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Plasma chemistries ...
Plasma chemistries for high density plasma etching of SiC
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Hong, J. (author)
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Shul, R. J. (author)
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Zhang, L. (author)
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Lester, L. F. (author)
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Cho, H. (author)
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Hahn, Y. B. (author)
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Hays, D. C. (author)
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Jung, K. B. (author)
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Pearton, S. J. (author)
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- Zetterling, Carl-Mikael (author)
- KTH,Integrerade komponenter och kretsar
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- Östling, Mikael (author)
- KTH,Integrerade komponenter och kretsar
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(creator_code:org_t)
- Charlottesville, VA, USA, 1999
- 1999
- English.
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In: Journal of Electronic Materials. - Charlottesville, VA, USA. - 0361-5235 .- 1543-186X. ; 28:3, s. 196-201
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https://urn.kb.se/re...
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Abstract
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- A variety of different plasma chemistries, including SF6, Cl2, ICI, and IBr, have been examined for dry etching of 6H-SiC in high ion density plasma tools (inductively coupled plasma and electron cyclotron resonance). Rates up to 4500 angstroms·min-1 were obtained for SF6 plasmas, while much lower rates (≀800 angstroms·min-1) were achieved with Cl2, ICI, and IBr. The F2-based chemistries have poor selectivity for SiC over photoresist masks (typically 0.4-0.5), but Ni masks are more robust, and allow etch depths ≥10 Όm in the SiC. A micromachining process (sequential etch/deposition steps) designed for Si produces relatively low etch rates (<2,000 angstroms·min-1) for SiC.
Subject headings
- TEKNIK OCH TEKNOLOGIER -- Elektroteknik och elektronik -- Annan elektroteknik och elektronik (hsv//swe)
- ENGINEERING AND TECHNOLOGY -- Electrical Engineering, Electronic Engineering, Information Engineering -- Other Electrical Engineering, Electronic Engineering, Information Engineering (hsv//eng)
Keyword
- Chlorine
- Electron cyclotron resonance
- Fluorine compounds
- Iodine compounds
- Masks
- Micromachining
- Photoresists
- Plasma density
- Plasma etching
- Silicon carbide
- Inductively coupled plasma
- Plasma chemistry
- Sulfur hexafluoride
- Semiconducting silicon compounds
Publication and Content Type
- ref (subject category)
- art (subject category)
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- By the author/editor
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Hong, J.
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Shul, R. J.
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Zhang, L.
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Lester, L. F.
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Cho, H.
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Hahn, Y. B.
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show more...
-
Hays, D. C.
-
Jung, K. B.
-
Pearton, S. J.
-
Zetterling, Carl ...
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Östling, Mikael
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show less...
- About the subject
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- ENGINEERING AND TECHNOLOGY
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ENGINEERING AND ...
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and Electrical Engin ...
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and Other Electrical ...
- Articles in the publication
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Journal of Elect ...
- By the university
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Royal Institute of Technology