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High-Performance an...
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Cunha, Jose M. V.INL Int Iberian Nanotechnol Lab, Ave Mestre Jose Veiga, P-4715330 Braga, Portugal.;Univ Aveiro, Dept Fis, Campus Univ Santiago, P-3810193 Aveiro, Portugal.;Univ Aveiro, I3N, Campus Univ Santiago, P-3810193 Aveiro, Portugal.
(författare)
High-Performance and Industrially Viable Nanostructured SiOx Layers for Interface Passivation in Thin Film Solar Cells
- Artikel/kapitelEngelska2021
Förlag, utgivningsår, omfång ...
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2021-01-27
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John Wiley & Sons,2021
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printrdacarrier
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LIBRIS-ID:oai:DiVA.org:uu-449998
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https://urn.kb.se/resolve?urn=urn:nbn:se:uu:diva-449998URI
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https://doi.org/10.1002/solr.202000534DOI
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Språk:engelska
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Sammanfattning på:engelska
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Ämneskategori:ref swepub-contenttype
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Ämneskategori:art swepub-publicationtype
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Herein, it is demonstrated, by using industrial techniques, that a passivation layer with nanocontacts based on silicon oxide (SiOx) leads to significant improvements in the optoelectronical performance of ultrathin Cu(In,Ga)Se-2 (CIGS) solar cells. Two approaches are applied for contact patterning of the passivation layer: point contacts and line contacts. For two CIGS growth conditions, 550 and 500 degrees C, the SiOx passivation layer demonstrates positive passivation properties, which are supported by electrical simulations. Such positive effects lead to an increase in the light to power conversion efficiency value of 2.6% (absolute value) for passivated devices compared with a nonpassivated reference device. Strikingly, both passivation architectures present similar efficiency values. However, there is a trade-off between passivation effect and charge extraction, as demonstrated by the trade-off between open-circuit voltage (V-oc) and short-circuit current density (J(sc)) compared with fill factor (FF). For the first time, a fully industrial upscalable process combining SiOx as rear passivation layer deposited by chemical vapor deposition, with photolithography for line contacts, yields promising results toward high-performance and low-cost ultrathin CIGS solar cells with champion devices reaching efficiency values of 12%, demonstrating the potential of SiOx as a passivation material for energy conversion devices.
Ämnesord och genrebeteckningar
Biuppslag (personer, institutioner, konferenser, titlar ...)
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Oliveira, KevinINL Int Iberian Nanotechnol Lab, Ave Mestre Jose Veiga, P-4715330 Braga, Portugal.
(författare)
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Lontchi, JacksonCatholic Univ Louvain, ICTEAM Inst, Pl Levant 3, B-1348 Louvain La Neuve, Belgium.
(författare)
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Lopes, Tomas S.INL Int Iberian Nanotechnol Lab, Ave Mestre Jose Veiga, P-4715330 Braga, Portugal.;Hasselt Univ Partner Solliance, Inst Mat Res IMO, Agoralaangebouw H, B-3590 Diepenbeek, Belgium.;IMOMEC Partner Solliance, IMEC Div, Wetenschapspk 1, B-3590 Diepenbeek, Belgium.;EnergyVille, Thorpk,Poort Genk 8310 & 8320, B-3600 Genk, Belgium.
(författare)
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Curado, Marco A.INL Int Iberian Nanotechnol Lab, Ave Mestre Jose Veiga, P-4715330 Braga, Portugal.;Univ Coimbra, CFisUC, Dept Phys, P-3004516 Coimbra, Portugal.
(författare)
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Barbosa, Joao R. S.INL Int Iberian Nanotechnol Lab, Ave Mestre Jose Veiga, P-4715330 Braga, Portugal.
(författare)
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Vinhais, CarlosINL Int Iberian Nanotechnol Lab, Ave Mestre Jose Veiga, P-4715330 Braga, Portugal.;Inst Politecn Porto, Inst Super Engn Porto, Dept Fis, P-4200072 Porto, Portugal.
(författare)
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Chen, Wei-ChaoUppsala universitet,Solcellsteknik(Swepub:uu)chewe640
(författare)
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Borme, JeromeINL Int Iberian Nanotechnol Lab, Ave Mestre Jose Veiga, P-4715330 Braga, Portugal.
(författare)
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Fonseca, HelderINL Int Iberian Nanotechnol Lab, Ave Mestre Jose Veiga, P-4715330 Braga, Portugal.
(författare)
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Gaspar, JoaoINL Int Iberian Nanotechnol Lab, Ave Mestre Jose Veiga, P-4715330 Braga, Portugal.
(författare)
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Flandre, DenisCatholic Univ Louvain, ICTEAM Inst, Pl Levant 3, B-1348 Louvain La Neuve, Belgium.
(författare)
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Edoff, Marika,1965-Uppsala universitet,Solcellsteknik(Swepub:uu)maribode
(författare)
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Silva, Ana G.Univ Nova Lisboa, CEFITEC, Fac Ciencias & Tecnol, Dept Fis, Campus Caparica, P-2829516 Lisbon, Portugal.
(författare)
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Teixeira, Jennifer P.INL Int Iberian Nanotechnol Lab, Ave Mestre Jose Veiga, P-4715330 Braga, Portugal.
(författare)
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Fernandes, Paulo A.INL Int Iberian Nanotechnol Lab, Ave Mestre Jose Veiga, P-4715330 Braga, Portugal.;Univ Aveiro, I3N, Campus Univ Santiago, P-3810193 Aveiro, Portugal.;Inst Politecn Porto, Inst Super Engn Porto, CIETI, Dept Fis, P-4200072 Porto, Portugal.
(författare)
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Salome, Pedro M. P.INL Int Iberian Nanotechnol Lab, Ave Mestre Jose Veiga, P-4715330 Braga, Portugal.;Univ Aveiro, Dept Fis, Campus Univ Santiago, P-3810193 Aveiro, Portugal.;Inst Politecn Porto, Inst Super Engn Porto, CIETI, Dept Fis, P-4200072 Porto, Portugal.
(författare)
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INL Int Iberian Nanotechnol Lab, Ave Mestre Jose Veiga, P-4715330 Braga, Portugal.;Univ Aveiro, Dept Fis, Campus Univ Santiago, P-3810193 Aveiro, Portugal.;Univ Aveiro, I3N, Campus Univ Santiago, P-3810193 Aveiro, Portugal.INL Int Iberian Nanotechnol Lab, Ave Mestre Jose Veiga, P-4715330 Braga, Portugal.
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Ingår i:Solar RRL: John Wiley & Sons5:32367-198X
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- Av författaren/redakt...
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Cunha, Jose M. V ...
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Oliveira, Kevin
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Lontchi, Jackson
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Lopes, Tomas S.
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Curado, Marco A.
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Barbosa, Joao R. ...
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visa fler...
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Vinhais, Carlos
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Chen, Wei-Chao
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Borme, Jerome
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Fonseca, Helder
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Gaspar, Joao
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Flandre, Denis
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Edoff, Marika, 1 ...
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Silva, Ana G.
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Teixeira, Jennif ...
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Fernandes, Paulo ...
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Salome, Pedro M. ...
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visa färre...
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