Sökning: onr:"swepub:oai:DiVA.org:uu-340698" >
HPPMS deposition fr...
HPPMS deposition from composite targets : Effect of two orders of magnitude target power density changes on the composition of sputtered Cr-Al-C thin films
-
- Ruess, H. (författare)
- Rhein Westfal TH Aachen, Mat Chem, Kopernikusstr 10, D-52074 Aachen, Germany.
-
- Baben, M. To (författare)
- Rhein Westfal TH Aachen, Mat Chem, Kopernikusstr 10, D-52074 Aachen, Germany.;GTT Technol, Kaiserstr 103, D-52134 Herzogenrath, Germany.
-
- Mraz, S. (författare)
- Rhein Westfal TH Aachen, Mat Chem, Kopernikusstr 10, D-52074 Aachen, Germany.
-
visa fler...
-
- Shang, L. (författare)
- Rhein Westfal TH Aachen, Mat Chem, Kopernikusstr 10, D-52074 Aachen, Germany.
-
- Polcik, P. (författare)
- Plansee Composite Mat GmbH, Siebenburgerstr 23, D-86963 Lechbruck, Germany.
-
- Kolozsvari, S. (författare)
- Plansee Composite Mat GmbH, Siebenburgerstr 23, D-86963 Lechbruck, Germany.
-
- Hans, M. (författare)
- Rhein Westfal TH Aachen, Mat Chem, Kopernikusstr 10, D-52074 Aachen, Germany.
-
- Primetzhofer, Daniel (författare)
- Uppsala universitet,Tillämpad kärnfysik
-
- Schneider, Jochen M. (författare)
- Uppsala universitet,Tillämpad kärnfysik,Rhein Westfal TH Aachen, Mat Chem, Kopernikusstr 10, D-52074 Aachen, Germany
-
visa färre...
-
Rhein Westfal TH Aachen, Mat Chem, Kopernikusstr 10, D-52074 Aachen, Germany Rhein Westfal TH Aachen, Mat Chem, Kopernikusstr 10, D-52074 Aachen, Germany.;GTT Technol, Kaiserstr 103, D-52134 Herzogenrath, Germany. (creator_code:org_t)
- PERGAMON-ELSEVIER SCIENCE LTD, 2017
- 2017
- Engelska.
-
Ingår i: Vacuum. - : PERGAMON-ELSEVIER SCIENCE LTD. - 0042-207X .- 1879-2715. ; 145, s. 285-289
- Relaterad länk:
-
https://urn.kb.se/re...
-
visa fler...
-
https://doi.org/10.1...
-
visa färre...
Abstract
Ämnesord
Stäng
- The effect of target power density, substrate bias potential and substrate temperature on the thin film composition was studied. A Cr-Al-C composite target was sputtered utilizing direct current (DCMS: 2.3 W/cm(2)) and high power pulsed magnetron sputtering (HPPMS: 373 W/cm(2)) generators. At floating potential, all Cr-Al-C thin films showed similar compositions, independently of the applied target power density. However, as substrate bias potential was increased to -400 V, aluminum deficiencies by a factor of up to 1.6 for DCMS and 4.1 for HPPMS were obtained. Based on the measured ion currents at the substrate, preferential re-sputtering of Al is suggested to cause the dramatic Al depletion. As the substrate temperature was increased to 560 degrees C, the Al concentration was reduced by a factor of up to 1.9 compared to the room temperature deposition. This additional reduction may be rationalized by thermally induced desorption being active in addition to re-sputtering.
Ämnesord
- NATURVETENSKAP -- Fysik (hsv//swe)
- NATURAL SCIENCES -- Physical Sciences (hsv//eng)
Nyckelord
- Thin films
- DCMS
- HPPMS
- Composite/compound target
- Target power density
- Substrate bias potential
Publikations- och innehållstyp
- ref (ämneskategori)
- art (ämneskategori)
Hitta via bibliotek
-
Vacuum
(Sök värdpublikationen i LIBRIS)
Till lärosätets databas