Radical Additions of Bis(trimethylsilyl)phosphite to Vinyltrimethylsilane and Vinyltriethoxysilane: Crystal Structure of 2-Trimethylsilylethylphosphonic Acid

Organosilicon-phosphonate compounds with the general formula (R)n(RO)3mnSi(CH2)mP(O)(OSiR'3)2 are designed for application as novel materials for surface treatments and modifications. A solvothermal method based on the reaction of bis(trimethylsilyl)phosphite with vinyltrimethylsilane and vinyltriethoxysilane in the presence of a peroxide in benzene solvent was used to synthesize the silyl-substituted esters of organosilicon-phosphonate compounds. 2-Trimethylsilylethanephosphonic acid was prepared from its bis(trimethylsilyl) ester by alcoholysis. The crystal structure of the acid consists of two-dimensional arrays built up from the (P--)O--H···O--P hydrogen bonds.

Langer, Vratislav,1949Chalmers tekniska högskola,Chalmers University of Technology(Swepub:cth)langer (författare)
Lindqvist, Oliver,1943Chalmers tekniska högskola,Chalmers University of Technology(Swepub:cth)oliver (författare)
Chalmers tekniska högskola (creator_code:org_t)

Ingår i:Phosphorus, Sulfur and Silicon and the Related Elements: Informa UK Limited178:10, s. 2159-21681042-65071563-5325

Av författaren/redakt...: Mahmoudkhani, Am ...; Langer, Vratisla ...; Lindqvist, Olive ...

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