1. |
- Huang, Chih-Yang, et al.
(författare)
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Heteroepitaxially grown homojunction gallium oxide PN diodes using ion implantation technologies
- 2024
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Ingår i: Materials Today Advances. - : ELSEVIER. - 2590-0498. ; 22
-
Tidskriftsartikel (refereegranskat)abstract
- Although advancements in n- and p-doping of gallium oxide (Ga2O3) are underway, the realization of functional pn diodes remains elusive. Here, we present the successful fabrication of a Ga2O3 pn diode utilizing ion implantation technology. The Ga2O3 epilayers were grown on c-plane sapphire substrates by metalorganic chemical vapor deposition (MOCVD). P-type conductivity Ga2O3 epilayer, confirmed by Hall effect analysis, was achieved by phosphorus (P) ion implantation followed with a rapid thermal annealing (RTA) process. This p-Ga2O3 epilayer reveals a significant reduction in resistivity (<10(6)) compared to undoped Ga2O3, demonstrating the successful inclusion and activation of P within the crystal lattice. X-ray diffraction analysis shows that the Ga2O3 epilayers were grown in high crystal quality. Although the crystallinity of Ga2O3 was slightly degraded after P ion implantation, the structure was recovered to high-quality crystal after RTA treatment. For the device structure, p-type Ga2O3 was formed first, followed n-type Ga2O3 regrowth to create a pn junction diode. The obtained results demonstrate a built-in voltage of 4.8 V, 4.2 V, and 4.308 V from simulation, fabricated pn diodes measured by I-V and C-V, respectively. A high breakdown voltage of 900 V was also obtained for the lateral pn diode grown on sapphire substrate. As concerning temperature stability, I-V curves of Ga2O3 pn diode were measured from 25 degrees C to 150 degrees C in steps of 25 degrees C. At elevated temperatures, for both forward and reverse biases, consecutive increasing currents were measured. These could be resulted from dominant diffusion and drift currents over recombination current at a given bias. In addition, the reverse current saturated (@V > 3kT/q) and remained very low at 2x10(-8) A, as the diode operated at 150 degrees C. The behavior could be due to Ga2O3 being a wide bandgap material.
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2. |
- Lin, Shao-Hua, et al.
(författare)
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Study on different isolation technology on the performance of blue micro-LEDs array applications
- 2024
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Ingår i: DISCOVER NANO. - : SPRINGER. - 2731-9229. ; 19:1
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Tidskriftsartikel (refereegranskat)abstract
- In this study, a 3 x 3 blue micro-LED array with a pixel size of 10 x 10 mu m2 and a pitch of 15 mu m was fabricated on an epilayer grown on a sapphire substrate using metalorganic chemical vapor deposition technology. The fabrication process involved photolithography, wet and dry etching, E-beam evaporation, and ion implantation technology. Arsenic multi-energy implantation was utilized to replace the mesa etching for electrical isolation, where the implantation depth increased with the average energy. Different ion depth profiles had varying effects on electrical properties, such as forward current and leakage currents, potentially causing damage to the n-GaN layer and increasing the series resistance of the LEDs. As the implantation depth increased, the light output power and peak external quantum efficiency of the LEDs also increased, improving from 5.33 to 9.82%. However, the efficiency droop also increased from 46.3 to 48.6%.
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3. |
- Alves Machado Filho, Manoel, et al.
(författare)
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Self-Induced Core–Shell InAlN Nanorods: Formation and Stability Unraveled by Ab Initio Simulations
- 2023
-
Ingår i: ACS Nanoscience Au. - : American Chemical Society (ACS). - 2694-2496. ; 3:1, s. 84-93
-
Tidskriftsartikel (refereegranskat)abstract
- By addressing precursor prevalence and energetics using the DFT-based synthetic growth concept (SGC), the formation mechanism of self-induced InAlN core–shell nanorods (NRs) synthesized by reactive magnetron sputter epitaxy (MSE) is explored. The characteristics of In- and Al-containing precursor species are evaluated considering the thermal conditions at a typical NR growth temperature of around 700 °C. The cohesive and dissociation energies of In-containing precursors are consistently lower than those of their Al-containing counterparts, indicating that In-containing precursors are more weakly bonded and more prone to dissociation. Therefore, In-containing species are expected to exhibit lower abundance in the NR growth environment. At increased growth temperatures, the depletion of In-based precursors is even more pronounced. A distinctive imbalance in the incorporation of Al- and In-containing precursor species (namely, AlN/AlN+, AlN2/AlN2+, Al2N2/Al2N2+, and Al2/Al2+ vs InN/InN+, InN2/InN2+, In2N2/In2N2+, and In2/In2+) is found at the growing edge of the NR side surfaces, which correlates well with the experimentally obtained core–shell structure as well as with the distinctive In-rich core and vice versa for the Al-rich shell. The performed modeling indicates that the formation of the core–shell structure is substantially driven by the precursors’ abundance and their preferential bonding onto the growing edge of the nanoclusters/islands initiated by phase separation from the beginning of the NR growth. The cohesive energies and the band gaps of the NRs show decreasing trends with an increment in the In concentration of the NRs’ core and with an increment in the overall thickness (diameter) of the NRs. These results reveal the energy and electronic reasons behind the limited growth (up to ∼25% of In atoms of all metal atoms, i.e., InxAl1–xN, x ∼ 0.25) in the NR core and may be qualitatively perceived as a limiting factor for the thickness of the grown NRs (typically <50 nm).
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4. |
- Bairagi, Samiran, et al.
(författare)
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Formation of quaternary Zn(AlxGa1−x)2O4 epilayers driven by thermally induced interdiffusion between spinel ZnGa2O4 epilayer and Al2O3 substrate
- 2023
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Ingår i: Materials Today Advances. - : Elsevier. - 2590-0498. ; 20
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Tidskriftsartikel (refereegranskat)abstract
- Zinc aluminogallate, Zn(AlxGa1−x)2O4 (ZAGO), a single-phase spinel structure, offers considerable potential for high-performance electronic devices due to its expansive compositional miscibility range between aluminum (Al) and gallium (Ga). Direct growth of high-quality ZAGO epilayers however remains problematic due to the high volatility of zinc (Zn). This work highlights a novel synthesis process for high-quality epitaxial quaternary ZAGO thin films on sapphire substrates, achieved through thermal annealing of a ZnGa2O4 (ZGO) epilayer on sapphire in an ambient air setting. In-situ annealing x-ray diffraction measurements show that the incorporation of Al in the ZGO epilayer commenced at 850 °C. The Al content (x) in ZAGO epilayer gradually increased up to around 0.45 as the annealing temperature was raised to 1100 °C, which was confirmed by transmission electron microscopy (TEM) and energy dispersive x-ray spectroscopy. X-ray rocking curve measurement revealed a small full width at half maximum value of 0.72 °, indicating the crystal quality preservation of the ZAGO epilayer with a high Al content. However, an epitaxial intermediate �–(AlxGa1−x)2O3 layer (� - AGO) was formed between the ZAGO and sapphire substrate. This is believed to be a consequence of the interdiffusion of Al and Ga between the ZGO thin film and sapphire substrate. Using density functional theory, the substitution cost of Ga in sapphire was determined to be about 0.5 eV lower than substitution cost of Al in ZGO. Motivated by this energetically favorable substitution, a formation mechanism of the ZAGO and AGO layers was proposed. Spectroscopic ellipsometry studies revealed an increase in total thickness of the film from 105.07 nm (ZGO) to 147.97 nm (ZAGO/AGO) after annealing to 1100 °C, which were corroborated using TEM. Furthermore, an observed increase in the direct (indirect) optical bandgap from 5.06 eV (4.7 eV) to 5.72 eV (5.45 eV) with an increasing Al content in the ZAGO layer further underpins the formation of a quaternary ZAGO alloy with a tunable composition.
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5. |
- Bairagi, Samiran, et al.
(författare)
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Glancing Angle Deposition and Growth Mechanism of Inclined AlN Nanostructures Using Reactive Magnetron Sputtering
- 2020
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Ingår i: Coatings. - : MDPI. - 2079-6412. ; 10:8
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Tidskriftsartikel (refereegranskat)abstract
- Glancing angle deposition (GLAD) of AlN nanostructures was performed at room temperature by reactive magnetron sputtering in a mixed gas atmosphere of Ar and N-2. The growth behavior of nanostructures shows strong dependence on the total working pressure and angle of incoming flux. In GLAD configuration, the morphology changed from coalesced, vertical nanocolumns with faceted terminations to highly inclined, fan-like, layered nanostructures (up to 38 degrees); while column lengths decreased from around 1743 to 1068 nm with decreasing pressure from 10 to 1.5 mTorr, respectively. This indicates a change in the dominant growth mechanism from ambient flux dependent deposition to directional ballistic shadowing deposition with decreasing working pressures, which is associated with the change of energy and incident angle of incoming reactive species. These results were corroborated using simulation of metal transport (SiMTra) simulations performed at similar working pressures using Ar and N separately, which showed the average particle energy and average angle of incidence decreased while the total average scattering angle of the metal flux arriving at substrate increased with increasing working pressures. Observing the crystalline orientation of GLAD deposited wurtzite AlN nanocolumns using X-ray diffraction (XRD), pole-figure measurements revealedc-axis growth towards the direction of incoming flux and a transition from fiber-like to biaxial texture took place with increasing working pressures. Under normal deposition conditions, AlN layer morphology changed from {0001} to {10 (1) over bar1} with increasing working pressure because of kinetic energy-driven growth.
