| 1. |
- Saif-Ul-Allah, Muhammad Waqas, et al.
(author)
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Computationally Inexpensive 1D-CNN for the Prediction of Noisy Data of NOx Emissions From 500 MW Coal-Fired Power Plant
- 2022
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In: Frontiers in Energy Research. - : FRONTIERS MEDIA SA. - 2296-598X. ; 10
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Journal article (peer-reviewed)abstract
- Coal-fired power plants have been used to meet the energy requirements in countries where coal reserves are abundant and are the key source of NOx emissions. Owing to the serious environmental and health concerns associated with NOx emissions, much work has been carried out to reduce NOx emissions. Sophisticated artificial intelligence (AI) techniques have been employed during the past few decades, such as least-squares support vector machine (LSSVM), artificial neural networks (ANN), long short-term memory (LSTM), and gated recurrent unit (GRU), to develop the NOx prediction model. Several studies have investigated deep neural networks (DNN) models for accurate NOx emission prediction. However, there is a need to investigate a DNN-based NOx prediction model that is accurate and computationally inexpensive. Recently, a new AI technique, convolutional neural network (CNN), has been introduced and proven superior for image class prediction accuracy. According to the best of the author's knowledge, not much work has been done on the utilization of CNN on NOx emissions from coal-fired power plants. Therefore, this study investigated the prediction performance and computational time of one-dimensional CNN (1D-CNN) on NOx emissions data from a 500 MW coal-fired power plant. The variations of hyperparameters of LSTM, GRU, and 1D-CNN were investigated, and the performance metrics such as RMSE and computational time were recorded to obtain optimal hyperparameters. The obtained optimal values of hyperparameters of LSTM, GRU, and 1D-CNN were then employed for models' development, and consequently, the models were tested on test data. The 1D-CNN NOx emission model improved the training efficiency in terms of RMSE by 70.6% and 60.1% compared to LSTM and GRU, respectively. Furthermore, the testing efficiency for 1D-CNN improved by 10.2% and 15.7% compared to LSTM and GRU, respectively. Moreover, 1D-CNN (26 s) reduced the training time by 83.8% and 50% compared to LSTM (160 s) and GRU (52 s), respectively. Results reveal that 1D-CNN is more accurate, more stable, and computationally inexpensive compared to LSTM and GRU on NOx emission data from the 500 MW power plant.
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| 2. |
- Asad, Muhammad, 1986, et al.
(author)
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Correlation between material quality and high frequency performance of graphene field-effect transistors
- 2019
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Conference paper (other academic/artistic)abstract
- Correlations between material quality, equivalent circuit and high frequency parameters of the graphene field-effect transistors, such as mobility, contact resistivity, carrier velocity, drain conductivity, transit frequency and maximum frequency of oscillation, have been established via applying drain resistance, velocity and saturation velocity models. The correlations allow for understanding dominant limitations of the high frequency performance of transistors, which clarifies the ways of their further development. In particular, the relatively high drain conductivity is currently main limiting factor, which, however, can be counterbalanced by increasing the carrier velocity via operating transistors at higher fields, in the velocity saturation mode.
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| 3. |
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| 4. |
- Asad, Muhammad, 1986, et al.
(author)
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Enhanced high-frequency performance of top-gated graphene FETs due to substrate-induced improvements in charge carrier saturation velocity
- 2021
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In: IEEE Transactions on Electron Devices. - 1557-9646 .- 0018-9383. ; 68:2, s. 899-902
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Journal article (peer-reviewed)abstract
- High-frequency performance of top-gated graphene field-effect transistors (GFETs) depends to a large extent on the saturation velocity of the charge car-riers, a velocity limited by inelastic scattering by surface optical phonons from the dielectrics surrounding the chan-nel. In this work, we show that by simply changing the graphene channel surrounding dielectric with a material having higher optical phonon energy, one could improve the transit frequency and maximum frequency of oscillation of GFETs. We fabricated GFETs on conventional SiO2/Si substrates by adding a thin Al2O3 interfacial buffer layer on top of SiO2/Si substrates, a material with about 30% higher optical phonon energy than that of SiO2, and compared performance with that of GFETs fabricated without adding the interfacial layer. From S-parameter measurements, a transit frequency and a maximum frequency of oscillation of 43 GHz and 46 GHz, respectively, were obtained for GFETs on Al2O3 with 0.5 µm gate length. These values are approximately 30% higher than those for state-of-the-art GFETs of the same gate length on SiO2. For relating the improvement of GFET high-frequency performance to improvements in the charge carrier saturation velocity, we used standard methods to extract the charge carrier veloc-ity from the channel transit time. A comparison between two sets of GFETs with and without the interfacial Al2O3 layer showed that the charge carrier saturation velocity had increased to 2·10^7 cm/s from 1.5·10^7 cm/s.
