Fabrication of submicron structures in nanoparticle/polymer composite by holographic lithography and reactive ion etching

• We report on the fabrication of nanoparticle/polymer submicron structures by combining holographic lithography and reactive ion etching. Silica nanoparticles are uniformly dispersed in a (SU8) polymer matrix at a high concentration, and in situ polymerization (cross-linking) is used to form a nanoparticle/polymer composite. Another photosensitive SU8 layer cast upon the nanoparticle/SU8 composite layer is structured through holographic lithography, whose pattern is finally transferred to the nanoparticle/SU8 layer by the reactive ion etching process. Honeycomb structures in a submicron scale are experimentally realized in the nanoparticle/SU8 composite.

Keyword

holography

honeycomb structures

nanocomposites

nanotechnology

photolithography

polymerisation

silicon compounds

sputter etching

interference lithography

arrays

silicon

light

su-8

Publication and Content Type

ref (subject category)

art (subject category)