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6. |
- Bairagi, Samiran, 1990-
(författare)
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Optical studies of AlN and GaO based nanostructures using Mueller matrix spectroscopic ellipsometry
- 2023
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Doktorsavhandling (övrigt vetenskapligt/konstnärligt)abstract
- This thesis explores the diverse optical properties manifested when light interacts with various materials, with an emphasis on circular polarization- and bandgaprelated phenomena. The studies in this work are centered around Mueller matrix spectroscopic ellipsometry, with the objective of synthesizing and characterizing nanostructured and high-quality thin films to expand our understanding of the optical properties arising from their underlying structure and electronic transitions, respectively.Papers I, II, and III of the research address the optical properties associated with circular polarization, emphasizing the importance of the morphology and structure of the sculptured thin films used. To clarify this, AlN-based chiral sculptured thin films are synthesized using glancing angle deposition and magnetron sputtering. The discussion explores the impact of different growth parameters on the morphology and crystal structure of the films. By examining these thin film samples, it is shown how their structure and crystallographic orientation can be designed to reflect narrow spectral bands of circularly polarized light at specific wavelengths. The research also tackles how thin films preferentially reflect one handedness of circularly polarized light over the other with a high degree of circular polarization. A combination of theoretical and experimental studies offers insights into the nuances of growth and light-material interactions, particularly in complex photonic structures.Papers IV and V investigate the optical properties that arise from electronic transitions in thin films, focusing on the complex dielectric function and optical bandgap phenomena. These properties are explored using high-quality single crystalline homogenous thin films of ZnGaO, grown using metal-organic chemical vapor deposition. Various formalisms to calculate bandgap values are evaluated for their precision and applicability. The modified Cody formalism stands out as the preferred choice due to its ability to provide the most linear region for extrapolating bandgap energy values. Through both theoretical calculations and experiments, a critical analysis is provided on the evolution of the crystal structure and optical properties of these thin films when exposed to elevated temperatures. These findings explain the interplay between the structural characteristics of thin films and their subsequent influence on bandgap properties.Altogether, this thesis provides a fundamental understanding of the structural and intrinsic properties of materials that govern light-matter interactions. This research paves the way for the further development of thin film-based polarization filters and advanced optoelectronic device technologies.
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7. |
- Bairagi, Samiran, et al.
(författare)
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Zinc gallate (ZnGa2O4) epitaxial thin films : determination of optical properties and bandgap estimation using spectroscopic ellipsometry
- 2022
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Ingår i: Optical Materials Express. - : Optica Publishing Group. - 2159-3930. ; 12:8, s. 3284-3295
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Tidskriftsartikel (refereegranskat)abstract
- Electronic grade ZnGa2O4 epitaxial thin films were grown on c-plane sapphire substrates by metal-organic chemical vapor deposition and investigated using spectroscopic ellipsometry. Their thickness, roughness and optical properties were determined using a Multiple Sample Analysis based approach by the regression analysis of optical model and measured data. These samples were then compared to samples which had undergone ion etching, and it was observed that etching time up to four minutes had no discernible impact on its optical properties. Line shape analysis of resulting absorption coefficient dispersion revealed that ZnGa(2)O(4 )exhibited both direct and indirect interband transitions. The modified Cody formalism was employed to determine their optical bandgaps. These values were found to be in good agreement with values obtained using other popular bandgap extrapolation procedures. Published by Optica Publishing Group under the terms of the Creative Commons Attribution 4.0 License. Further distribution of this work must maintain attribution to the author(s) and the published articles title, journal citation, and DOI.
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8. |
- Bangolla, Hemanth Kumar, et al.
(författare)
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Composition-dependent photoconductivities in indium aluminium nitride nanorods grown by magnetron sputter epitaxy
- 2022
-
Ingår i: Nanoscale Advances. - : Royal Society of Chemistry. - 2516-0230. ; 4:22, s. 4886-4894
-
Tidskriftsartikel (refereegranskat)abstract
- Photoconduction (PC) properties were investigated for ternary indium aluminium nitride (InxAl1-xN) nanorods (NRs) with different indium compositions (x) from 0.35 to 0.68, as grown by direct-current reactive magnetron sputter epitaxy. Cross-sectional scanning transmission electron microscopy (STEM) reveals single-crystal quality of the vertically aligned InxAl1-xN NRs. Single-rod photodetector devices with good ohmic contacts were fabricated using the focused-ion-beam technique (FIB), where the In-rich In0.68Al0.32N NR exhibits an optimal photocurrent responsivity of 1400 A W-1 and photoconductive gain of 3300. A transition from a positive photoresponse to a negative photoresponse was observed, while increasing the In composition x from 0.35 to 0.57. The negative PC was further enhanced by increasing x to 0.68. A model based on the coexistence and competition of deep electron trap states and recombination centers was proposed to explain the interesting composition-dependent PC in these ternary III-nitride 1D nanostructures.
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9. |
- Chang, Jui-Che, 1996-
(författare)
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Controlled growth of metastable Ta3N5 semiconducting films
- 2024
-
Doktorsavhandling (övrigt vetenskapligt/konstnärligt)abstract
- The semiconductor tritantalum pentanitride (Ta3N5) is a promising material for green energy applications, specifically in the photoelectrolysis of water to produce oxygen and hydrogen. With a bandgap of approximately 2 eV, Ta3N5 is well-suited for efficient solar light absorption across a broad spectrum, and its band positions align favorably with the redox potential of water. Theoretically, this material could achieve a solar-to-hydrogen efficiency of up to 15.9%. However, the intricate nature of the Ta-N compounds and its metastability have limited research into the development of high-quality Ta3N5. In this thesis, the metastable Ta3N5 films were grown using two types of reactive magnetron sputtering techniques, direct current magnetron sputtering (DCMS) and high-power impulse magnetron sputtering (HiPIMS). Several key parameters were found to stabilize the formation of Ta3N5 phase, including the amount of oxygen in a gas mixture of Ar and N2, total working pressure, the Ta2O5 seed layer, and Ar/N2 partial pressure ratio. First, sputter growth of Ta-N film using a gas mixture of Ar and N2 without oxygen gas, only metallic -TaN and ε-TaN phase were formed. After introducing a small amount of oxygen in the process gas (~2% of total working pressure), the oxygen atoms, with higher electronegativity, replace nitrogen atoms to trigger and stabilize the formation of crystalline Ta3N5-type structure. In addition, with a suitable Ar/N2 partial pressure ratio for Ta3N5 formation, a low-degree fiber-textural orthorhombic Ta3N5 film was formed at the total working pressure range from 5 to 30 mTorr. At 40 mTorr total working pressure, the deposited film transforms to O-rich amorphous Ta-O-N compound. Second, the effect of Ta2O5 seed layer on the control of Ta-N phase was studied. The Ta3N5 phase can be grown only with a Ta2O5 seed layer assistance. Without the seed layer, only metallic TaN phases were formed no matter if the film was grown with or without oxygen assistance. Furthermore, domain epitaxial growth of Ta3N5 film on sapphire substrate was achieved through the control of seed layer’s thickness and crystallinity. While the film was grown on an amorphous TaOx seed layer, the Ta3N5 structure becomes polycrystalline. Third, the formation mechanism and epitaxial growth were studied through microstructural analysis in combination of first-principle density-functional theory calculations. Time-dependent growth evolution of Ta3N5 films combined with HRTEM and EDX measurement revealed that the nitridation of Ta2O5 seed layer and Ta-N film deposition occurs simultaneously at the beginning of the Ta3N5 deposition. Further deposition, the Ta3N5 layer was dominated by {00k} domain mixed with (113) domain with a thin TaN layer between Ta3N5 layer and substrate. Last, various Ta-N compounds were grown via controlling the Ar/N2 partial pressure ratio and total working pressure. When the reactive gas was changed from pure Ar to pure nitrogen, the deposited films transformed from Ta metal (mixed with TaOx), TaN, TaN mixed with Ta3N5 to polycrystalline Ta3N5 phase. To summarize the work conducted in this thesis, I have established a reproducible and precise method for cultivating metastable Ta3N5 through the magnetron sputter deposition technique. The elucidated growth mechanism holds promise for synthesizing Ta3N5 on diverse substrates using alternative techniques, ensuring a controlled and adaptable approach.
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10. |
- Chang, Jui-Che, et al.
(författare)
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Domain epitaxial growth of Ta3N5 film on c-plane sapphire substrate
- 2022
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Ingår i: Surface & Coatings Technology. - : Elsevier. - 0257-8972 .- 1879-3347. ; 443
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Tidskriftsartikel (refereegranskat)abstract
- Tritantalum pentanitride (Ta3N5) semiconductor is a promising material for photoelectrolysis of water with high efficiency. Ta3N5 is a metastable phase in the complex system of TaN binary compounds. Growing stabilized single-crystal Ta3N5 films is correspondingly challenging. Here, we demonstrate the growth of a nearly single-crystal Ta3N5 film with epitaxial domains on c-plane sapphire substrate, Al2O3(0001), by magnetron sputter epitaxy. Introduction of a small amount ~2% of O2 into the reactive sputtering gas mixed with N2 and Ar facilitates the formation of a Ta3N5 phase in the film dominated by metallic TaN. In addition, we indicate that a single-phase polycrystalline Ta3N5 film can be obtained with the assistance of a Ta2O5 seed layer. With controlling thickness of the seed layer smaller than 10 nm and annealing at 1000 °C, a crystalline β phase Ta2O5 was formed, which promotes the domain epitaxial growth of Ta3N5 films on Al2O3(0001). The mechanism behind the stabilization of the orthorhombic Ta3N5 structure resides in its stacking with the ultrathin seed layer of orthorhombic β-Ta2O5, which is energetically beneficial and reduces the lattice mismatch with the substrate.
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11. |
- Chang, Jui-Che, et al.
(författare)
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HiPIMS-grown AlN buffer for threading dislocation reduction in DC-magnetron sputtered GaN epifilm on sapphire substrate
- 2023
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Ingår i: Vacuum. - : PERGAMON-ELSEVIER SCIENCE LTD. - 0042-207X .- 1879-2715. ; 217
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Tidskriftsartikel (refereegranskat)abstract
- Gallium nitride (GaN) epitaxial films on sapphire (Al2O3) substrates have been grown using reactive magnetron sputter epitaxy with a liquid Ga target. Threading dislocations density (TDD) of sputtered GaN films was reduced by using an inserted high-quality aluminum nitride (AlN) buffer layer grown by reactive high power impulse magnetron sputtering (R-HiPIMS) in a gas mixture of Ar and N2. After optimizing the Ar/N2 pressure ratio and deposition power, a high-quality AlN film exhibiting a narrow full-width at half-maximum (FWHM) value of the double-crystal x-ray rocking curve (DCXRC) of the AlN(0002) peak of 0.086° was obtained by R-HiPIMS. The mechanism giving rise the observed quality improvement is attributed to the enhancement of kinetic energy of the adatoms in the deposition process when operated in a transition mode. With the inserted HiPIMS-AlN as a buffer layer for direct current magnetron sputtering (DCMS) GaN growth, the FWHM values of GaN(0002) and (10 1‾ 1) XRC decrease from 0.321° to 0.087° and from 0.596° to 0.562°, compared to the direct growth of GaN on sapphire, respectively. An order of magnitude reduction from 2.7 × 109 cm−2 to 2.0 × 108 cm−2 of screw-type TDD calculated from the FWHM of the XRC data using the inserted HiPIMS-AlN buffer layer demonstrates the improvement of crystal quality of GaN. The result of TDD reduction using the HiPIMS-AlN buffer was also verified by weak beam dark-field (WBDF) cross-sectional transmission electron microscopy (TEM).
