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Ordering domains of...
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Jaczewska, JustynaInstitute of Physics, Jagiellonian University, Krakow, Poland
(author)
Ordering domains of spin cast blends of conjugated and dielectric polymers on surfaces patterned by soft- and photo-lithography
- Article/chapterEnglish2009
Publisher, publication year, extent ...
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London :Royal Society of Chemistry,2009
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Numbers
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LIBRIS-ID:oai:DiVA.org:kau-11156
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https://urn.kb.se/resolve?urn=urn:nbn:se:kau:diva-11156URI
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https://doi.org/10.1039/B811429CDOI
Supplementary language notes
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Language:English
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Summary in:English
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Subject category:ref swepub-contenttype
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Subject category:art swepub-publicationtype
Notes
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Spin casting polymer blends of conjugated and dielectric macromolecules onto chemically patterned metal and oxidized silicon surfaces might provide a simple method to fabricate polymer-based circuitries that can be integrated with conventional electronics. Such solution-processing of the blend components offers simultaneous deposition and pattern-directed alignment of the phase separated polymer domains. The alignment is driven by self-organization guided by preferential surface segregation. Here we demonstrate that the laterally arranged domain structures in spin cast films of theconjugated poly(3-alkylthiophenes) (P3ATs): P3BT, P3DDT and regioregular R-P3HT, blended with dielectric polystyrene (PS), can be ordered by three different surface templates. The templates are formed by a patterned self-assembled monolayer (SAM), micro-contact printed on the surface of interest, i.e. hexadecanethiols on gold (for alignment of P3DDT/PS blend) and octadecyltrichlorosilanes on oxidized silicon (for R-P3HT/PS). Additionally gold lines are micropatterned on SiO2 with photo-lithography (for P3BT/PS mixture). The forces driving pattern-directed self-organization of the polymers are discussed based on complementary studies of preferential surface segregation, observed for blend films spin cast on homogeneous surfaces that correspond to the different regions of the surface templates
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Added entries (persons, corporate bodies, meetings, titles ...)
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Budkowski, AndrzejM. Smoluchowski Insitute of Physics, Jagiellonian University, Reymonta 4, Krakow 30–059, Poland
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Bernasik, AndrzejFaculty of Physics and Applied Computer Science, AGH-University of Science and Technology, Al. Mickiewicza 30, Krakow 30–059, Poland
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Raptis, IoannisInstitute of Microelectronics, NCSR ‘‘Demokritos’’, Aghia Paraskevi, Athens 15310, Greece
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Moons, Ellen,1966-Karlstads universitet,Avdelningen för fysik och elektroteknik,Materialvetenskap,Materialfysik(Swepub:kau)ellemoon
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Goustouridis, DimitriosInstitute of Microelectronics, NCSR ‘‘Demokritos’’, Aghia Paraskevi, Athens 15310, Greece
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Haberko, JakubFaculty of Physics and Applied Computer Science, AGH-University of Science and Technology, Al. Mickiewicza 30, Krakow 30–059, Poland
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Rysz, JakubM. Smoluchowski Insitute of Physics, Jagiellonian University, Reymonta 4, Krakow 30–059, Poland
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Institute of Physics, Jagiellonian University, Krakow, PolandM. Smoluchowski Insitute of Physics, Jagiellonian University, Reymonta 4, Krakow 30–059, Poland
(creator_code:org_t)
Related titles
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In:Soft MatterLondon : Royal Society of Chemistry5:1, s. 234-2411744-683X
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