Sökning: onr:"swepub:oai:DiVA.org:kth-20236" >
Self-interstitial m...
-
Kuznetsov, A. Y.
(författare)
Self-interstitial migration during ion irradiation of boron delta-doped silicon
- Artikel/kapitelEngelska2000
Förlag, utgivningsår, omfång ...
Nummerbeteckningar
-
LIBRIS-ID:oai:DiVA.org:kth-20236
-
https://urn.kb.se/resolve?urn=urn:nbn:se:kth:diva-20236URI
-
https://doi.org/10.1016/S1369-8001(00)00044-5DOI
Kompletterande språkuppgifter
-
Språk:engelska
-
Sammanfattning på:engelska
Ingår i deldatabas
Klassifikation
-
Ämneskategori:ref swepub-contenttype
-
Ämneskategori:art swepub-publicationtype
Anmärkningar
-
QC 20100525
-
Boron delta layers in silicon, grown by molecular beam epitaxy and characterized by the secondary ion mass spectrometry, have been employed to investigate the migration of silicon self-interstitials during irradiation with MeV protons in the 500-850 degreesC temperature range. After growth, the samples were thinned from the backside to a thickness that made them transparent for the proton energies used. As a result, the generation rate of point defects can be considered as essentially uniform throughout the samples. However: the evolution of the boron profiles is almost identical to that observed after injection of self-interstitials caused by thermal oxidation of the samples at elevated temperature. This strongly indicates that the surface acts as a reflective boundary for the migrating self-interstitials or/ and an efficient sink for mobile vacancies. Furthermore, higher value of interstitial supersaturation in the near-surface region in proton-irradiated samples is consistent with experimentally detected depth dependence for immobile fraction in boron clusters. Then, activation energy of boron mobilization, (0.9 +/- 0.4) eV, was attributed to the dissociation of boron clusters.
Ämnesord och genrebeteckningar
-
boron
-
silicon
-
proton irradiation
-
enhanced diffusion
-
clustering
-
point-defects
-
enhanced diffusion
-
dopant diffusion
-
si
Biuppslag (personer, institutioner, konferenser, titlar ...)
-
Leveque, P.
(författare)
-
Hallén, Anders.KTH,Mikroelektronik och informationsteknik, IMIT(Swepub:kth)u11ywmz1
(författare)
-
Svensson, B. G.
(författare)
-
Larsen, A. N.
(författare)
-
KTHMikroelektronik och informationsteknik, IMIT
(creator_code:org_t)
Sammanhörande titlar
-
Ingår i:Materials Science in Semiconductor Processing3:4, s. 279-2831369-80011873-4081
Internetlänk
Hitta via bibliotek
Till lärosätets databas