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12. |
- Chang, Jui-Che
(författare)
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Metastable orthorhombic Ta3N5 thin films grown by magnetron sputter epitaxy
- 2022
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Licentiatavhandling (övrigt vetenskapligt/konstnärligt)abstract
- The semiconductor tritantalum pentanitride (Ta3N5) is a promising green-energy material for photoelectrolyzing water to produce oxygen and hydrogen owing to its proper bandgap of 2.0 ± 0.2 eV and band positions to redox potential of water. Compare with the conventional setup of water splitting, such as TiO2, Fe2O3, Cu2O, and WO3, the Ta3N5 shows a proper band gap, which leads to a theoretical efficiency as high as 15.9%. However, the complexity of the Ta-N system and the metastability of the Ta3N5 result in the limited research of the growth of high quality stoichiometric Ta3N5.Conventionally, the two-step growth of oxidation and nitridation of a metal Ta using thermal annealing in oxygen and ammonia environment is used to produce the Ta3N5. However, the amount of incorporated oxygen in the Ta3N5 samples and film’s thickness and interface are hardly to be controlled, and the use of ammonia as the nitridation gas is harmful to the environment. Hence, in this thesis work, the reactive magnetron sputtering is used to synthesis the Ta3N5, which demonstrates some advantages, such as possibility to grow on a substrate with nanostructure on the surface, a simplification of growth process, usage of environmental-friendly reactive gas, and even scaling up to the industrial application.The thesis presents a successful growth of orthorhombic Ta3N5-type Ta-O-N compound thin films on Si and sapphire substrates, specifically Ta3-xN5-yOy, using reactive magnetron sputtering with a gas mixture of Ar, N2, and O2. In the deposition process, the total working pressure was increasing from 5 to 40 mTorr, while keeping same partial pressure ratio (Ar: N2: O2 = 3: 2: 0.1). When the total pressure in the region between 5-30 mTorr, a low-degree fiber-textural Ta3-xN5-yOy films were grown. In addition, with the characterization of elastic recoil detection analysis (ERDA), the atomic fraction of O, N, and Ta of as-grown Ta3-xN5-yOy films were found varying from 0.02 to 0.15, 0.66 to 0.54, and 0.33 to 0.31, respectively, which leads to a b-lattice constant decrease around 1.3 %, shown in X-ray diffraction (XRD) results. For a total working pressure up to 40 mTorr, an amorphous O-rich Ta-O-N compound film was formed mixed with non-stoichiometric TaON and Ta2O5, which further raised the oxygen atomic fraction to ~0.48. The increasing total working pressure results in an increasing band gap from 2.22 to 2.66 eV of Ta3-xN5-yOy films, and further increasing to around 2.96 eV of O-rich Ta-O-N compound films. The mechanism of increasing oxygen atomic fraction in the film is founded correlated with the forming oxide on the Ta target surface during the deposition process due to the strong reactivity of O to Ta by the characterization of optical emission spectroscopy (OES). Moreover, the sputter yield was reduced due to the target poisoning, and which is evidenced by both plasma analysis and depth profile from ERDA.A further studies with the deposition parameters for nearly pure Ta3N5 films (oxygen atomic fraction ~2%) was performed using c-axis oriented Al2O3 substrate. In this research, it is found that a Ta2O5 seed layer and a small amount of oxygen were necessary for the growth of Ta3N5. Without the help of seed layer and oxygen, only metallic TaN phases, either mixture of ε- and δ- TaN or δ-TaN were grown, evidenced by X-ray photoelectron spectroscopy (XPS). Furthermore, the structure and phase purity of Ta3N5-phase dominated films was found highly correlated with the thickness of the Ta2O5 seed layer. With the increasing thickness of the seed layer from 5, 9, to 17 nm, the composition of grown films was changed from 111-oriented δ-TaN mixed with c-axis oriented Ta3N5, c-axis oriented Ta3N5, to polycrystalline Ta3N5. In addition, the azimuthal φ-scans in grazing incident geometry demonstrates that the c-axis oriented Ta3N5 contained epitaxially three-variant-orientation domains, in which the a and b planes parallel to the m and a planes of c-axis oriented Al2O3. With the simulation of density functional theory (DFT), the growth of thin seed layers of orthorhombic Ta2O5 (β-Ta2O5) was found promoting by introducing a small amount of oxygen, after calculating the interplay between the topological and energy selection criteria. By the co-action of the mentioned criteria, this already grown Ta2O5 seed layer favored the growth of the orthorhombic Ta3N5 phase. Hence, the mechanism of the domain epitaxial growth of c-axis oriented Ta3N5 on c-axis oriented Al2O3 is attributed to the similar atomic arrangement Ta3N5(001) and β-Ta2O5(201) with a small lattice mismatch around of 2.6% and 4.5%, for the interface of film/seed layer and seed layer/substrate, respectively, and a favorable energetic interaction between involved materials.
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13. |
- Chang, Jui-Che, et al.
(författare)
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Orthorhombic Ta3-xN5-yOy thin films grown by unbalanced magnetron sputtering : The role of oxygen on structure, composition, and optical properties
- 2021
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Ingår i: Surface & Coatings Technology. - : Elsevier. - 0257-8972 .- 1879-3347. ; 406
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Tidskriftsartikel (refereegranskat)abstract
- Direct growth of orthorhombic Ta3N5-type Ta-O-N compound thin films, specifically Ta3-xN5-yOy, on Si and sapphire substrates with various atomic fractions is realized by unbalanced magnetron sputtering. Low-degree fiber-textural Ta3-xN5-yOy films were grown through reactive sputtering of Ta in a gas mixture of N-2, Ar, and O-2 with keeping a partial pressure ratio of 3:2:0.1 in a total working pressure range of 5-30 mTorr. With increasing total pressure from 5 to 30 mTorr, the atomic fraction of O in the as-grown Ta3-xN5-yOy films was found to increase from 0.02 to 0.15 while that of N and Ta decrease from 0.66 to 0.54 and 0.33 to 0.31, respectively, leading to a decrease in b lattice constant up to around 1.3%. Metallic TaNx phases were formed without oxygen. For a working pressure of 40 mTorr, an amorphous, O-rich Ta-N-O compound film with a high O fraction of similar to 0.48, was formed, mixed with non-stoichiometric TaON and Ta2O5. By analyzing the plasma discharge, the increasing O incorporation is associated with oxide formation on top of the Ta target due to a higher reactivity of Ta with O than with N. The increase of O incorporation in the films also leads to a optical bandgap widening from similar to 2.22 to similar to 2.96 eV, which is in agreement with the compositional and structural changes from a crystalline Ta3-xN5-yOy to an amorphous O-rich Ta-O-N compound.
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14. |
- Chen, Ruei-San, et al.
(författare)
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Electronic transport properties in aluminum indium nitride nanorods grown by magnetron sputter epitaxy
- 2013
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Ingår i: Applied Surface Science. - : Elsevier. - 0169-4332 .- 1873-5584. ; 285, s. 625-628
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Tidskriftsartikel (refereegranskat)abstract
- The electronic transport properties of the wide-bandgap aluminum indium nitride (AlInN) nanorods (NRs) grown by ultrahigh-vacuum magnetron sputter epitaxy (MSE) have been studied. The conductivities of the ternary compound nanostructure locates at the value of 15 Q-1 cm -1, which is respectively one and two orders of magnitude lower than the binary GaN and InN counterparts grown by chemical vapor deposition (CVD). The very shallow donor level/band with the activation energy at 11 + 2 meV was obtained by the temperature-dependent measurement. In addition, the photoconductivity has also been investigated. The photoconductive (PC) gain of the NRs device can reach near 2400 under a low bias at 0.1 V and the light intensity at 100W m-2 for ultraviolet response in vacuum. The power-insensitive gain and ambience-dependent photocurrent are also observed, which is attributed to the probable surfacecontrolled PC mechanism in this ternary nitride nanostructure.
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15. |
- Darakchieva, Vanya, et al.
(författare)
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Electron accumulation at nonpolar and semipolar surfaces of wurtzite InN from generalized infrared ellipsometry
- 2009
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Ingår i: APPLIED PHYSICS LETTERS. - : AIP Publishing. - 0003-6951 .- 1077-3118. ; 95:20, s. 202103-
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Tidskriftsartikel (refereegranskat)abstract
- The free electron properties of nonpolar (1120)-oriented and semipolar (1011)-oriented wurtzite InN films are studied by generalized infrared ellipsometry (GIRSE). We demonstrate the sensitivity of GIRSE to the surface charge accumulation layer and find a distinct surface electron accumulation to occur at all surfaces. The obtained surface electron sheet densities are found to vary from 0.9x10(13) to 2.3x10(14) cm(-2) depending on the surface orientation and bulk electron concentration. The upper limits of the surface electron mobility parameters of 417-644 cm(2)/V s are determined and discussed in the light of electron confinement at the surface.
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16. |
- Darakchieva, Vanya, et al.
(författare)
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Role of impurities and dislocations for the unintentional n-type conductivity in InN
- 2009
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Ingår i: PHYSICA B-CONDENSED MATTER. - : Elsevier BV. - 0921-4526. ; 404:22, s. 4476-4481
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Tidskriftsartikel (refereegranskat)abstract
- We present a study on the role of dislocations and impurities for the unintentional n-type conductivity in high-quality InN grown by molecular beam epitaxy. The dislocation densities and H profiles in films with free electron concentrations in the low 10(17) cm(-1) and mid 10(18) cm(-3) range are measured, and analyzed in a comparative manner. It is shown that dislocations alone could not account for the free electron behavior in the InN films. On the other hand, large concentrations of H sufficient to explain, but exceeding substantially, the observed free electron densities are found. Furthermore, enhanced concentrations of H are revealed at the film surfaces, resembling the free electron behavior with surface electron accumulation. The low-conductive film was found to contain C and it is suggested that C passivates the H donors or acts as an acceptor, producing compensated material in this case. Therefore, it is concluded that the unintentional impurities play an important role for the unintentional n-type conductivity in InN. We suggest a scenario of H incorporation in InN that may reconcile the previously reported observations for the different role of impurities and dislocations for the unintentional n-type conductivity in InN.
