Modification of Atomic Structure of Thin Amorphous V2O 5 Films under UV Laser Irradiation

• Influence of ultra-violet radiation of the KrF laser (wave length 248 nm, pulse duration 20 ns) on atomic structure of amorphous vanadium pentoxide thin films, prepared by the pulsed laser deposition method, is studied. Calculations of the short-range order characteristics (radii and diffusiveness of coordination spheres, coordination numbers) were performed by the Finbak -Warren method. It is established that minimal structure unit of amorphous V 2O5 film before and after irradiation is a strongly deformed oxygen octahedron. Distortions of tetragonal pyramids in the initial and modified film are different. Also, oxygen deficiency in a tetragonal pyramid is observed.

Ämnesord

NATURVETENSKAP  -- Fysik (hsv//swe)

NATURAL SCIENCES  -- Physical Sciences (hsv//eng)

Nyckelord

Atomic structure

Before and after

Coordination number

Coordination sphere

KrF lasers

Modified film

Oxygen deficiency

Oxygen octahedra

Pulse durations

Pulsed laser

Short range orders

Structure unit

Tetragonal pyramids

Ultra-violet

UV-laser irradiation

Vanadium pentoxide thin films

Chemical modification

Deposition

Irradiation

Krypton

Oxygen

Pulsed laser deposition

Pulsed lasers

Vanadium

Vanadium compounds

Amorphous films

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