Thermal conductivity of polycrystalline aluminum nitride films: Effects of the microstructure, interfacial thermal resistance and local oxidation

Thermal conductivity of polycrystalline aluminum nitride films : Effects of the microstructure, interfacial thermal resistance and local oxidation

QC 20161103
The thermal conductivity of polycrystalline aluminum nitride (AlN) films with inhomogeneous structures is experimentally and theoretically investigated. The influence of the grain morphology and size evolution along the cross plane direction of the films is studied by thickness-dependent 3m measurements on AlN monolayers. For AlN/AlN multilayer samples, the impact of oxygen-related defects localized at the interface between two AlN layers, is also analyzed. When the total thickness of these multilayers is downsized from 1107 nm to 270 nm, their measured effective thermal conductivity reduces by 47%, which is smaller than the corresponding reduction of 58% for monolayers. In multilayers, this decrease is due to the additive contributions of the thermal resistances arising from the AlN and AlN/AlN interfaces. The experimental data are interpreted through an analytical model developed for nanocrystalline films with inhomogeneous structures. It is shown that the size effects on the phonon mean free paths and the intrinsic thermal resistance resulting from the inhomogeneous microstructure predominate as the film thickness increases, whilst the contribution of the interface thermal resistance strengthens when the thickness is scaled down.

TEKNIK OCH TEKNOLOGIER Materialteknik Annan materialteknik hsv//swe
ENGINEERING AND TECHNOLOGY Materials Engineering Other Materials Engineering hsv//eng
Aluminum
Aluminum nitride
Heat resistance
Integrated circuits
Interfaces (materials)
Microstructure
Monolayers
Multilayers
Nanocrystals
Nitrides
Thermal conductivity of solids
Effective thermal conductivity
Inhomogeneous microstructure
Inhomogeneous structure
Interface thermal resistance
Interfacial thermal resistance
Nano-crystalline films
Oxygen-related defects
Polycrystalline aluminum

Ingår i:THERMINIC 2015 - 21st International Workshop on Thermal Investigations of ICs and Systems: Institute of Electrical and Electronics Engineers (IEEE)9781467397056

Av författaren/redakt...: Jaramillo-Fernan ...; Ordonez-Miranda, ...; Kassem, W.; Oilier, E.; Volz, S.

Om ämnet

TEKNIK OCH TEKNOLOGIER: TEKNIK OCH TEKNO ...; och Materialteknik; och Annan materialte ...

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