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17. |
- Forsberg, Mathias, et al.
(författare)
-
Near band gap luminescence in hybrid organic-inorganic structures based on sputtered GaN nanorods
- 2017
-
Ingår i: Scientific Reports. - : NATURE PUBLISHING GROUP. - 2045-2322. ; 7
-
Tidskriftsartikel (refereegranskat)abstract
- Novel hybrid organic-inorganic nanostructures fabricated to utilize non-radiative resonant energy transfer mechanism are considered to be extremely attractive for a variety of light emitters for down converting of ultaviolet light and for photovoltaic applications since they can be much more efficient compared to devices grown with common design. Organic-inorganic hybrid structures based on green polyfluorene (F8BT) and GaN (0001) nanorods grown by magnetron sputtering on Si (111) substrates are studied. In such nanorods, stacking faults can form periodic polymorphic quantum wells characterized by bright luminescence. In difference to GaN exciton emission, the recombination rate for the stacking fault related emission increases in the presence of polyfluorene film, which can be understood in terms of Forster interaction mechanism. From comparison of dynamic properties of the stacking fault related luminescence in the hybrid structures and in the bare GaN nanorods, the pumping efficiency of non-radiative resonant energy transfer in hybrids was estimated to be as high as 35% at low temperatures.
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18. |
- Forsberg, Mathias
(författare)
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Optical and Structural Characterization of GaN Based Hybrid Structures and Nanorods
- 2015
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Licentiatavhandling (övrigt vetenskapligt/konstnärligt)abstract
- GaN belongs to the group III nitrides and is today the material of choice for efficient blue light emission, enabling solid state white lighting by combining red, blue and green light emitting diodes (LED) or by having a blue LED illuminating a phosphor. By combining GaN quantum well (QW) structures with colloids, nanoparticles or polyfluorene films, LEDs may be fabricate at lower cost. Such hybrid structures are promising for future micro-light sources in full-color displays, sensors and imaging systems. In this work, hybrid structures based on an MOCVD grown GaN QW sandwiched between two layers of AlGaN have been studied. On top of the structure, colloidal ZnO nano-crystals were deposited by spin-coating. Time-resolved photoluminescence was used to investigate the QW exciton dynamics in these hybrids depending on the cap layer thickness. From comparison of the recombination rate in the bare QW structure and the hybrid, the efficiency of the non-radiative resonant energy transfer between the QW and the nano-crystals could be obtained.Bulk GaN of large area is difficult to synthesize. Thus, due to lack of native substrates, GaN-based structures are grown on SiC or sapphire, which results in high threading dislocation density in the active layer of the device. Fabricating GaN nanorods (NR) can be a way to produce GaN with lower defect density since threading dislocations are annihilated toward the NR wall during growth. Here, GaN(0001) NRs grown on Si(111) substrates by magnetron sputter epitaxy using a liquid Ga target have been investigated. Sputter deposition has the advantage of being easy to scale up for depositions on large surfaces. It is also possible to deposit at lower temperatures, which allows the use of substrates with lower decomposition temperature. In the second paper of this thesis, optical and structural properties of sputtered GaN NRs have been studied.
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19. |
- Forsberg, Mathias, et al.
(författare)
-
Stacking fault related luminescence in GaN nanorods
- 2015
-
Ingår i: Nanotechnology. - : Institute of Physics (IOP). - 0957-4484 .- 1361-6528.
-
Tidskriftsartikel (refereegranskat)abstract
- Optical and structural properties are presented for GaN nanorods grown in the [0001]direction on Si(111) substrates by direct-current reactive magnetron sputter epitaxy.Transmission electron microscopy reveals clusters of dense stacking faults (SFs) regularlydistributed along the c-axis. A strong emission at ~3.42 eV associated with basal plane SFsdemonstrates thermal stability up to room temperatures together with a relatively shortrecombination time suggesting carrier localization in the system similar to multiple quantumwells.
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20. |
- Forsberg, Mathias, 1987-
(författare)
-
Study of GaN Based Nanostructures and Hybrids
- 2016
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Doktorsavhandling (övrigt vetenskapligt/konstnärligt)abstract
- GaN and its alloys with Al and In belong to the group III nitride semiconductors and are today the materials of choice for efficient white light emitting diodes (LEDs) enabling energy saving solid state lighting. Currently, there is a great interest in the development of novel inexpensive techniques to fabricate hybrid LEDs combining high quality III-N quantum well (QW) structures with inexpensive colloidal nanoparticles or conjugated polymers. Such hybrid devices are promising for future micro-light sources in full-color displays, sensors and imaging systems. Organics can be engineered to emit at different wavelengths or even white light based on functional groups or by blend of several polymers. This is especially important for the green region, where there is still a lack of efficient LEDs. Besides optoelectronics, other applications such as biochemical sensors or systems for water splitting can be realized using GaN-based nanostructures. Despite a significant progress in the field, there is still a need in fundamental understanding of many problems and phenomena in III-nitride based nanostructures and hybrids to fully utilize material properties on demand of specific applications.In this thesis, hybrid structures based on AlGaN/GaN QWs and colloidal ZnO nano-crystals have been fabricated for down conversion of the QW emission utilizing non-radiative (Förster) resonant energy transfer. Time-resolved photoluminescence (TRPL) was used to investigate the QW exciton dynamics depending on the cap layer thickness in the bare QW and in the hybrid samples. Although the surface potential influences the exciton dynamics, the maximum pumping efficiency assuming a non-radiative energy transfer mechanism was estimated to be ~40 % at 60 K in the structure with thin cap layer of 3 nm.Since bulk GaN of large area is difficult to synthesize, there is a lack of native substrates. Thus, GaN-based structures are usually grown on SiC or sapphire, which results in high threading dislocation density in the active layer of the device and can be the reason of efficiency droop in GaN based LED structures. Fabricating GaN nanorods (NR) can be a way to produce GaN with lower defect density since threading dislocations can be annihilated toward the NR wall during growth. Here, GaN(0001) NRs grown on Si(111) substrates by magnetron sputtering using a liquid Ga target have been investigated. A high quality of NRs have been confirmed by transmission electron microscopy (TEM) and TRPL. Two strong near band gap emission lines at ~3.42 eV and ~3.47 eV related to basal plane stacking faults (SF) and donor-bound exciton (DBE), respectively, have been observed at low temperatures. TRPL properties of the SF PL line suggest that SFs form a regular structure similar to a multiple QWs, which was confirmed by TEM. The SF related PL measured at 5 K for a single NR has a significantly different polarization response compared to the GaN exciton line and is much stronger polarized (> 40 %) in the direction perpendicular to the NR growth axis.Hybrids fabricated using GaN NRs and the green emitting polyfluorene (F8BT) have been studied using micro-TRPL. In contrast to the DBE emission, the recombination time of the SF-related emission was observed to decrease, which might be due to the Förster resonance energy transfer mechanism.Compared to chemical vapor deposition, sputtering allows synthesis at much lower temperatures. Here, sputtering was employed to grow InAlN/GaN heterostructures with an indium content targeted to ~18 %, which is lattice matched to GaN. This means that near strain-free GaN films can be synthesized. It was found that using a lower temperature (~25 C) while depositing the top InAlN results in an improved interface quality compared to deposition at 700 C. In latter case, regions of quaternary alloy of InAlGaN forming structural micro-defects have been observed at the top InAlN/GaN interface in addition to optically active flower-like defect formations.
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21. |
- Horng, Ray-Hua, et al.
(författare)
-
Effects of UV-ozone treatment on the performance of deep-ultraviolet photodetectors based on ZnGa2O4 epilayers
- 2022
-
Ingår i: Materials Chemistry and Physics. - : ELSEVIER SCIENCE SA. - 0254-0584 .- 1879-3312. ; 292
-
Tidskriftsartikel (refereegranskat)abstract
- ZnGa2O4 epilayers have been grown on sapphire using the metalorganic chemical vapor deposition system. However, there is a trade-off between high conductivity and large defect density (oxygen vacancies) with the growth time of the growth of ZnGa2O4 epilayers. The ultraviolet (UV)-ozone treatment on the ZnGa2O4 epilayer at 100. C was proposed to reduce the number of oxygen vacancies in ZnGa2O4. The effect of UV-ozone treatment on the performance of ZnGa2O4 metal-semiconductor-metal (MSM) photodetector (PD) was evaluated. X-ray photoelectron spectroscopy analysis showed a decrease in the number of oxygen vacancies after UV-ozone treatment of ZnGa2O4. The measured lattice parameter near the surface around 10 nm of untreated ZnGa2O4 was 8.3434 +/- 0.0120 angstrom and increased slightly to 8.3775 +/- 0.0083 A. after UV-ozone treatment due to the decrease in oxygen vacancies. The dark current (at 5 V) of ZnGa2O4 PD was significantly reduced from 251 to 20.2 pA before and after UV-ozone treatment; it resulted in a substantial one-order enhancement in the on/off ratio of the PDs from 2.7 x 10(5) and 2.15 x 10(6) after the UV-ozone treatment. Furthermore, the rejection ratio also improved between 240 and 470 nm from 35 to 84 after UV-ozone treatment. The relationship between photocurrent and light intensity and the improvement in raising and falling time also showed the reduced density of trap states by UV-ozone treatment. This indicates that UV-ozone treatment can enhance the characteristics of ZnGa2O4 PDs for UV sensing applications.
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22. |
- Horng, Ray-Hua, et al.
