Sökning: onr:"swepub:oai:DiVA.org:kth-306575" > Modeling of high po...
Fältnamn | Indikatorer | Metadata |
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000 | 04771naa a2200529 4500 | |
001 | oai:DiVA.org:kth-306575 | |
003 | SwePub | |
008 | 211220s2021 | |||||||||||000 ||eng| | |
009 | oai:DiVA.org:liu-181787 | |
024 | 7 | a https://urn.kb.se/resolve?urn=urn:nbn:se:kth:diva-3065752 URI |
024 | 7 | a https://doi.org/10.1088/1361-6595/ac352c2 DOI |
024 | 7 | a https://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-1817872 URI |
040 | a (SwePub)kthd (SwePub)liu | |
041 | a engb eng | |
042 | 9 SwePub | |
072 | 7 | a ref2 swepub-contenttype |
072 | 7 | a art2 swepub-publicationtype |
100 | 1 | a Eliasson, H.u Linköpings universitet,Plasma och ytbeläggningsfysik,Tekniska fakulteten4 aut0 (Swepub:liu)n/a |
245 | 1 0 | a Modeling of high power impulse magnetron sputtering discharges with graphite target |
264 | c 2021-11-30 | |
264 | 1 | b IOP Publishing Ltd,c 2021 |
338 | a print2 rdacarrier | |
500 | a QC 20211220 | |
500 | a Funding Agencies|Free State of Saxony; European Regional Development FundEuropean Commission [100336119]; Icelandic Research Fund [196141]; Swedish Research CouncilSwedish Research CouncilEuropean Commission [VR 201804139]; Swedish Government Strategic Research Area in Materials Science on Functional Materials at Linkoping University (Faculty Grant SFO-Mat-LiU) [2009-00971] | |
520 | a The ionization region model (IRM) is applied to model a high power impulse magnetron sputtering discharge in argon with a graphite target. Using the IRM, the temporal variation of the various species and the average electron energy, as well as internal parameters such as the ionization probability, back-attraction probability, and the ionized flux fraction of the sputtered species, is determined. It is found that thedischarge develops into working gas recycling and most of the discharge current at the cathode target surface is composed of Ar+ ions, which constitute over 90% of the discharge current, while the contribution of the C+ ions is always small (<5%), even for peak current densities close to 3 A cm(-2). For the target species, the time-averaged ionization probability is low, or 13-27%, the ion back-attraction probability during the pulse is high (>92%), and the ionized flux fraction is about 2%. It is concluded that in the operation range studied here it is a challenge to ionize carbon atoms, that are sputtered off of a graphite target in a magnetron sputtering discharge, when depositing amorphous carbon films. | |
650 | 7 | a NATURVETENSKAPx Fysikx Fusion, plasma och rymdfysik0 (SwePub)103032 hsv//swe |
650 | 7 | a NATURAL SCIENCESx Physical Sciencesx Fusion, Plasma and Space Physics0 (SwePub)103032 hsv//eng |
653 | a magnetron sputtering discharge | |
653 | a graphite | |
653 | a high power impulse magnetron sputtering | |
653 | a carbon | |
700 | 1 | a Rudolph, M.u Leibniz Inst Surface Engn IOM, Permoserstr 15, D-04318 Leipzig, Germany.4 aut |
700 | 1 | a Brenning, Nilsu Linköpings universitet,KTH,Rymd- och plasmafysik,Linköping Univ, Plasma & Coatings Phys Div, IFM Mat Phys, SE-58183 Linköping, Sweden.,Plasma och ytbeläggningsfysik,Tekniska fakulteten,KTH Royal Inst Technol, Sweden4 aut0 (Swepub:liu)nilbr83 |
700 | 1 | a Hajihoseini, H.u Univ Twente, MESA Inst Nanotechnol, Ind Focus Grp XUV Opt, Drienerlolaan 5, NL-7522 NB Enschede, Netherlands.4 aut |
700 | 1 | a Zanaska, Michalu Linköpings universitet,Plasma och ytbeläggningsfysik,Tekniska fakulteten4 aut0 (Swepub:liu)micza83 |
700 | 1 | a Adriaans, M. J.u Eindhoven Univ Technol, Dept Appl Phys, Eindhoven, Netherlands.4 aut |
700 | 1 | a Raadu, Michael A.u KTH,Rymd- och plasmafysik,KTH Royal Inst Technol, Sweden4 aut0 (Swepub:kth)u1ajzw7w |
700 | 1 | a Minea, T. M.u Univ Paris Saclay, Lab Phys Gaz & Plasmas LPGP, CNRS, UMR 8578, F-91405 Orsay, France.4 aut |
700 | 1 | a Gudmundsson, Jon Tomas,d 1965-u KTH,Rymd- och plasmafysik,Univ Iceland, Sci Inst, Dunhaga 3, IS-107 Reykjavik, Iceland.,KTH Royal Inst Technol, Sweden; Univ Iceland, Iceland4 aut0 (Swepub:kth)u1q27a34 |
700 | 1 | a Lundin, Danielu Linköpings universitet,Plasma och ytbeläggningsfysik,Tekniska fakulteten4 aut0 (Swepub:liu)danlu03 |
710 | 2 | a Linköpings universitetb Plasma och ytbeläggningsfysik4 org |
773 | 0 | t Plasma sources science & technologyd : IOP Publishing Ltdg 30:11q 30:11x 0963-0252x 1361-6595 |
856 | 4 | u http://liu.diva-portal.org/smash/get/diva2:1619968/FULLTEXT01 |
856 | 4 | u https://liu.diva-portal.org/smash/get/diva2:1619968/FULLTEXT01.pdfx primaryx Raw objecty fulltext:print |
856 | 4 8 | u https://urn.kb.se/resolve?urn=urn:nbn:se:kth:diva-306575 |
856 | 4 8 | u https://doi.org/10.1088/1361-6595/ac352c |
856 | 4 8 | u https://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-181787 |
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