Formation of nanoscale structures by inductively coupled plasma etching

QC 20131007
This paper will review the top down technique of ICP etching for the formation of nanometer scale structures. The increased difficulties of nanoscale etching will be described. However it will be shown and discussed that inductively coupled plasma (ICP) technology is well able to cope with the higher end of the nanoscale: features from 100nm down to about 40nm are relatively easy with current ICP technology. It is the ability of ICP to operate at low pressure yet with high plasma density and low (controllable) DC bias that helps greatly compared to simple reactive ion etching (RIE) and, though continual feature size reduction is increasingly challenging, improvements to ICP technology as well as improvements in masking are enabling sub-10nm features to be reached. Nanoscale ICP etching results will be illustrated in a range of materials and technologies. Techniques to facilitate etching (such as the use of cryogenic temperatures) and techniques to improve the mask performance will be described and illustrated.

TEKNIK OCH TEKNOLOGIER Annan teknik Övrig annan teknik hsv//swe
ENGINEERING AND TECHNOLOGY Other Engineering and Technologies Other Engineering and Technologies not elsewhere specified hsv//eng
Cryogenic
Etching
ICP
Nanoscale
Nanotechnology
Cryogenic temperatures
Feature sizes
Inductively coupled plasma (ICP)
Materials and technologies
Nano scale
Nanometer scale structure
Nanoscale structure
Cryogenics
Inductively coupled plasma
Plasma density
Technology
Nanoelectronics

Olynick, D. L.USA (författare)
Liu, Z.USA (författare)
Holmberg, AndersKTH,Biomedicinsk fysik och röntgenfysik(Swepub:kau)andeholm (författare)
Peroz, C.USA (författare)
Robinson, A. P. G.UK (författare)
Henry, M. D.USA (författare)
Scherer, A.USA (författare)
Mollenhauer, T.Germany (författare)
Genova, V.USA (författare)
Ng, D. K. T.Singapore (författare)
UKUSA (creator_code:org_t)

Ingår i:International Conference Micro- and Nano-Electronics 2012: SPIE - International Society for Optical Engineering, s. 870002-9780819494870

Av författaren/redakt...: Welch, C. C.; Olynick, D. L.; Liu, Z.; Holmberg, Anders; Peroz, C.; Robinson, A. P. ...; visa fler...; Henry, M. D.; Scherer, A.; Mollenhauer, T.; Genova, V.; Ng, D. K. T.; visa färre...

Om ämnet

TEKNIK OCH TEKNOLOGIER: TEKNIK OCH TEKNO ...; och Annan teknik; och Övrig annan tekn ...

Kungliga biblioteket hanterar dina personuppgifter i enlighet med EU:s dataskyddsförordning (2018), GDPR. Läs mer om hur det funkar här.
Så här hanterar KB dina uppgifter vid användning av denna tjänst.