(författare)
-
Growth and Characterization of Sputtered InAlN Nanorods on Sapphire Substrates for Acetone Gas Sensing
- 2024
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Ingår i: Nanomaterials. - : MDPI. - 2079-4991. ; 14:1
-
Tidskriftsartikel (refereegranskat)abstract
- The demand for highly sensitive and selective gas sensors has been steadily increasing, driven by applications in various fields such as environmental monitoring, healthcare, and industrial safety. In this context, ternary alloy indium aluminum nitride (InAlN) semiconductors have emerged as a promising material for gas sensing due to their unique properties and tunable material characteristics. This work focuses on the fabrication and characterization of InAlN nanorods grown on sapphire substrates using an ultra-high vacuum magnetron sputter epitaxy with precise control over indium composition and explores their potential for acetone-gas-sensing applications. Various characterization techniques, including XRD, SEM, and TEM, demonstrate the structural and morphological insights of InAlN nanorods, making them suitable for gas-sensing applications. To evaluate the gas-sensing performance of the InAlN nanorods, acetone was chosen as a target analyte due to its relevance in medical diagnostics and industrial processes. The results reveal that the InAlN nanorods exhibit a remarkable sensor response of 2.33% at 600 ppm acetone gas concentration at an operating temperature of 350 degrees C, with a rapid response time of 18 s. Their high sensor response and rapid response make InAlN a viable candidate for use in medical diagnostics, industrial safety, and environmental monitoring.
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23. |
- Horng, Ray-Hua, et al.
(författare)
-
Growth mechanism and characteristics of beta-Ga2O3 heteroepitaxailly grown on sapphire by metalorganic chemical vapor deposition
- 2022
-
Ingår i: Materials Today Advances. - : ELSEVIER. - 2590-0498. ; 16
-
Tidskriftsartikel (refereegranskat)abstract
- In this study, monoclinic gallium oxide (beta-Ga2O3) epilayer was successfully grown on c-plane, (0001), sapphire substrate by metalorganic chemical vapor deposition (MOCVD) with interplaying growth temperature, TEGa flow rate, and growth time. X-ray diffraction 20 scans show only three narrow diffraction peaks referred to beta-Ga2O3 ((2) over bar 01), ((4) over bar 02), and ((6) over bar 03) in all epilayers, indicating a superior crystalline quality. Current-voltage (I-V) measurement reveals that these beta-Ga2O3 films are insulating and exhibit high resistance in a range of 10(12)-10(14) Omega. The crystallization characteristics of the epilayers can be effectively improved with thickness through increasing TEGa flow rate and growth time, which was evidenced by X-ray rocking curves and I-V measurements. However, the surface roughness of beta-Ga2O3 film increases with growth time and TEGa flow rate. When the growth temperature increases above 825 degrees C, the thickness of beta-Ga2O3 film decreases clearly. Furthermore, it can be found that the growth rate decreased as the growth time increasing. The growth mechanism based on first-principles calculation was proposed as that 3D growth induced by the lattice mismatch between beta-Ga2O3 and sapphire starts at nucleation stage, and follows up a lateral growth promoting a 2D growth after the thick epilayer being grown. In addition, the complex chemical reaction between TEGa and oxygen precursors was unraveled by density function theory calculation. (c) 2022 Published by Elsevier Ltd. This is an open access article under the CC BY-NC-ND license (http:// creativecommons.org/licenses/by-nc-nd/4.0/).
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24. |
- Horng, Ray-Hua, et al.
(författare)
-
Ion implantation effects on the characteristics of 8-Ga2O3 epilayers grown on sapphire by MOCVD
- 2022
-
Ingår i: Ceramics International. - : ELSEVIER SCI LTD. - 0272-8842 .- 1873-3956. ; 48:24, s. 36425-36432
-
Tidskriftsartikel (refereegranskat)abstract
- In this study, the Si-ions implantation technique with different doses from 1 x 1014 to 1 x 1015 cm-2 and dose energy 30, 40 and 50 keV was used to tune the electrical properties in unintentionally doped (UID) 8-Ga2O3 epilayers grown on the sapphire substrates by metalorganic chemical vapor deposition (MOCVD). A high quality UID 8-Ga2O3 epilayers were fabricated using the optimized growth parameters of MOCVD. The UID and Si-ions implanted 8-Ga2O3 epilayers were examined and results were compared with the help of X-ray diffraction, scanning electron microscopy, X-ray photoelectron spectroscopy, and transmission electron microscopy. Si-ions implantation parameters were also simulated by stopping and range of ions in matter software (SRIM) and actual Si-ions concentration was measured by secondary ions mass spectroscopy. The electrical properties of the implanted 8-Ga2O3 epilayers were measured by transmission length method and Hall measurements. The sheet resistivity for the 8-Ga2O3epilayers with Si-ion dose of 1 x 1014, 6 x 1014 and 1 x 1015 cm-2 were found as 2.047, 0.158 and 0.144 Cd cm, respectively measured by Hall measurements and the electron carrier concentrations for the above doses were 4.39 x 1018, 6.86 x 1018 and 7.98 x 1019 cm-3. From the above results, the ion implantation was demonstrated to effectively reduce the resistivity with the high carrier concentrations.
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25. |
- Horng, Ray-Hua, et al.
(författare)
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Structure Effect on the Response of ZnGa2O4 Gas Sensor for Nitric Oxide Applications
- 2022
-
Ingår i: Nanomaterials. - : MDPI. - 2079-4991. ; 12:21
-
Tidskriftsartikel (refereegranskat)abstract
- We fabricated a gas sensor with a wide-bandgap ZnGa2O4 (ZGO) epilayer grown on a sapphire substrate by metalorganic chemical vapor deposition. The ZGO presented (111), (222) and (333) phases demonstrated by an X-ray diffraction system. The related material characteristics were also measured by scanning electron microscopy, transmission electron microscopy and X-ray photoelectron spectroscopy. This ZGO gas sensor was used to detect nitric oxide (NO) in the parts-per-billion range. In this study, the structure effect on the response of the NO gas sensor was studied by altering the sensor dimensions. Two approaches were adopted to prove the dimension effect on the sensing mechanism. In the first approach, the sensing area of the sensors was kept constant while both channel length (L) and width (W) were varied with designed dimensions (L x W) of 60 x 200, 80 x 150, and 120 x100 mu m(2). In the second, the dimensions of the sensing area were altered (60, 40, and 20 mu m) with W kept constant. The performance of the sensors was studied with varying gas concentrations in the range of 500 ppb similar to 10 ppm. The sensor with dimensions of 20 x 200 mu m(2) exhibited a high response of 11.647 in 10 ppm, and 1.05 in 10 ppb for NO gas. The sensor with a longer width and shorter channel length exhibited the best response. The sensing mechanism was provided to explain the above phenomena. Furthermore, the reaction between NO and the sensor surface was simulated by O exposure of the ZGO surface in air and calculated by first principles.
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26. |
- Hsiao, Ching-Lien, et al.
(författare)
-
Composition tunable Al1-xInxN nanorod arrays grown by ultra-high-vacuum magnetron sputter epitaxy
- 2011
-
Annan publikation (övrigt vetenskapligt/konstnärligt)abstract
- Self-assembled ternary Al1-xInxN nanorod arrays with variable In concentration, 0.10 ≤ x ≤ 0.32 have been realized onto c-plane sapphire substrates by ultra-high-vacuum magnetron sputter epitaxy with Ti0.21Zr0.79N or VN seed layers assistance. The formation of nanorods was very sensitive to the applied seed layer. Without proper seed layer assistance a continuous Al1-xInxN film was grown. The nanorods exhibit hexagonal crosssections with preferential growth along the c axis. A coaxial rod structure with higher In concentration in the core was observed by (scanning) transmission electron microscopy in combination with low-loss electron energy loss spectroscopy and energy dispersive xray spectroscopy. 5 K cathodoluminescence spectroscopy of Al0.86In0.14N nanorods revealed band edge emission at ~5.46 eV, which was accompanied by a strong defectrelated emission at ~ 3.38 eV.
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27. |
- Hsiao, Ching-Lien, et al.
(författare)
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Curved-lattice epitaxial growth of chiral AlInN twisted nanorods for optical applications
- 2012
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Annan publikation (övrigt vetenskapligt/konstnärligt)abstract
- Despite of using chiral metamaterials to manipulate light polarization states has been demonstrated their great potential for applications such as invisible cloaks, broadband or wavelength-tunable circular polarizers, microreflectors, etc. in the past decade [1-6], operating wavelength in ultraviolet-visible range is still a challenge issue. Since these chiral structures often consist of metallic materials, their operation is designed for the infrared and microwave regions [2-4]. Here, we show how a controlled curved-lattice epitaxial growth (CLEG) of wide-bandgap AlInN semiconductor curved nanocrystals [7] can be exploited as a novel route for tailoring chiral nanostructures in the form of twisted nanorods (TNRs). The fabricated TNRs are shown to reflect light with a high degree of polarization as well as a high degree of circular polarization (that is, nearly circularly polarized light) in the ultravioletvisible region. The obtained polarization is shown to be dependent on the handedness of the TNRs.
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28. |
- Hsiao, Ching-Lien, et al.
(författare)
-
Curved-Lattice Epitaxial Growth of InxAl1-xN Nanospirals with Tailored Chirality
- 2015
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Ingår i: Nano letters (Print). - : American Chemical Society (ACS). - 1530-6984 .- 1530-6992. ; 15:1, s. 294-300
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Tidskriftsartikel (refereegranskat)abstract
- Chirality, tailored by external morphology and internal composition, has been realized by controlled curved-lattice epitaxial growth (CLEG) of uniform coatings of single-crystalline InxAl1-xN nanospirals. The nanospirals are formed by sequentially stacking segments of curved nanorods on top of each other, where each segment is incrementally rotated around the spiral axis. By controlling the growth rate, segment length, rotation direction, and incremental rotation angle, spirals are tailored to predetermined handedness, pitch, and height. The curved morphology of the segments is a result of a lateral compositional gradient across the segments while maintaining a preferred crystallographic growth direction, implying a lateral gradient in optical properties as well. Left- and right-handed nanospirals, tailored with 5 periods of 200 nm pitch, as confirmed by scanning electron microscopy, exhibit uniform spiral diameters of ~80 nm (local segment diameters of ~60 nm) with tapered hexagonal tips. High resolution electron microscopy, in combination with nanoprobe energy dispersive X-ray spectroscopy and valence electron energy loss spectroscopy, show that individual nanospirals consist of an In-rich core with ~15 nm-diameter hexagonal cross-section, comprised of curved basal planes. The core is surrounded by an Al-rich shell with a thickness asymmetry spiraling along the core. The ensemble nanospirals, across the 1 cm2 wafers, show high in-plane ordering with respect to shape, crystalline orientation, and direction of compositional gradient. Mueller matrix spectroscopic ellipsometry shows that the tailored chirality is manifested in the polarization state of light reflected off the CLEG nanospiral-coated wafers. In that, the polarization state is shown to be dependent on the handedness of the nanospirals and the wavelength of the incident light in the ultraviolet-visible region.
