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Layer-by-layer 3D p...
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Fischer, Andreas C.KTH,Mikrosystemteknik
(author)
Layer-by-layer 3D printing of Si micro- and nanostructures by Si deposition, ion implantation and selective Si etching
- Article/chapterEnglish2012
Publisher, publication year, extent ...
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IEEE conference proceedings,2012
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electronicrdacarrier
Numbers
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LIBRIS-ID:oai:DiVA.org:kth-105842
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https://urn.kb.se/resolve?urn=urn:nbn:se:kth:diva-105842URI
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https://doi.org/10.1109/NANO.2012.6322048DOI
Supplementary language notes
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Language:English
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Summary in:English
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Classification
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Subject category:ref swepub-contenttype
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Subject category:kon swepub-publicationtype
Notes
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QC 20130110
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In this paper we report a method for layer-by-layer printing of three-dimensional (3D) silicon (Si) micro- and nanostructures. This fabrication method is based on a sequence of alternating steps of chemical vapor deposition of Si and local implantation of gallium (Ga+) ions by focused ion beam (FIB) writing. The defined 3D structures are formed in a final step by selectively wet etching the non-implanted Si in potassium hydroxide (KOH). We demonstrate the viability of the method by fabricating 2 and 3-layer 3D Si structures, including suspended beams and patterned lines with dimensions on the nm-scale.
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Gylfason, Kristinn B.,1978-KTH,Mikrosystemteknik(Swepub:kth)u1v3y7u7
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Belova, Lyubov M.
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Malm, Gunnar B.KTH,Integrerade komponenter och kretsar(Swepub:kth)u13lag9j
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Radamson, Henry H.KTH,Integrerade komponenter och kretsar(Swepub:kth)u1g2cqgr
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Kolahdouz, M.KTH,Integrerade komponenter och kretsar(Swepub:kth)u1cet9aw
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Rikers, Y. G. M.
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Stemme, GöranKTH,Mikrosystemteknik(Swepub:kth)u1oyebfq
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Niklaus, FrankKTH,Mikrosystemteknik(Swepub:kth)u1bcu8r2
(author)
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KTHMikrosystemteknik
(creator_code:org_t)
Related titles
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In:12th IEEE Conference on Nanotechnology (IEEE-NANO), 2012: IEEE conference proceedings, s. 1-49781467321983
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