Liquid-jet laser-plasma X-ray sources for microscopy and lithography

• We review the development of compact laser-plasma soft x-ray sources based on microscopic liquid-drop or liquid-jet targets. It is shown that such sources provide practically debris-free, high-flux operation at water-window and EUV wavelengths. This regenerative and solid-density target system holds promise for the generation of high-average power using high-repetition-rate lasers. Application of the source to compact x-ray microscopy, multi layer-op tics characterization and EUV lithography is briefly discussed.

Nyckelord

droplet-target

generation

emission

Publikations- och innehållstyp

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