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29. |
- Hsiao, Ching-Lien, et al.
(författare)
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Nucleation and core-shell formation mechanism of self-induced InxAl1−xN core-shell nanorods grown on sapphire substrates by magnetron sputter epitaxy
- 2016
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Ingår i: Vacuum. - : Pergamon Press. - 0042-207X .- 1879-2715. ; 131, s. 39-43
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Tidskriftsartikel (refereegranskat)abstract
- Nucleation of self-induced nanorod and core-shell structure formation by surface-induced phase separation have been studied at the initial growth stage. The growth of well-separated core shell nanorods is only found in a transition temperature region (600 degrees C amp;lt;= T amp;lt;= 800 degrees C) in contrast to the result of thin film growth outside this region (T amp;lt; 600 degrees C or T amp;gt; 800 degrees C). Formation of multiple compositional domains, due to phase separation, after similar to 20 nm InxAl1-xN epilayer growth from sapphire substrate promotes the core-shell nanorod growth, showing a modified Stranski-Krastanov growth mode. The use of VN seed layer makes the initial growth of the nanorods directly at the substrate interface, revealing a Volmer-Weber growth mode. Different compositional domains are found on VN template surface to support that the phase separation takes place at the initial nucleation process and forms by a self-patterning effect. The nanorods were grown from In-rich domains and initiated the formation of core-shell nanorods due to spinodal decomposition of the InxAl1-xN alloy with a composition in the miscibility gap.
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30. |
- Hsiao, Ching-Lien, et al.
(författare)
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Room-temperature heteroepitaxy of single-phase Al1-xInxN films with full composition range on isostructural wurtzite templates
- 2012
-
Ingår i: Thin Solid Films. - : Elsevier. - 0040-6090 .- 1879-2731. ; 524, s. 113-120
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Tidskriftsartikel (refereegranskat)abstract
- Al1-xInxN heteroepitaxial layers covering the full composition range have been realized by magnetron sputter epitaxy on basal-plane AlN, GaN, and ZnO templates at room temperature (RT). Both Al1-xInxN single layers and multilayers grown on these isostructural templates show single phase, single crystal wurtzite structure. Even at large lattice mismatch between the film and the template, for instance InN/AlN (similar to 13% mismatch), heteroepitaxy is achieved. However, RT-grown Al1-xInxN films directly deposited on non-isostructural c-plane sapphire substrate exhibit a polycrystalline structure for all compositions, suggesting that substrate surface structure is important for guiding the initial nucleation. Degradation of Al1-xInxN structural quality with increasing indium content is attributed to the formation of more point-and structural defects. The defects result in a prominent hydrostatic tensile stress component, in addition to the biaxial stress component introduced by lattice mismatch, in all RT-grown Al1-xInxN films. These effects are reflected in the measured in-plane and out-of-plane strains. The effect of hydrostatic stress is negligible compared to the effects of lattice mismatch in high-temperature grown AlN layers thanks to their low amount of defects. We found that Vegards rule is applicable to determine x in the RT-grown Al1-xInxN epilayers if the lattice constants of RT-sputtered AlN and InN films are used instead of those of the strain-free bulk materials.
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31. |
- Hsiao, Ching-Lien, et al.
(författare)
-
Spontaneous Formation of AlInN Core–Shell Nanorod Arrays by Ultrahigh-Vacuum Magnetron Sputter Epitaxy
- 2011
-
Ingår i: Applied Physics Express. - : Japan Society of Applied Physics. - 1882-0786. ; 4:115002
-
Tidskriftsartikel (refereegranskat)abstract
- The spontaneous formation of AlInN core–shell nanorod arrays with variable In concentration has been realized by ultrahigh-vacuum magnetron sputter epitaxy with Ti0.21Zr0.79N or VN seed layer assistance. The nanorods exhibit hexagonal cross sections with preferential growth along the c-axis. A core–shell rod structure with a higher In concentration in the core was observed by (scanning) transmission electron microscopy in combination with low-loss electron energy loss spectroscopy and energy dispersive X-ray spectroscopy. 5 K cathodoluminescence spectroscopy of Al0.86In0.14N nanorods revealed band edge emission at ∼5.46 eV, which was accompanied by a strong defect-related emission at ∼3.38 eV
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32. |
- Hsu, Yu-Hsuan, et al.
(författare)
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epsilon-Ga2O3 Grown on c-Plane Sapphire by MOCVD with a Multistep Growth Process
- 2022
-
Ingår i: Crystal Growth & Design. - : AMER CHEMICAL SOC. - 1528-7483 .- 1528-7505. ; 22:3
-
Tidskriftsartikel (refereegranskat)abstract
- Gallium oxide (Ga2O3) has especially become popular because of its established applications in semiconductors. Of five polymorphs, monoclinic beta-Ga2O3 is the most thermodynamically stable phase. However, orthorhombic Ga2O3 (also known as epsilon-Ga2O3 or kappa-Ga2O3) is gaining increasing interest due to its high lattice symmetry and peculiar ferroelectricity. Although the structural approach for estimating Ga2O3 has been studied both theoretically and experimentally, epsilon-Ga2O3 and kappa-Ga2O3 are still confused. In this study, epsilon-Ga2O3 epilayers are grown on c-plane sapphire by metal-organic chemical vapor deposition with a multistep growth process. A thin annealed epsilon-Ga2O3 buffer layer is grown in the first step. The sequent growth steps with slow, fast, or combination of slow then fast growth rate significantly influence the quality of epilayers compared with that of directly grown Ga2O3. Through a detailed transmission electron microscopy (TEM) characterization of these Ga2O3 epilayers, the structural relationship between orthorhombic kappa-Ga2O3 and hexagonal epsilon-Ga2O3 is elucidated. A series of first-principles density functional theory calculations are also carried out to confirm the argument.
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33. |
- Junaid, Muhammad, et al.
(författare)
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Effects of N2 Partial Pressure on Growth, Structure, and Optical Properties of GaN Nanorods Deposited by Liquid-Target Reactive Magnetron Sputter Epitaxy
- 2018
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Ingår i: Nanomaterials. - Basel, Switzerland : MDPI. - 2079-4991. ; 8:4
-
Tidskriftsartikel (refereegranskat)abstract
- GaN nanorods, essentially free from crystal defects and exhibiting very sharp band-edge luminescence, have been grown by reactive direct-current magnetron sputter epitaxy onto Si (111) substrates at a low working pressure of 5 mTorr. Upon diluting the reactive N2 working gas with a small amount of Ar (0.5 mTorr), we observed an increase in the nanorod aspect ratio from 8 to ~35, a decrease in the average diameter from 74 to 35 nm, and a two-fold increase in nanorod density. With further dilution (Ar = 2.5 mTorr), the aspect ratio decreased to 14, while the diameter increased to 60 nm and the nanorod density increased to a maximum of 2.4 × 109 cm−2. Yet, lower N2 partial pressures eventually led to the growth of continuous GaN films. The observed morphological dependence on N2 partial pressure is explained by a change from N-rich to Ga-rich growth conditions, combined with reduced GaN-poisoning of the Ga-target as the N2 gas pressure is reduced. Nanorods grown at 2.5 mTorr N2 partial pressure exhibited a high intensity 4 K photoluminescence neutral donor bound exciton transitions (D0XA) peak at ~3.479 eV with a full-width-at-half-maximum of 1.7 meV. High-resolution transmission electron microscopy corroborated the excellent crystalline quality of the nanorods.
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34. |
- Junaid, Muhammad, et al.
(författare)
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Electronic-grade GaN(0001)/Al2O3(0001) grown by reactive DC-magnetron sputter epitaxy using a liquid Ga target
- 2011
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Ingår i: Applied Physics Letters. - : American Institute of Physics. - 0003-6951 .- 1077-3118. ; 98:14, s. 141915-
-
Tidskriftsartikel (refereegranskat)abstract
- Electronic-grade GaN (0001) epilayers have been grown directly on Al2O3 (0001) substrates by reactive DC-magnetron sputter epitaxy (MSE) from a liquid Ga sputtering target in an Ar/N2 atmosphere. The as-grown GaN epitaxial film exhibit low threading dislocation density on the order of ≤ 1010 cm-2 obtained by transmission electron microscopy and modified Williamson-Hall plot. X-ray rocking curve shows narrow fullwidth at half maximum (FWHM) of 1054 arcsec of the 0002 reflection. A sharp 4 K photoluminescence peak at 3.474 eV with a FWHM of 6.3 meV is attributed to intrinsic GaN band edge emission. The high structural and optical qualities indicate that MSEgrown GaN epilayers can be used for fabricating high-performance devices without the need of any buffer layer.
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35. |
- Junaid, Muhammad, et al.
(författare)
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Epitaxial Growth of GaN (0001)/Al2O3 (0001) by Reactive High Power Impulse Magnetron Sputter Deposition
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Annan publikation (övrigt vetenskapligt/konstnärligt)abstract
- Epitaxial GaN (0001) thin films were grown on Al2O3 (0001) substrates by reactive high power impulse magnetron sputtering of liquid Ga targets in a mixed N2/Ar discharge. A combination of x-ray diffraction, electron microscopy, atomic force microscopy, μ-Raman mapping and spectroscopy, μ-photoluminescence, time of flight elastic recoil detection, and cathodoluminescence showed the formation of relaxed and strained domains in the same films. While the strained domains form due to ion bombardment during growth, the relaxed domains exhibit
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36. |
- Järrendahl, Kenneth, et al.
