Search: onr:"swepub:oai:DiVA.org:kth-21118" >
Annealing kinetics ...
Annealing kinetics of vacancy-related defects in low-dose MeV self-ion-implanted n-type silicon
-
Pellegrino, P. (author)
-
Leveque, P. (author)
-
Lalita, J. (author)
-
show more...
-
- Hallén, Anders. (author)
- KTH,Mikroelektronik och informationsteknik, IMIT
-
Jagadish, C. (author)
-
Svensson, B. G. (author)
-
show less...
-
(creator_code:org_t)
- 2001
- 2001
- English.
-
In: Physical Review B. Condensed Matter and Materials Physics. - 1098-0121 .- 1550-235X. ; 64:19
- Related links:
-
https://urn.kb.se/re...
-
show more...
-
https://doi.org/10.1...
-
show less...
Abstract
Subject headings
Close
- Silicon samples of n-type have been implanted at room temperature with 5.6-MeV Si-28 ions to a dose of 2 x 10(8) cm(-2) and then annealed at temperatures from 100 to 380 degreesC. Both isothermal and isochronal treatments were performed and the annealing kinetics of the prominent divacancy (V-2) and vacancy-oxygen (VO) centers were studied in detail using deep-level transient spectroscopy. The decrease Of V2 centers exhibits first-order kinetics in both Czochralski-grown (CZ) and float-zone (FZ) samples, and the data provide strong evidence for a process involving migration of V-2 and subsequent annihilation at trapping centers. The migration energy extracted for V-2 is similar to1.3 eV and from the shape of the concentration versus depth profiles, an effective diffusion length less than or equal to0.1 mum is obtained. The VO center displays a more complex annealing behavior where interaction with mobile hydrogen (H) plays a key role through the formation of VOH and VOH2 centers. Another contribution is migration of VO and trapping by interstitial oxygen atoms in the silicon lattice, giving rise to vacancy-dioxygen pairs. An activation energy of similar to 1.8 eV is deduced for the migration of VO, in close resemblance with results from previous studies using electron-irradiated samples. A model for the annealing of VO, involving only three reactions, is put forward and shown to yield a close quantitative agreement with the experimental data for both CZ and FZ samples over the whole temperature range studied.
Keyword
- electron-irradiated silicon
- level transient spectroscopy
- hydrogen-oxygen interaction
- boron-doped silicon
- p-type silicon
- point-defects
- crystalline silicon
- charge state
- deep levels
- dependence
Publication and Content Type
- ref (subject category)
- art (subject category)
Find in a library
To the university's database