Sökning: WFRF:(Khartsev Sergiy) >
Heteroepitaxial Na0...
Heteroepitaxial Na0.5K0.5NbO3/La0.5Sr0.5CoO3 electro-optical cell
-
- Khartsev, Sergiy (författare)
- KTH,Mikroelektronik och Informationsteknik, IMIT
-
- Grishin, Michael A. (författare)
- KTH,Mikroelektronik och Informationsteknik, IMIT
-
- Grishin, Alexander M. (författare)
- KTH,Mikroelektronik och Informationsteknik, IMIT
-
visa fler...
-
- Karlsson, Ulf O. (författare)
- KTH,Mikroelektronik och Informationsteknik, IMIT
-
visa färre...
-
(creator_code:org_t)
- 2011-10-12
- 2006
- Engelska.
-
Ingår i: Integrated Ferroelectrics. - : Informa UK Limited. - 1058-4587 .- 1607-8489. ; 80, s. 133-143
- Relaterad länk:
-
https://urn.kb.se/re...
-
visa fler...
-
https://doi.org/10.1...
-
visa färre...
Abstract
Ämnesord
Stäng
- We report electro-optic performance of heteroepitaxial Na0.5K0.5NbO3(1.5 mu m)/La0.5Sr0.5CoO3 (0.5 mu m) (NKN/LSCO) films grown on Al2O3(01 (1) under bar2) single crystal (r-cut sapphire) by rf-magnetron sputtering (NKN) and pulsed laser deposition (LSCO) techniques. Vertical capacitive electro-optical cells were defined by a thermal evaporation of 2 x 8 mm(2) Au electrodes through the contact mask on top the NKN film. Processing parameters have been specially optimized to obtain electrosoftNKN films with a non-linear fatigue-free P-E characteristics: low remnant P-r = 7.7 mu C/cm(2) high induced polarization P = 23 mu C/cm(2) @ 400 km/cm , and the coercive field E-c = 70 kV/cm. Electro-optical characterization of NKN films has been performed using waveguide refractometry: a prism coupling of a light beam into the thin-film waveguide modes. Intensity of TM- and TE-polarized light of 655 nm laser diode reflected from the free surface of NKN film and Au-clad NKN/LSCO waveguide was recorded at zero and 15 V (100 kV/cm) bias electric field. Fitting reflectivity spectra to Fresnel formulas yields extraordinary and ordinary refractive indices n(c) = 2.232 and n(o) = 2.234 as well as electro-optic coefficient r(13) = 17.4 pm/V. Dispersion of the refraction index follows Sellmeier formula n(2) = 1+ 3.46/[1 + (244 nm/lambda)(2)] in the range from 400 nm to 850 nm.
Ämnesord
- TEKNIK OCH TEKNOLOGIER -- Elektroteknik och elektronik (hsv//swe)
- ENGINEERING AND TECHNOLOGY -- Electrical Engineering, Electronic Engineering, Information Engineering (hsv//eng)
Nyckelord
- sodium potassium niobate
- ferroelectric films
- pulsed laser deposition
- rf-magnetron sputtering
- electro-optic effect
- prism coupling
- waveguiding
- refraction index
- electro-optic coefficient
- na0.5k0.5nbo3 thin-films
- pulsed-laser deposition
- knbo3
- sapphire
- Electrical engineering, electronics and photonics
- Elektroteknik, elektronik och fotonik
Publikations- och innehållstyp
- ref (ämneskategori)
- art (ämneskategori)
Hitta via bibliotek
Till lärosätets databas