(författare)
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Polarization of Light Reflected from Chiral Structures - Calculations Compared with Mueller Matrix Ellipsometry Measurements on Natural and Synthetic Samples
- 2012
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Konferensbidrag (övrigt vetenskapligt/konstnärligt)abstract
- The Mueller matrix elements mij representing the polarization response from a nanostructured materialis determined by the constituent materials optical properties and the superstructure. Here, we investigate how chiral structures in form of helicoidally stacked uniaxial layers determine mij as a functionof polarization state, wavelength, incidence angle and azimuthal angle of the incoming light. The studied parameters include the layer materials ordinary/extraordinary optical properties, Euler angle values, and layer thickness as well as the thickness and pitch of the helicoidal superstructure. Sub- and superstructure inhomogeneity is also introduced. From the Fresnel-based calculations, mij aswell as the degree of polarization, ellipticity and azimuth of the polarization ellipse are obtained and presented as contour and trace plots to give a complete view of the polarization behavior. The results from the calculations are compared with Mueller matrix spectroscopic ellipsometry measurements of both natural and synthesized helicoidal structures. The measurements were performed with a dualrotating compensator system (RC2, J.A. Woollam Co., Inc.) for wavelengths in the range from 245 to 1000 nm and incident angles from 20 to 75°. For some measurements the azimuthal angle of the incident light was varied. The investigated natural chiral structures were exoskeletons from several beetles in the scarab subfamilies Cetoniinae and Rutelinae. As predicted from the calculations it isobserved that the reflection from these beetles can have a high degree of polarization and high ellipticity (near-circular polarization). Both left- and right-polarization was observed. The synthesized structures are helicoidal nanorods of Al1−xInxN grown on sapphire substrates with metal-nitride seedlayers using UHV magnetron sputtering. Due to an internal composition gradient (a variation of x) in the crystalline structure, the nanorods will tilt away from the substrate normal. Helicoidal structures can thus be obtained by rotating the substrate around its normal during deposition. Samples with different pitch and layer thickness with right-handed as well as left-handed chirality were grown. Also for these structures both left and right near-circular polarized light is observed. By combining calculations, ellipsometry measurements and scanning electron microscopy characterization we get agood input to build layered models of the natural and synthetic samples. After regression fitting agood agreement between calculated and measured optical data were obtained.
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37. |
- Kuo, Yu-Hung, et al.
(författare)
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Influence of InAiN Nanospiral Structures on the Behavior of Reflected Light Polarization
- 2018
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Ingår i: Nanomaterials. - : MDPI. - 2079-4991. ; 8:3
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Tidskriftsartikel (refereegranskat)abstract
- The influence of structural configurations of indium aluminum nitride (InA1N) nanospirals, grown by reactive magnetron sputter epitaxy, on the transformation of light polarization are investigated in terms of varying structural chirality, growth temperatures, titanium nitride (TiN) seed (buffer) layer thickness, nanospiral thickness, and pitch. The handedness of reflected circularly polarized light in the ultraviolet-visible region corresponding to the chirality of nanospirals is demonstrated. A high degree of circular polarization (P-c) value of 0.75 is obtained from a sample consisting of 1.2 mu m InA1N nanospirals grown at 650 degrees C. A film-like structure is formed at temperatures lower than 450 degrees C. At growth temperatures higher than 750 degrees C, less than 0.1 In-content is incorporated into the InA1N nanospirals. Both cases reveal very low P-c-A red shift of wavelength at P-c peak is found with increasing nanospiral pitch in the range of 200-300 nm. The P-c decreases to 0.37 for two-turn nanospirals with total length of 0.7 mu m, attributed to insufficient constructive interference. A branch-like structure appears on the surface when the nanospirals are grown longer than 1.2 mu m, which yields a low P-c around 0.5, caused by the excessive scattering of incident light.
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38. |
- Landälv, Ludvig, 1982-, et al.
(författare)
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Phase evolution of radio frequency magnetron sputtered Cr-rich (Cr,Zr)(2)O-3 coatings studied by in situ synchrotron X-ray diffraction during annealing in air or vacuum
- 2019
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Ingår i: Journal of Materials Research. - : CAMBRIDGE UNIV PRESS. - 0884-2914 .- 2044-5326. ; 34:22, s. 3735-3746
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Tidskriftsartikel (refereegranskat)abstract
- The phase evolution of reactive radio frequency (RF) magnetron sputtered Cr0.28Zr0.10O0.61 coatings has been studied by in situ synchrotron X-ray diffraction during annealing under air atmosphere and vacuum. The annealing in vacuum shows t-ZrO2 formation starting at similar to 750-800 degrees C, followed by decomposition of the alpha-Cr2O3 structure in conjunction with bcc-Cr formation, starting at similar to 950 degrees C. The resulting coating after annealing to 1140 degrees C is a mixture of t-ZrO2, m-ZrO2, and bcc-Cr. The air-annealed sample shows t-ZrO2 formation starting at similar to 750 degrees C. The resulting coating after annealing to 975 degrees C is a mixture of t-ZrO2 and alpha-Cr2O3 (with dissolved Zr). The microstructure coarsened slightly during annealing, but the mechanical properties are maintained, with no detectable bcc-Cr formation. A larger t-ZrO2 fraction compared with alpha-Cr2O3 is observed in the vacuum-annealed coating compared with the air-annealed coating at 975 degrees C. The results indicate that the studied pseudo-binary oxide is more stable in air atmosphere than in vacuum.
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39. |
- Li, Zaifang, et al.
(författare)
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A Free-Standing High-Output Power Density Thermoelectric Device Based on Structure-Ordered PEDOT:PSS
- 2018
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Ingår i: Advanced Electronic Materials. - : Wiley-VCH Verlagsgesellschaft. - 2199-160X. ; 4:2
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Tidskriftsartikel (refereegranskat)abstract
- A free-standing high-output power density polymeric thermoelectric (TE) device is realized based on a highly conductive (approximate to 2500 S cm(-1)) structure-ordered poly(3,4-ethylenedioxythiophene):polystyrene sulfonate film (denoted as FS-PEDOT:PSS) with a Seebeck coefficient of 20.6 mu V K-1, an in-plane thermal conductivity of 0.64 W m(-1) K-1, and a peak power factor of 107 mu W K-2 m(-1) at room temperature. Under a small temperature gradient of 29 K, the TE device demonstrates a maximum output power density of 99 +/- 18.7 mu W cm(-2), which is the highest value achieved in pristine PEDOT:PSS based TE devices. In addition, a fivefold output power is demonstrated by series connecting five devices into a flexible thermoelectric module. The simplicity of assembling the films into flexible thermoelectric modules, the low out-of-plane thermal conductivity of 0.27 W m(-1) K-1, and free-standing feature indicates the potential to integrate the FS-PEDOT:PSS TE modules with textiles to power wearable electronics by harvesting human bodys heat. In addition to the high power factor, the high thermal stability of the FS-PEDOT:PSS films up to 250 degrees C is confirmed by in situ temperature-dependent X-ray diffraction and grazing incident wide angle X-ray scattering, which makes the FS-PEDOT:PSS films promising candidates for thermoelectric applications.
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40. |
- Lo, Yi-Ling, et al.
(författare)
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Determination of effective Ga/N ratio to control GaN growth behavior in liquid-target reactive magnetron sputter epitaxy
- 2024
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Ingår i: Materials Science in Semiconductor Processing. - : ELSEVIER SCI LTD. - 1369-8001 .- 1873-4081. ; 176
-
Tidskriftsartikel (refereegranskat)abstract
- The optimization of magnetron sputter epitaxy (MSE) for the high -volume production of high -quality GaN films is increasingly important. This study concerns the influence of key MSE process parameters - including the partial pressure of process gas, target -to -substrate distance (TSD), and growth temperature (TG) - for the synthesis of GaN thin films using a liquid Ga target. It is observed that the effective Ga/N ratio on the substrate surface determines the film's growth behavior and affects material's composition and luminescence properties. A lower Ar/N2 partial pressure ratio substantially enhances the crystalline quality, evidenced by the reduction in peak width of x-ray rocking curves from approximately 1.25 degrees (N -rich regime) to 0.35 degrees (Ga-rich regime) and improved GaN bandgap emission. While target sputtered in a highly Ga-rich condition significantly reduces the GaN growth rate (R), primarily due to Ga desorption in nitrogen -limited condition at elevated TG. Ion mass spectrometry and rate monitor measurements demonstrate that the Ga/N ratio can be controlled by adjusting Ar/N2 pressure ratio in MSE process. A reduction in TSD from 9.3 cm to 7 cm resulted in an increased R from 541 nm/h to 731 nm/h, corroborated by Simulation of Metal Transport (SIMTRA) analysis. Temperature -dependent studies revealed that films grown above 900 degrees C exhibited flat surface with high crystalline quality.
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41. |
- Lu, Chan-Hung, et al.
(författare)
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beta-Ga2O3 MOSFETs electrical characteristic study of various etching depths grown on sapphire substrate by MOCVD
- 2023
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Ingår i: DISCOVER NANO. - : SPRINGER. - 2731-9229. ; 18:1
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Tidskriftsartikel (refereegranskat)abstract
- beta-Ga2O3 thin films with both a 45 nm Si-doped conductive epilayer and unintentionally doped epilayer were grown on c-plane sapphire substrate by metalorganic chemical vapor deposition. beta-Ga2O3 based metal-oxide-semiconductor field-effect transistors (MOSFETs) were fabricated with gate recess depths of 20 nm and 40 nm (it indicated gate depth with 70 nm and 50 nm, respective), respectively, and without said recessing process. The conductivity of beta-Ga2O3 epilayers was improved through low in situ doping using a tetraethoxysilane precursor to increase MOSFET forward current density. After recessing, MOSFET operation was transferred from depletion to enhanced mode. In this study, the maximum breakdown voltage of the recessed 40 nm transistor was 770 V. The etching depth of a recessed-gate device demonstrates its influence on device electrical performance.
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42. |
- Machado Filho, Manoel Alves, et al.
(författare)
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Density Functional Theory-Fed Phase Field Model for Semiconductor Nanostructures: The Case of Self-Induced Core-Shell InAlN Nanorods
- 2024
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Ingår i: Crystal Growth & Design. - : AMER CHEMICAL SOC. - 1528-7483 .- 1528-7505.
-
Tidskriftsartikel (refereegranskat)abstract
- The self-induced formation of core-shell InAlN nanorods (NRs) is addressed at the mesoscopic scale by density functional theory (DFT)-resulting parameters to develop phase field modeling (PFM). Accounting for the structural, bonding, and electronic features of immiscible semiconductor systems at the nanometer scale, we advance DFT-based procedures for computation of the parameters necessary for PFM simulation runs, namely, interfacial energies and diffusion coefficients. The developed DFT procedures conform to experimental self-induced InAlN NRs' concerning phase-separation, core/shell interface, morphology, and composition. Finally, we infer the prospects for the transferability of the coupled DFT-PFM simulation approach to a wider range of nanostructured semiconductor materials.
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43. |
- Magnusson, Roger, et al.
