001
- Engelska.
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Ingår i: Applied Physics Letters. - : AIP Publishing. - 0003-6951 .- 1077-3118. ; 78:18, s. 2703-2705
- Relaterad länk:
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https://urn.kb.se/re...
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https://doi.org/10.1...
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Abstract
Ämnesord
Stäng
- Carbon nitride CNx (O=x=0.35) thin films, deposited by reactive dc magnetron sputtering in Ar/N2 discharges have been studied with respect to microstructure using electron microscopy, and elastic modulus using nanoindentation and surface acoustic wave analyses. For growth temperature of 100°C, the films were amorphous, and with an isotropic Young's modulus of ~170-200 GPa essentially unaffected by the nitrogen fraction. The films grown at elevated temperatures (350-550°C) show anisotropic mechanical properties due to a textured microstructure with standing basal planes, as observed from measuring the Young's modulus in different directions. The modulus measured in the plane of the film was ~60-80 GPa, while in the vertical direction the modulus increased considerably from ~25 to ~200 GPa as the nitrogen content was increased above ~15 at. %. © 2001 American Institute of Physics.
Nyckelord
- TECHNOLOGY
- TEKNIKVETENSKAP
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- art (ämneskategori)
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