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| 5. |
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| 6. |
- Asad, Muhammad, 1986
(author)
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Graphene field-effect transistors for high frequency applications
- 2019
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Licentiate thesis (other academic/artistic)abstract
- Rapid development of wireless and internet communications requires development of new generation high frequency electronics based on new device concepts and new materials. The very high intrinsic velocity of charge carriers in graphene makes it promising new channel material for high frequency electronics. In this thesis, the graphene field-effect transistors (GFETs) are fabricated using chemical vapor deposition (CVD) graphene and investigated for high frequency electronics applications. The characterization and simulation of high frequency performance of the state-of-the-art GFETs devices are given. A modified fabrication process is used. This allows for preserving intrinsic graphene properties in the GFET channel and, simultaneously, achieving extremely low graphene/metal contact resistance. As a result, GFETs with state-of-the-art high frequency performance were fabricated and used in further analysis for development of GFETs with continuously improved performance. In particular, the dependencies between the material quality and the high-field high-frequency performance of GFETs fabricated on Si chip have been studied. It was shown, that the low-field carrier mobility can be selected as the material quality parameter. The high-frequency performance of GFETs is characterized by fT and fmax. The surface distribution of the graphene/dielectric material quality across the chip has been exploited as a tool to study the dependencies of GFET high-frequency performance on the material quality. The fT and fmax increase in the range of 20-40 GHz with low-field mobility in the range of 600-2000 cm2/V s. The dependencies are analyzed by combining the models of the drain resistance, carrier velocity, saturation velocity and small-signal equivalent circuit. Additionally, this allows for clarifying the effects of the equivalent-circuit parameters, such as contact resistance (Rc), transconductance (gm) and differential drain conductance (gds), on the fT and fmax. The observed variations of fT and fmax are mainly governed by corresponding variations of gm and gds. Analysis allows for identifying a most promising approach for improving the GFET high-frequency performance, which is selection of adjacent dielectric materials with optical phonon energy higher than that of SiO2, resulting in higher saturation velocity and, hence, higher fT and fmax.
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| 7. |
- Asad, Muhammad, 1986, et al.
(author)
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Graphene field-effect transistors for high frequency applications
- 2018
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In: ; November 2018
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Conference paper (peer-reviewed)abstract
- Realization of competitive high frequency graphene field-effect transistors (GFETs) is hindered, in particular, by extrinsic scattering of charge carriers and relatively high contact resistance of the graphene-metal contacts, which are both defined by the quality of the corresponding graphene top interfaces [1]. In this work, we report on improved performance of GFETs fabricated using high quality chemical vapour deposition (CVD) graphene and modified technology steps. The modified processing flow starts with formation of the gate dielectric, which allows for preserving the high velocity of charge carriers, and, simultaneously, providing very low contact resistance. The transfer line method (TLM) analysis and fitting the GFET transfer characteristics (Fig. 1) both reveal very low specific width contact resistivity of the top contacts, down to 95 Ω⋅μm. Fitting shows also that the field-effect mobility in the GFETs can be up to 5000 cm2/(V⋅s). The measured (extrinsic) transit frequency (fT) and the maximum frequency of oscillation (fmax) are up to 35 GHz and 40 GHz, respectively, for GFETs with gate length Lg=0.5 μm (Fig. 2), which are highest among those reported so far for the GFETs with similar gate length and comparable with those of Si MOSFETs [2,3]. The dependencies of the fT and fmax on the gate length indicate that these GFETs are very promising for the scaling down and in particular for the development of power amplifiers operating in the mm-wave frequency range.