(författare)
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Chiral nanostructures producing near circular polarization
- 2014
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Ingår i: Optical Materials Express. - : Optical Society of America. - 2159-3930. ; 4:7, s. 1389-1403
-
Tidskriftsartikel (refereegranskat)abstract
- Optical properties of chiral nanostructured films made of Al1-xInxN using a new growth mechanism - curved-lattice epitaxial growth - are reported. Using this technique, chiral films with right- and left-handed nanospirals were produced. The chiral properties of the films, originating mainly from an internal anisotropy and to a lesser extent from the external helical shape of the nanospirals, give rise to selective reflection of circular polarization which makes them useful as narrow-band near-circular polarization reflectors. The chiral nanostructured films reflect light with high degree of circular polarization in the ultraviolet part of the spectrum with left- and right-handedness depending on the handedness of the nanostructures in the films.
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44. |
- Magnusson, Roger, 1977-, et al.
(författare)
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InxAl1-xN chiral nanorods mimicking the polarization features of scarab beetles
- 2015
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Ingår i: SPIE Proceedings Vol. 942. - : SPIE - International Society for Optical Engineering. - 9781628415322 ; , s. 94290A-1-94290A-8
-
Konferensbidrag (refereegranskat)abstract
- The scarab beetle Cetonia aurata is known to reflect light with brilliant colors and a high degree of circular polarization. Both color and polarization effects originate from the beetles exoskeleton and have been attributed to a Bragg reflection of the incident light due to a twisted laminar structure. Our strategy for mimicking the optical properties of the Cetonia aurata was therefore to design and fabricate transparent, chiral films. A series of films with tailored transparent structures of helicoidal InxAl1-xN nanorods were grown on sapphire substrates using UHV magnetron sputtering. The value of x is tailored to gradually decrease from one side to the other in each nanorod normal to its growth direction. This introduces an in-plane anisotropy with different refractive indices in the direction of the gradient and perpendicular to it. By rotating the sample during film growth the in-plane optical axis will be rotated from bottom to top and thereby creating a chiral film. Based on Muellermatrix ellipsometry, optical modeling has been done suggesting that both the exoskeleton of Cetonia aurata and our artificial material can be modeled by an anisotropic film made up of a stack of thin layers, each one with its in-plane optical axis slightly rotated with respect to the previous layer. Simulations based on the optical modeling were used to investigate how pitch and thickness of the film together with the optical properties of the constitutive materials affects the width and spectral position of the Bragg reflection band.
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45. |
- Magnusson, Roger, et al.
(författare)
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Optical Mueller Matrix Modeling of Chiral AlxIn1-xN Nanospirals
- 2014
-
Ingår i: Thin Solid Films. - : Elsevier. - 0040-6090 .- 1879-2731. ; 571, s. 447-452
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Tidskriftsartikel (refereegranskat)abstract
- Metamaterials in the form of chiral nanostructures have shown great potential for applications such as chemical and biochemical sensors and broadband or wavelength tunable circular polarizers. Here we demonstrate a method to produce tailored transparent chiral nanostructures with the wide-bandgap semiconductor AlxIn1 − xN. A series of anisotropic and transparent films of AlxIn1 − xN were produced using curved-lattice epitaxial growth on metallic buffer layers. By controlling the sample orientation during dual magnetron sputter deposition, nanospirals with right-handed or left-handed chirality were produced. Using a dual rotating compensator ellipsometer in reflection mode, the full Mueller matrix was measured in the spectral range 245–1700 nm at multiple angles of incidence. The samples were rotated one full turn around their normal during measurements to provide a complete description of the polarization properties in all directions. For certain wavelengths, unpolarized light reflected off these films becomes highly polarized with a polarization state close to circular. Nanostructured films with right- and left-handed chirality produce reflections with right- and left-handed near-circularly polarized light, respectively. A model with a biaxial layer in which the optical axes are rotated from bottom to top was fitted to the Mueller-matrix data. Hence we can perform non-destructive structural analysis of the complex thin layers and confirm the tailored structure. In addition, the refractive index, modeled with a biaxial Cauchy dispersion model, is obtained for the AlxIn1 − xN films.
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46. |
- Muhammad, Junaid, et al.
(författare)
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Liquid-target Reactive Magnetron Sputter Epitaxy of High Quality GaN(0001ɸ)ɸ Nanorods on Si(111)
- 2015
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Ingår i: Materials Science in Semiconductor Processing. - : Elsevier. - 1369-8001 .- 1873-4081. ; 39, s. 702-710
-
Tidskriftsartikel (refereegranskat)abstract
- Direct current magnetron sputter epitaxy with a liquid Ga sputtering target hasbeen used to grow single-crystal GaN(0001) nanorods directly on Si(111)substrates at different working pressures ranging from 5 to 20 mTorr of pure N2,.The as-grown GaN nanorods exhibit very good crystal quality from bottom to topwithout stacking faults, as determined by transmission electron microscopy. Thecrystal quality is found to increase with increasing working pressure. X-raydiffraction results show that all the rods are highly (0001)-oriented. Thenanorods exhibit an N-polarity, as determined by convergent beam electrondiffraction methods. Sharp and well-resolved 4 K photoluminescence peaks at ~3.474 eV with a FWHM ranging from 1.7 meV to 35 meV are attributed to theintrinsic GaN band edge emission and corroborate the superior structuralproperties of the material. Texture measurements reveal that the rods haverandom in-plane orientation when grown on Si(111) with native oxide, while theyhave an in-plane epitaxial relationship of GaN[110] // Si[110] when grown onsubstrates without surface oxide.
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47. |
- Muhammad, Junaid, et al.
(författare)
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Stress Evolution during Growth of GaN (0001)/Al2O3 (0001) by Reactive DC Magnetron Sputter Epitaxy
- 2014
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Ingår i: Journal of Physics D. - : IOP Publishing. - 0022-3727 .- 1361-6463. ; 47:14, s. 145301-
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Tidskriftsartikel (refereegranskat)abstract
- We study the real time stress evolution, by in-situ curvature measurements, during magnetron sputter epitaxy of GaN (0001) epilayers at different growth temperatures, directly on Al2O3 (0001) substrates. The epilayers are grown by sputtering from a liquid Ga target in a mixed N2/Ar discharge. For 600 °C, a tensile biaxial stress evolution is observed, while for 700 °C and 800 °C, compressive stress evolutions are observed. Structural characterization by crosssectional transmission electron microscopy, and atomic force microscopy revealed that films grew at 700 °C and 800 °C in a layer-by-layer mode while a growth temperature of 600 °C led to an island growth mode. High resolution Xray diffraction data showed that edge and screw threading dislocation densities decreased with increasing growth temperature with a total density of 5.5×1010 cm-2. The observed stress evolution and growth modes are explained by a high adatom mobility during magnetron sputter epitaxy at 700 - 800 °C. Also other possible reasons for the different stress evolutions are discussed.
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48. |
- Muhammad, Junaid, et al.
(författare)
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Two-domain formation during the epitaxial growth of GaN (0001) on c-plane Al2O3 (0001) by high power impulse magnetron sputtering
- 2011
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Ingår i: Journal of Applied Physics. - : American Institute of Physics (AIP). - 0021-8979 .- 1089-7550. ; 110:12, s. 123519-
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Tidskriftsartikel (refereegranskat)abstract
- We study the effect of high power pulses in reactive magnetron sputter epitaxy on the structural properties of GaN (0001) thin films grown directly on Al2O3 (0001) substrates. The epilayers are grown by sputtering from a liquid Ga target, using a high power impulse magnetron sputtering power supply in a mixed N2/Ar discharge. X-ray diffraction, micro-Raman, micro-photoluminescence, and transmission electron microscopy investigations show the formation of two distinct types of domains. One almost fully relaxed domain exhibits superior structural and optical properties as evidenced by rocking curves with a full width at half maximum of 885 arc sec and a low temperature band edge luminescence at 3.47 eV with the full width at half maximum of 10 meV. The other domain exhibits a 14 times higher isotropic strain component, which is due to the higher densities of the point and extended defects, resulting from the ion bombardment during growth. Voids form at the domain boundaries. Mechanisms for the formation of differently strained domains, along with voids during the epitaxial growth of GaN are discussed.
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49. |
- Palisaitis, Justinas, et al.
(författare)
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Core-shell formation in self-induced InAlN nanorods
- 2017
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Ingår i: Nanotechnology. - : IOP PUBLISHING LTD. - 0957-4484 .- 1361-6528. ; 28:11
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Tidskriftsartikel (refereegranskat)abstract
- We have examined the early stages of self-induced InAlN core-shell nanorod (NR) formation processes on amorphous carbon substrates in plan-view geometry by means of transmission electron microscopy methods. The results show that the grown structure phase separates during the initial moments of deposition into a majority of Al-rich InAlN and a minority of In-enriched InAlN islands. The islands possess polygonal shapes and are mainly oriented along a crystallographic c-axis. The growth proceeds with densification and coalescence of the In-enriched islands, resulting in a base for the In-enriched NR cores with shape transformation to hexagonal. The Al-rich shell formation around such early cores is observed at this stage. The matured core-shell structure grows axially and radially, eventually reaching a steady growth state which is dominated by the axial NR growth. We discuss the NR formation mechanism by considering the adatom surface kinetics, island surface energy, phase separation of InAlN alloys, and incoming flux directions during dual magnetron sputter epitaxy.
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50. |
- Palisaitis, Justinas, et al.
(författare)
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Direct observation of spinodal decomposition phenomena in InAlN alloys during in-situ STEM heating
- 2017
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Ingår i: Scientific Reports. - : NATURE PUBLISHING GROUP. - 2045-2322. ; 7
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Tidskriftsartikel (refereegranskat)abstract
- The spinodal decomposition and thermal stability of thin In0.72Al0.28N layers and In0.72Al0.28N/AlN superlattices with AlN(0001) templates on Al2O3(0001) substrates was investigated by in-situ heating up to 900 degrees C. The thermally activated structural and chemical evolution was investigated in both plan-view and cross-sectional geometries by scanning transmission electron microscopy in combination with valence electron energy loss spectroscopy. The plan-view observations demonstrate evidence for spinodal decomposition of metastable In0.72Al0.28N after heating at 600 degrees C for 1 h. During heating compositional modulations in the range of 2-3 nm-size domains are formed, which coarsen with applied thermal budgets. Cross-sectional observations reveal that spinodal decomposition begin at interfaces and column boundaries, indicating that the spinodal decomposition has a surface-directed component.
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