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Reducing the impuri...
Reducing the impurity incorporation from residual gas by ion bombardment during high vacuum magnetron sputtering
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- Rosen, Johanna (författare)
- Rhein Westfal TH Aachen
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- Widenkvist, Erika (författare)
- Uppsala universitet,Institutionen för materialkemi,Oorganisk kemi,oorganisk kemi,Uppsala University
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- Larsson, Karin (författare)
- Uppsala universitet,Institutionen för materialkemi,Oorganisk kemi,oorganisk kemi,Uppsala University
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- Kreissig, Ulrich (författare)
- Research Center Rossendorf
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- Mráz, Stanislav (författare)
- Rhein Westfal TH Aachen
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- Martinez, Carlos (författare)
- Rhein Westfal TH Aachen
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- Music, D (författare)
- Rhein Westfal TH Aachen
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- Schneider, J (författare)
- Rhein Westfal TH Aachen
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(creator_code:org_t)
- AIP Publishing, 2006
- 2006
- Engelska.
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Ingår i: Applied Physics Letters. - : AIP Publishing. - 0003-6951 .- 1077-3118. ; 88, s. 191905-
- Relaterad länk:
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https://urn.kb.se/re...
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https://doi.org/10.1...
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https://urn.kb.se/re...
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Abstract
Ämnesord
Stäng
- The influence of ion energy on the hydrogen incorporation has been investigated for alumina thin films, deposited by reactive magnetron sputtering in an Ar/O2/H2O environment. Ar+ with an average kinetic energy of ~5 eV was determined to be the dominating species in the plasma. The films were analyzed with x-ray diffraction, x-ray photoelectron spectroscopy, and elastic recoil detection analysis, demonstrating evidence for amorphous films with stoichiometric O/Al ratio. As the substrate bias potential was increased from –15 V (floating potential) to –100 V, the hydrogen content decreased by ~70%, from 9.1 to 2.8 at. %. Based on ab initio calculations, these results may be understood by thermodynamic principles, where a supply of energy enables surface diffusion, H2 formation, and desorption [Rosén et al., J. Phys.: Condens. Matter 17, L137 (2005)]. These findings are of importance for the understanding of the correlation between ion energy and film composition and also show a pathway to reduce impurity incorporation during film growth in a high vacuum ambient.
Ämnesord
- NATURVETENSKAP -- Kemi -- Oorganisk kemi (hsv//swe)
- NATURAL SCIENCES -- Chemical Sciences -- Inorganic Chemistry (hsv//eng)
Nyckelord
- Inorganic chemistry
- Oorganisk kemi
- MEDICINE
Publikations- och innehållstyp
- ref (ämneskategori)
- art (ämneskategori)
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