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| 8. |
- Asad, Muhammad, 1986
(author)
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Impact of adjacent dielectrics on the high-frequency performance of graphene field-effect transistors
- 2021
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Doctoral thesis (other academic/artistic)abstract
- Transistors operating at high frequencies are the basic building blocks of millimeter wave communication and sensor systems. The high velocity and mobility of carriers in graphene can open ways for development of ultra-fast group IV transistors with similar or even better performance than that achieved with III-V based semiconductors. However, the progress of high-speed graphene transistors has been hampered by limitations associated with fabrication, influence of adjacent materials and self-heating effects. This thesis work presents results of the comprehensive analysis of the influence of material imperfections, self-heating and limitations of the charge carrier velocity, imposed by adjacent dielectrics, on the transit frequency, fT, and the maximum frequency of oscillation, fmax, of graphene field-effect transistors (GFETs). The analysis allowed for better understanding and developing a strategy for addressing the limitations. In particular, it was shown that the GFET high-frequency performance can be enhanced by utilizing the gate and substrate dielectric materials with higher optical phonon (OP) energy, allowing for higher saturation velocity and, hence, higher fT and fmax. This approach was experimentally verified by demonstration of enhancement in the fT and fmax in GFETs with graphene channel encapsulated by the Al2O3 layers. As a further step, GFETs on diamond, material with highest OP energy and thermal conductivity, were introduced, developed and fabricated, showing the extrinsic fmax up to 50 GHz, at the gate length of 0.5 µm, which is highest reported so far among the best published graphene and semiconductor counterparts. The main achievements of this thesis work are as follows: (i) comprehensive study of correlations between graphene-dielectric material quality, small-signal equivalent circuit parameters and high-frequency performance of the GFETs; (ii) experimental verification of the concept of improving the GFET high- frequency performance via selection of adjacent dielectric materials with high OP energy; (iii) introducing the diamond as a most promising dielectric material for high-frequency GFETs; (iv) development of technology and demonstration of fully integrated X and Ku band GFET IC amplifiers with state-of-the art performance. In conclusion, the routes of future development depicted in this thesis work may allow for enhancing the high-frequency performance of GFETs up to the level or even higher than that of the modern III-V semiconductor counterparts.
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| 9. |
- Asad, Muhammad, 1986, et al.
(author)
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The dependence of the high-frequency performance of graphene field-effect transistors on channel transport properties
- 2020
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In: IEEE Journal of the Electron Devices Society. - 2168-6734. ; 8, s. 457-464
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Journal article (peer-reviewed)abstract
- This paper addresses the high-frequency performance limitations of graphene field-effect transistors (GFETs) caused by material imperfections. To understand these limitations, we performed a comprehensive study of the relationship between the quality of graphene and surrounding materials and the high-frequency performance of GFETs fabricated on a silicon chip. We measured the transit frequency (fT) and the maximum frequency of oscillation (fmax) for a set of GFETs across the chip, and as a measure of the material quality, we chose low-field carrier mobility. The low-field mobility varied across the chip from 600 cm2/Vs to 2000 cm2/Vs, while the fT and fmax frequencies varied from 20 GHz to 37 GHz. The relationship between these frequencies and the low-field mobility was observed experimentally and explained using a methodology based on a small-signal equivalent circuit model with parameters extracted from the drain resistance model and the charge-carrier velocity saturation model. Sensitivity analysis clarified the effects of equivalent-circuit parameters on the fT and fmax frequencies. To improve the GFET high-frequency performance, the transconductance was the most critical parameter, which could be improved by increasing the charge-carrier saturation velocity by selecting adjacent dielectric materials with optical phonon energies higher than that of SiO2.
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| 10. |
- Bonmann, Marlene, 1988, et al.
(author)
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Drain current saturation in graphene field-effect transistors at high fields
- 2018
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Conference paper (other academic/artistic)abstract
- Development of competitive high frequency graphene field-effect transistors (GFETs) is hindered, first of all, by a zero-bandgap phenomenon in monolayer graphene, which prevents the drain current saturation and limits significantly the GFET power gain. An approach has been proposed to realise the drain current saturation in GFETs without a bandgap formation, but via velocity saturation of the charge carriers at high fields [1]. In this work, we report on the performance of GFETs fabricated using high quality CVD monolayer graphene and modified technology, which reduce the concentration of traps generating the charge carriers at high fields [2]. Fig. 1 shows typical output characteristics of GFETs with gate length of 0.5 μm. The drain current clearly reveals the saturation trends at high fields, which we associate with the saturation of the carrier velocity, see inset to Fig. 2 [2]. Fig. 2 shows typical measured (extrinsic) transit frequency (fT) and the maximum frequency of oscillation (fmax), which are characteristics of the current and power gain, respectively. Since fT and fmax are proportional to the carrier velocity, they reveal similar saturation behaviour. We analyse the saturation effects by applying the Fermi-Dirac carrier statistics. The fT and fmax are up to 34 GHz and 37 GHz, respectively, which are highest among those reported so far for the GFETs with similar gate length and comparable with those reported for Si MOSFETs [3].
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