Determination of interface roughness by using a spectroscopic total-integrated-scatter instrument

• A spectroscopic total-integrated-scatter instrument has been constructed. It uses a Coblentz sphere for the collection of the scattered light and a lamp with a monochromator as a light source. It can be used to measure diffuse reflectance as well as transmittance. The instrument has been used to measure diffuse reflectance of thermally and chemical-vapor-deposition oxidized silicon wafers. Comparisons are made with measurements by using a spectrophotometer with an integrating sphere. The data have been interpreted with a parameterized model for light scattering from a double layer, to obtain rms surface roughness values for the two interfaces of the oxide film.

Ämnesord

TEKNIK OCH TEKNOLOGIER  -- Elektroteknik och elektronik (hsv//swe)

ENGINEERING AND TECHNOLOGY  -- Electrical Engineering, Electronic Engineering, Information Engineering (hsv//eng)

Nyckelord

Instruments; Light scattering; Light sources; Oxide films; Reflection; Silicon oxides; Spheres; Surface roughness; Vapors; Chemical vapor deposition; Optics; Spectroscopy

Diffuse reflectance; Double layers; Integrating spheres; Interface roughness; Oxidized silicon wafers; Parameterized model; Scattered light

Interfaces (materials); Roughness measurement

Chemical-vapor deposition oxidized silicon wafers; Interface roughness determination; Optical double layer; Spectroscopic total-integrated scatter instrument

Publikations- och innehållstyp

ref (ämneskategori)

art (ämneskategori)